Method for producing an electro-optical printed circuit board with optical waveguide structures
An electro-optical printed circuit board contains electrical conductor tracks on the one hand and optical waveguide structures on the other hand. The optical waveguide structures comprise a bottom layer, a core layer and a cladding layer. Visible areas are applied to the printed circuit board, and the core layer is applied later both to the bottom layer as well as the visible areas and structured both on the bottom layer as well as the visible areas. This structure is then transferred to the visible areas, e.g. by etching. Reference marks are thus produced which contain the information on the actual position of the optical waveguide structures.
1. A method for producing an electro-optical printed circuit board, the board including an optical waveguide structure having a transparent bottom layer disposed over a substrate, a transparent core layer disposed over the bottom layer, and a cladding layer disposed over the core layer, the method comprising:
forming a non-transparent area consisting of a non-transparent material on the substrate;
applying the bottom layer to the substrate so that the bottom layer does not cover the non-transparent area;
applying the core layer so that the core layer covers the bottom layer and the non-transparent area;
structuring the core layer by exposing to electromagnetic radiation through a single exposure mask and subsequently removing non-exposed portions of the core layer so as to leave exposed portions of the core layer remaining on the bottom layer as part of the waveguide structure and to leave exposed portions of the core layer remaining on the non-transparent area forming a structured region,
applying the cladding layer so that the cladding layer does not cover the at least one opening of the structured region, and
removing material from the non-transparent area within the structured region for forming at least one reference mark.
2. The method according to claim 1 , wherein said removing of material occurs by an etching process with the structured region used as etching mask.
3. The method according to claim 1 , comprising the further step:
using the at least one reference mark for producing holes or recesses in the substrate.
4. The method according to claim 2 , comprising the further step:
using the at least one reference mark for producing holes or recesses in the substrate.
5. The method according to claim 1 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
6. The method according to claim 2 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
7. The method according to claim 3 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
8. The method according to claim 4 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
9. The method according to claim 2 , wherein said non-transparent material comprises a metal.
10. The method according to claim 4 , wherein said non-transparent material comprises a metal.
11. A method for producing an electro-optical printed circuit board, the board including an optical waveguide structure having a transparent bottom layer disposed over a substrate, a transparent core layer disposed over the bottom layer, and a cladding layer disposed over the core layer, the method comprising:
forming a non-transparent area consisting of a non-transparent material on the substrate;
applying the bottom layer to the substrate so that the bottom layer does not cover the non-transparent area;
applying the core layer and a photoresist layer so that the core layer does not cover the non-transparent area and the photoresist layer does cover the non-transparent area;
structuring the core layer and the photoresist layer by exposing to electromagnetic radiation through a single exposure mask and subsequently removing non-exposed portions of the core layer and the photoresist layer so as to leave exposed portions of the core layer remaining on the bottom layer as part of the waveguide structure and to leave exposed portions of the photoresist layer remaining on the non-transparent area forming a structured region,
applying the cladding layer so that the cladding layer does not cover the at least one opening of the structured region, and
removing material from the non-transparent area within the structured region for forming at least one reference mark.
12. The method according to claim 11 , wherein said removing occurs by an etching process with the structured region used as etching mask.
13. The method according to claim 11 , comprising the further step:
using the at least one reference mark for producing holes or recesses in the substrate.
14. The method according to claim 12 , comprising the further step:
using the at least one reference mark for producing holes or recesses in the substrate.
15. The method according to claim 11 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
16. The method according to claim 12 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
17. The method according to claim 13 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
18. The method according to claim 14 , comprising the further step:
partly removing the cladding layer to uncover the bottom layer at defined exposure areas.
19. The method according to claim 12 , wherein said non-transparent material comprises a metal.
20. The method according to claim 14 , wherein said non-transparent material comprises a metal.