Process for the collective fabrication of calibration-free sensors based on acoustic wave devices
The invention relates to a process for the collective fabrication of a remotely interrogable sensor having at least one first resonator and one second resonator. Each resonator exhibits respectively a first and a second operating frequency. A first series of first resonators are fabricated. The first resonators each have a first operating frequency belonging to a first set of frequencies centered on a first central frequency. A second series of second resonators are fabricated. The second resonators each having a second operating frequency belonging to a second set of frequencies centered on a second central frequency. A series of pairings of a first resonator and of a second resonator are conducted so as to form pairs of resonators exhibiting a difference of operating frequencies which is equal to the difference of the first and second central frequencies.
1. A process for a collective fabrication of remotely interrogable sensors, each sensor comprising at least one first resonator and at least one second resonator, each of the at least one first resonator and each of the at least one second resonator comprising acoustic wave transducers and of a design such that the at least one first resonator and the at least one second resonator exhibit respectively a first and a second operating frequency, comprising the following steps:
fabricating a first series of first resonators, each of said first resonators comprising the first operating frequency belonging to a first set of frequencies centered on a first mean frequency;
fabricating a second series of second resonators, each of said second resonators comprising the second operating frequency belonging to a second set of frequencies centered on a second mean frequency; and
a series of pairings of a first resonator and of a second resonator so as to form pairs of resonators exhibiting a difference of operating frequencies which is equal to a difference of the first and second mean frequencies.
2. The fabrication process as claimed in claim 1 , comprising the following steps:
the fabrication of first resonators on a first intermediate substrate and the fabrication of second resonators on a second intermediate substrate;
cutting of unit blanks of first and of second chips comprising respectively the first and second resonators from said intermediate substrates;
pairing of a first and of a second chip; and
the assembling of the pairs of chips in a package.
3. The fabrication process as claimed in claim 2 , wherein the pairing step is performed by measuring the resonant frequencies.
4. The fabrication process as claimed in claim 2 , wherein the resonators are made on a quartz intermediate substrate.
5. The fabrication process as claimed in claim 2 , wherein the sensor is a temperature sensor.
6. The fabrication process as claimed in claim 2 , wherein the first resonators and second resonators are made on the surface of a first and of a second intermediate substrate of different crystal cut, the directions of propagation of the surface waves being identical on the two intermediate substrates.
7. The fabrication process as claimed in claim 2 , wherein the resonators are of surface wave resonator type.
8. The fabrication process as claimed in one claim 2 , wherein the resonators are of bulk wave resonator type.
9. The fabrication process as claimed in claim 1 , comprising:
fabricating first resonators on a first intermediate substrate and fabricating of second resonators (RT i2 ) on a second intermediate substrate;
cutting unit blanks of first and of second chips comprising respectively the first and second resonators from said intermediate substrates;
assembling an individual package of the first chips and of the second chips; and
pairing a first and a second chip placed previously into the individual package.
10. The fabrication process as claimed in claim 9 , wherein the pairing step is performed by measuring the first and second operating frequencies.
11. The fabrication process as claimed in claim 9 , wherein the sensor is a temperature sensor.
12. The fabrication process as claimed in claim 1 , wherein each of the series of pairings is performed by measuring the first and second operating frequencies.
13. The fabrication process as claimed in claim 1 , further comprising stabilizing a temperature of the first and second resonators.
14. The fabrication process as claimed in claim 1 , wherein the resonators are formed on a quartz intermediate substrate.
15. The fabrication process as claimed in claim 1 , wherein the sensor is a temperature sensor.
16. The fabrication process as claimed in claim 1 , wherein the first resonators are oriented on a first intermediate substrate in a first direction, the second resonators are oriented on a second intermediate substrate in a second direction, said first and second directions corresponding to directions of propagation of the surface waves, wherein the first direction makes a nonzero angle with the second direction.
17. The fabrication process as claimed in claim 1 , wherein the first resonators and second resonators are respectively formed on a surface of a first and of a second intermediate substrate of different crystal cut, the directions of propagation of the surface waves being identical on the first and second intermediate substrates.
18. The fabrication process as claimed in claim 1 , wherein the first and second resonators are of surface wave resonator type.
19. The fabrication process as claimed in one claim 1 , wherein the first and second resonators are of bulk wave resonator type.