Method of manufacturing a silicon carbide single crystal
A method capable of stably manufacturing a SiC single crystal in the form of a thin film or a bulk crystal having a low carrier density of at most 5×10 17 /cm 3 and preferably less than 1×10 17 /cm 3 and which is suitable for use in various devices by liquid phase growth using a SiC solution in which the solvent is a melt of a Si alloy employs a Si alloy having a composition which is expressed by Si x Cr y Ti z wherein x, y, and z (each in atomic percent) satisfy 0.50<x<0.68, 0.08<y<0.35, and 0.08<z<0.35, or (1) 0.40<x≦0.50, 0.15<y<0.40, and 0.15<z<0.35. (2) x, y, and z preferably satisfy 0.53<x<0.65, 0.1<y<0.3, and 0.1<z<0.3.
1. A method of manufacturing a SiC single crystal comprising immersing a seed crystal in a SiC solution having C dissolved in a solvent which is a melt of a Si alloy and growing a SiC single crystal on the seed crystal by making the SiC solution supersaturated at least in the vicinity of the seed crystal due to supercooling,
characterized in that the Si alloy is an alloy having a composition which is expressed by Si x Cr y Ti z wherein x, y, and z (each in atomic percent) satisfy
0.50<x<0.68, 0.08<y<0.35, and 0.08<z<0.35, or (1)
0.40<x<0.50, 0.15<y<0.40, and 0.15<z<0.35. (2)
2. A method of manufacturing a SiC single crystal as set forth in claim 1 wherein x, y, and z satisfy 0.53<x<0.65, O.K y<0.3, and O.K z<0.3.
3. A method of manufacturing a SiC single crystal as set forth in claim 1 wherein the SiC solution is maintained in an inert gas atmosphere at atmospheric pressure.
4. A method of manufacturing a SiC single crystal as set forth in claim 2 wherein the SiC solution is maintained in an inert gas atmosphere at atmospheric pressure.