Dissection splitting with optical proximity correction and mask rule check enforcement

1. An integrated circuit (IC) design method comprising:

receiving an IC design layout having a main feature;

applying a design rule check main feature dissection to the main feature of the IC design layout and generating design rule check sub-portions of the main feature;

modifying the design rule check sub-portions of the main feature of the IC design layout according to a design rule check;

assigning at least one target to the main feature, the target representing a spatial relationship relative to the main feature;

applying a mask rule check main feature dissection to the design rule check sub-portions of the main feature of the IC design layout and generating mask rule check sub-portions of the main feature;

identifying at least one of the mask rule check sub-portions as a target mask rule check sub-portion when the at least one target is on or within a border of the at least one of the mask rule check-sub portions and identifying at least another one of the mask rule check sub-portions as a non-target mask rule check sub-portion when the at least one target is not on or within a border of the at least another one of the mask rule check sub-portions;

performing an optical proximity correction (OPC) to the mask rule check sub-portions;

modifying one of the mask rule check sub-portions based on the OPC; and

performing a mask rule check (MRC) to only those mask rule check sub-portions identified as non-target mask rule check sub-portions;

modifying only those mask rule check sub-portions identified as non-target mask rule check sub-portions based on the MRC; and

after the modifying only those mask rule check sub-portions identified as non-target mask rule check sub-portions based on the MRC, providing the IC design layout in a format accessible by a mask making tool.

2. The IC design method of claim 1 , further comprising fabricating a mask according to the IC design layout after the modifying only the non-target mask rule check sub-portion based on the MRC.

3. The IC design method of claim 1 , wherein the applying the mask rule check main feature dissection includes dissecting one of the design rule check sub-portions of the main features into three segments in a first direction.

4. The IC design method of claim 3 , wherein the applying the mask rule check main feature dissection further includes dissecting the one of the design rule check sub-portions of the main feature into three segments in a second direction approximately perpendicular to the first direction.

5. The IC design method of claim 1 , further comprising applying a second optical proximity correction to the mask rule check sub-portions after the modifying only the non-target mask rule check sub-portion based on the MRC, wherein the second optical proximity correction modifies one of the target mask rule sub-portions.

6. The IC design method of claim 1 , wherein there is a greater number of mask rule check sub-portions than design rule check sub-portions.

7. An integrated circuit (IC) design method comprising:

receiving an IC design layout of an integrated circuit;

assigning targets to a main feature of the IC design layout;

performing a main feature dissection to the main feature, thereby generating a non-target sub-portion and a target sub-portion, the target sub-portion having at least one target on or within a border of the target sub-portion and the non-target sub-portion not having at least one target on or within a border of the non-target sub-portion;

performing an optical proximity correction (OPC) to the IC design layout;

performing a mask rule check (MRC) to only the non-target sub-portion of the main feature;

performing another OPC to the IC design layout after the performing of the MRC to the non-target sub-portion of the main feature; and

after the performing of the another OPC to the IC design layout, providing the IC design layout in a format accessible by a mask making tool.

8. The IC design method of claim 7 , further comprising fabricating a mask according to the IC design layout after the performing of the another OPC to the IC design layout.

9. The IC design method of claim 7 , wherein the performing the MRC includes modifying the non-target sub-portion if the non-target sub-portion fails a mask rule.

10. The IC design method of claim 7 , wherein the performing the MRC is carried out under a condition that the MRC does not modify the target sub-portion of the main feature.

11. The IC design method of claim 7 , further comprising repeating:

the performing the OPC to the IC design layout; and

the performing the mask rule check (MRC) to the non-target sub-portion of the main feature.

12. The IC design method of claim 7 , wherein the targets represent spatial relationships relative to the main feature of the IC design layout.

13. The IC design method of claim 7 , further comprising modifying only the non-target sub-portion of the main feature based on the MRC.

14. An integrated circuit (IC) design method comprising:

receiving an IC design layout having a main feature;

assigning targets to the main feature;

generating a non-target sub-portion and a target sub-portion of the main feature through a dissection process, the target sub-portion having at least one target on or within a border of the target sub-portion and the non-target sub portion not having at least one target on or within a border of the non-target sub-portion;

performing a first optical proximity correction (OPC) to the IC design layout;

modifying only the non-target sub-portion according to a mask rule;

after the modifying of the non-target sub-portion according to the mask rule, performing a second OPC to the IC design layout and modifying the target sub-portion according to the assigned targets; and

after the performing of the second OPC to the IC design layout and the modifying of the target sub-portion according to the assigned targets, providing the IC design layout in a format accessible by a mask making tool.

15. The IC design method of claim 14 , further comprising making a mask according to the IC design layout after the performing of the second OPC to the IC design layout and the modifying of the target sub-portion according to the assigned targets.

16. The IC design method of claim 14 , wherein the dissection process includes:

dissecting the main feature by first lines in a first direction, the first lines dividing a first edge of the main feature into three segments; and

dissecting the main feature by second lines in a second direction, the second lines dividing a second edge of the main feature into three segments, wherein the first and second directions intersect with each other.

17. The IC design method of claim 16 , wherein the dissecting includes generating nine sub-portions of the main feature, each of the sub-portions being defined by one or more of the first lines and one or more of the second lines.

18. The IC design method of claim 14 , wherein the non-target sub-portion generated by the dissection process is substantially smaller in area than the target sub-portion generated by the dissection process.

19. The IC design method of claim 18 , wherein:

the target sub-portion includes a first dimension L 1 in a direction;

the non-target sub-portion includes a second dimension L 2 in the direction; and

a ratio of L 1 :L 2 is in a range between 2:1 and 8:1.

20. The IC design method of claim 14 , modifying the target and non-target sub-portions based on the first OPC.