Pixel structure and the method of forming the same
A pixel structure includes a drain extension portion disposed on an islanding semiconductor layer, wherein the islanding semiconductor layer is formed together with a thin-film transistor channel layer. Therefore, the total thickness of the islanding semiconductor layer and the drain extension portion is increased, such that the distance between the gate line and the drain extension portion is enlarged, and the coupling capacitance between the gate line and the drain extension portion can be lowered. Therefore, the display panel with the pixel structure of the present invention can have low coupling capacitance so as to improve the flicker phenomena obviously.
1. A pixel structure, comprising:
a substrate;
a patterned first conductive layer disposed on the substrate, comprising:
at least a gate line substantially disposed along a first direction; and
at least a gate electrode extended from the gate line;
a gate dielectric layer disposed on the patterned first conductive layer;
a patterned semiconductor layer disposed on a part of the gate dielectric layer, comprising:
a thin film transistor channel layer; and
an islanding semiconductor layer not overlapping with the patterned first conductive layer disposed substantially parallel to the first direction;
a patterned second conductive layer disposed on a part of the patterned semiconductor layer, comprising:
a source line;
a source electrode and a drain electrode covering parts of the thin film transistor channel layer; and
a drain extension portion covering a part of the islanding semiconductor layer, the drain extension portion and the drain electrode forming a continuous structure;
a protection layer disposed on the substrate, the protection layer covering the patterned second conductive layer, a part of the patterned semiconductor layer, and a part of the gate dielectric layer; and
a patterned third conductive layer disposed on the protection layer and electrically connected to the drain electrode, wherein the patterned third conductive layer has an edge disposed parallel and adjacent to a part of the gate line, and the islanding semiconductor layer is disposed under a part of the edge.
2. The pixel structure of claim 1 , wherein the patterned first conductive layer comprises a metal material.
3. The pixel structure of claim 1 , wherein the patterned second conductive layer comprises a metal material.
4. The pixel structure of claim 1 , wherein a thickness of the thin film transistor channel layer is substantially equal to a thickness of the islanding semiconductor layer.
5. The pixel structure of claim 1 , wherein at least a part of the drain extension portion covers a surface of the islanding semiconductor layer.
6. The pixel structure of claim 1 , wherein an extending direction of the drain extension portion is substantially parallel to an extending direction of the islanding semiconductor layer.
7. The pixel structure of claim 1 , wherein an extending direction of the islanding semiconductor layer is substantially parallel to an extending direction of the gate line.
8. The pixel structure of claim 1 , wherein at least a part of the patterned third conductive layer and the islanding semiconductor layer vertically overlap with each other.