Semiconductor device and method of fabricating the same
A semiconductor device includes a via structure and a conductive structure. The via structure has a surface with a planar portion and a protrusion portion. The conductive structure is formed over at least part of the planar portion and not over at least part of the protrusion portion of the via structure. For example, the conductive structure is formed only onto the planar portion and not onto any of the protrusion portion for forming high quality connection between the conductive structure and the via structure.
1. A semiconductor device comprising:
a via structure having a surface with a planar portion and a protrusion portion that is surrounded by the planar portion of the via structure; and
a conductive structure formed over at least part of the planar portion and not over at least part of the protrusion portion of the via structure.
2. The semiconductor device of claim 1 , wherein the conductive structure is formed only onto the planar portion and not onto any of the protrusion portion.
3. The semiconductor device of claim 1 , wherein the conductive structure is formed onto from about 5% to about 80% of an area of said surface of the via structure.
4. The semiconductor device of claim 1 , further comprising:
a buffer layer formed onto the protrusion portion of the via structure.
5. The semiconductor device of claim 4 , further comprising:
a dielectric layer formed over the protrusion portion of the via structure and surrounding the conductive structure.
6. The semiconductor device of claim 1 , wherein the via structure is a TSV (through silicon via) formed within an opening through at least one dielectric layer and a semiconductor substrate.
7. The semiconductor device of claim 6 , wherein the TSV includes:
an insulation layer formed at a wall of said opening;
a barrier layer formed on said insulation layer within said opening; and
a conductive fill formed within said opening with said barrier layer surrounding at least a portion of the conductive fill.
8. The semiconductor device of claim 7 , wherein the TSV further includes:
a center fill formed within said opening with said conductive fill surrounding at least a portion of the center fill.
9. The semiconductor device of claim 8 , wherein the center fill has a thermal expansion coefficient that is lower than that of said conductive fill such that said protrusion portion is formed as a ring.
10. The semiconductor device of claim 6 , wherein the TSV is coupled to a contact structure of another semiconductor device for forming a stacked semiconductor device.
11. The semiconductor device of claim 10 , wherein the stacked semiconductor device is a memory device.
12. A semiconductor device comprising:
a via structure having a surface with a planar portion and a protrusion portion;
a conductive structure formed over at least part of the planar portion and not over at least part of the protrusion portion of the via structure;
another conductive structure formed onto at least part of the planar portion and not onto the protrusion portion of the via structure; and
a linking structure for coupling said conductive structures.
13. The semiconductor device of claim 1 , wherein the conductive structure includes an opening formed over said at least part of the protrusion portion of the via structure.
14. The semiconductor device of claim 1 , further comprising:
another via structure having a respective surface with a respective planar portion and a respective protrusion portion,
wherein said conductive structure is formed onto the planar portions and not onto the protrusion portions of said multiple via structures.
15. The semiconductor device of claim 1 , further comprising:
a plurality of via structures each having a respective surface with a respective planar portion and a respective protrusion portion; and
a plurality of conductive structures each formed onto the planar portions and not onto the protrusion portions of a respective set of at least two of said multiple via structures.
16. The semiconductor device of claim 15 , further comprising:
a linking structure for coupling said plurality of conductive structures.
17. A stacked semiconductor device comprising:
a first integrated circuit chip including:
a via structure having a surface with a planar portion and a protrusion portion that is surrounded by the planar portion of the via structure; and
a conductive structure formed over at least part of the planar portion and not over at least part of the protrusion portion of the via structure; and
a second integrated circuit chip including:
a contact structure coupled to said via structure of the first integrated circuit chip.
18. The semiconductor device of claim 17 , wherein the conductive structure is formed only onto the planar portion and not onto any of the protrusion portion.
19. The stacked semiconductor device of claim 17 , wherein the conductive structure is formed onto from about 5% to about 80% of an area of said surface of the via structure.
20. The stacked semiconductor device of claim 17 , further comprising:
a buffer layer formed onto the protrusion portion of the via structure; and
a dielectric layer formed over the protrusion portion of the via structure and surrounding the conductive structure.
21. The stacked semiconductor device of claim 17 , wherein the via structure is a TSV (through silicon via) formed within an opening through at least one dielectric layer and a semiconductor substrate of said first integrated circuit chip.
22. The stacked semiconductor device of claim 17 , wherein the stacked semiconductor device is a memory device.
23. A semiconductor device comprising:
a via structure formed through a semiconductor substrate and having a surface with a center portion and an outer portion; and
a conductive structure formed over at least part of said outer portion and not over at least part of said center portion of the via structure
wherein the via structure includes:
an insulation layer formed at a wall of an opening through the semiconductor substrate;
a barrier layer formed on said insulation layer within said opening; and
a conductive fill formed within said opening with said barrier layer surrounding at least a portion of the conductive fill.
24. The semiconductor device of claim 23 , wherein the outer portion and the center portion of the via structure are planar.
25. The semiconductor device of claim 23 , wherein the center portion protrudes from the outer portion of the via structure.
26. The semiconductor device of claim 23 , wherein the conductive structure is formed onto from about 5% to about 80% of an area of said surface of the via structure.
27. The semiconductor device of claim 23 , wherein the via structure is a TSV (through silicon via) formed within said opening through at least one dielectric layer and the semiconductor substrate.
28. The semiconductor device of claim 27 , wherein the stacked semiconductor device is a memory device.
29. The semiconductor device of claim 23 , wherein the TSV further includes:
a center fill formed within said opening with said conductive fill surrounding at least a portion of the center fill,
wherein the center fill has a thermal expansion coefficient that is lower than that of said conductive fill such that said protrusion portion is formed as a ring.