Techniques for providing a multimode ion source
Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation, the apparatus including an ion source having a hot cathode and a high frequency plasma generator, wherein the ion source has multiple modes of operation.
1. A multi-mode ion source comprising:
a chamber;
an indirectly heated cathode coupled to said chamber;
a second plasma source; and
a plasma pipe connecting said second plasma source to said chamber, wherein said plasma pipe comprises a plurality of ring magnets.
2. The multi-mode ion source of claim 1 , wherein said plasma pipe is curved.
3. The multi-mode ion source of claim 1 , wherein each pair of said plurality of ring magnets has opposite polarities.
4. The multi-mode ion source of claim 1 , wherein said plurality of ring magnets are configured to form a multi-cusp field within said plasma pipe.
5. The multi-mode ion source of claim 1 , wherein said plurality of ring magnets are plated with aluminum.
6. The multi-mode ion source of claim 1 , wherein said second plasma source is selected from the group consisting of a helicon source, an electron cyclotron resonance source, and an inductively coupled plasma source.
7. The multi-mode ion source of claim 1 , further comprising a second plasma pipe connecting said second plasma source to said chamber.
8. The multi-mode ion source of claim 1 , said chamber further comprising a temperature sensor.
9. A multi-mode ion source comprising:
a chamber coupled to a source of electrons;
a second plasma source configured to generate molecular ions; and
a plasma pipe connecting said second plasma source to said chamber, wherein said plasma pipe comprises a plurality of ring magnets.
10. The multi-mode ion source of claim 9 , wherein said plasma pipe is curved.
11. The multi-mode ion source of claim 9 , wherein each pair of said plurality of ring magnets has opposite polarities.
12. The multi-mode ion source of claim 9 , wherein said plurality of ring magnets are configured to form a multi-cusp field within said plasma pipe.
13. The multi-mode ion source of claim 9 , wherein said plurality of ring magnets are plated with aluminum.
14. The multi-mode ion source of claim 9 , wherein said second plasma source is selected from the group consisting of a helicon source, an electron cyclotron resonance source, and an inductively coupled plasma source.
15. The multi-mode ion source of claim 9 , further comprising a second plasma pipe connecting said second plasma source to said chamber.
16. The multi-mode ion source of claim 9 , said chamber further comprising a temperature sensor.
17. The multi-mode ion source of claim 9 , wherein said source of electrons is an indirectly heated cathode.