Method of manufacturing semiconductor device
A post-CMP cleaning process of a copper layer is to be performed as follows. An alkaline aqueous solution, a polycarboxylic acid, BTA, and an alkaline aqueous solution are sequentially brought into contact with a primary surface of a silicon substrate over which the copper layer is provided.
1. A method of manufacturing a semiconductor device, comprising:
preparing a wafer comprising a semiconductor substrate, an insulating layer over the semiconductor substrate, the insulating layer having a trench formed therein, and a copper-containing metal layer filled inside said trench; and
cleaning a surface of said copper-containing metal layer and of said insulating layer;
wherein said cleaning said surface of said copper-containing metal layer and of said insulating layer includes:
a first process including removing copper ion and copper oxide;
a second process including reducing, after said first process, said copper ion and said copper oxide remaining unremoved through said first process, thereby giving copper;
a third process including enclosing with an organic layer, after said second process, said copper given through said second process; and
a fourth process including giving a negative surface potential to said organic layer and to said insulating layer, after said third process.
2. The method according to claim 1 , wherein said cleaning the surface of said copper-containing metal layer and of said insulating layer further includes removing a slurry.
3. The method according to claim 1 ,
wherein said first process includes bringing polycarboxylic acid into contact with the surface of said copper-containing metal layer and of said insulating layer;
the second process includes bringing reduced water into contact with the surface of said copper-containing metal layer and of said insulating layer;
the third process includes bringing benzotriazole or a derivative thereof into contact with the surface of said copper-containing metal layer and of said insulating layer; and
the fourth process includes bringing an alkaline aqueous solution into contact with the surface of said copper-containing metal layer and of said insulating layer.
4. The method according to claim 2 ,
wherein said first process includes bringing a polycarboxylic acid into contact with the surface of said copper-containing metal layer and of said insulating layer;
the second process includes bringing a reduced water into contact with the surface of said copper-containing metal layer and of said insulating layer;
the third process includes bringing benzotriazole or a derivative thereof into contact with the surface of said copper-containing metal layer and of said insulating layer;
the fourth process includes bringing an alkaline aqueous solution into contact with the surface of said copper-containing metal layer and of said insulating layer; and
said removing the slurry includes bringing an alkaline aqueous solution into contact with the surface of said copper-containing metal layer and of said insulating layer.
5. The method according to claim 3 , wherein said second process includes employing an alkali reduced water as said reduced water.
6. The method according to claim 5 , wherein said alkali reduced water has a pH value equal to or higher than 7.4 and equal to or lower than 9.5.
7. The method according to claim 4 ,
wherein said second process includes employing an alkali reduced water as said reduced water; and
said fourth process and said removing the slurry include employing an alkali reduced water as said alkaline aqueous solution.
8. A method of manufacturing a semiconductor device, comprising:
preparing a wafer comprising a semiconductor substrate, an insulating layer over the semiconductor substrate, the insulating layer having a trench formed therein, and a copper-containing metal layer filled inside said trench; and
cleaning a surface of said copper-containing metal layer and of said insulating layer,
wherein said cleaning said surface of said copper-containing metal layer and of said insulating layer includes
a first process including reducing copper ion and copper oxide remaining on said surface of said copper-containing metal layer and of said insulating layer, thereby giving copper,
a second process including enclosing with an organic layer, after said first process, said copper given through said first process, and
a third process including giving a negative surface potential to said organic layer and to said insulating layer, after said second process.
9. The method according to claim 8 , wherein said cleaning the surface of said copper-containing metal layer and of said insulating layer further includes removing a slurry.
10. The method according to claim 8 , wherein,
the first process includes bringing reduced water into contact with the surface of said copper-containing metal layer and of said insulating layer,
the second process includes bringing benzotriazole or a derivative thereof into contact with the surface of said copper-containing metal layer and of said insulating layer, and
the third process includes bringing an alkaline aqueous solution into contact with the surface of said copper-containing metal layer and of said insulating layer.
11. The method according to claim 9 , wherein,
the first process includes bringing a reduced water into contact with the surface of said copper-containing metal layer and of said insulating layer,
the second process includes bringing benzotriazole or a derivative thereof into contact with the surface of said copper-containing metal layer and of said insulating layer,
the third process includes bringing an alkaline aqueous solution into contact with the surface of said copper-containing metal layer and of said insulating layer, and
said removing the slurry includes bringing an alkaline aqueous solution into contact with the surface of said copper-containing metal layer and of said insulating layer.
12. The method according to claim 10 , wherein said first process includes employing an alkali reduced water as said reduced water.
13. The method according to claim 12 , wherein said alkali reduced water has a pH value equal to or higher than 7.4 and equal to or lower than 9.5.
14. The method according to claim 11 , wherein,
said first process includes employing an alkali reduced water as said reduced water, and
said third process and said removing the slurry include employing an alkali reduced water as said alkaline aqueous solution.