Polymer, radiation-sensitive composition, monomer, and method of producing compound

1. A radiation-sensitive composition comprising:

(A) an acid-dissociable group-containing polymer;

(B) a radiation-sensitive acid generator; and

(C) an acid diffusion controller, the acid-dissociable group-containing polymer (A) comprising a repeating unit shown by a following general formula (1),

wherein R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R 2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y, and

wherein the content of the repeating unit (1) is from 1 mol % to 70 mol % based on the total amount (100 mol %) of the repeating units that form the polymer (A).

2. The radiation-sensitive composition according to claim 1 , wherein the general formula (1) is a following general formula (1-1),

wherein R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R 3 represents an alkyl group having 1 to 4 carbon atoms, Y represents a carbon atom, X represents an atomic group that forms an alicyclic hydrocarbon group together with Y, and h is an integer from 1 to 3.

3. The radiation-sensitive composition according to claim 1 , wherein (B) the radiation-sensitive acid generator is an onium salt, a diazomethane compound, a sulfonimide compound, or a combination thereof.

4. A radiation-sensitive composition comprising:

(A) an acid-dissociable group-containing polymer; and

(B) a radiation-sensitive acid generator, the acid-dissociable group-containing polymer (A) comprising a repeating unit shown by a following general formula (1),

wherein R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R 2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y,

wherein the content of the repeating unit (1) is from 1 mol % to 70 mol % based on the total amount (100 mol %) of the repeating units that form the polymer (A), and

wherein the radiation-sensitive acid generator (B) comprises an onium salt shown by a following general formula (b1),

M + Z −   (b1)

wherein M + represents a monovalent onium cation, and Z − represents a monovalent anion shown by a following general formula (b1-Z-1) or (b1-Z-2),

wherein R 41 and R 42 represent a fluorine atom or an alkyl group having 1 to 20 carbon atoms that is substituted with at least one fluorine atom, or bond to form a cyclic structure having 1 to 20 carbon atoms that is substituted with at least one fluorine atom, and R 43 , R 44 , and R 45 represent an alkyl group having 1 to 20 carbon atoms that is substituted with at least one fluorine atom, or two of R 43 , R 44 , and R 45 bond to form a cyclic structure having 1 to 20 carbon atoms that is substituted with at least one fluorine atom, and one of R 43 , R 44 , and R 45 other than the two of R 43 , R 44 , and R 45 represents an alkyl group having 1 to 20 carbon atoms that is substituted with at least one fluorine atom.

5. The radiation-sensitive composition according to claim 4 , wherein the general formula (1) is a following general formula (1-1),

wherein R 1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R 3 represents an alkyl group having 1 to 4 carbon atoms, Y represents a carbon atom, X represents an atomic group that forms an alicyclic hydrocarbon group together with Y, and h is 0.