IP Library Granted Patent US 8,400,837
Granted Patent B2
US 8,400,837 · App. 12/797,965 · Granted Mar 19, 2013

Semiconductor memory device with memory cells having charge accumulation layer

Inventor: Toshiaki Edahiro (Yokohama, JP)
Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 8,400,837
App. No.
12/797,965
Granted
Mar 19, 2013
Kind
B2
Abstract

According to one embodiment, a semiconductor memory device includes memory cells, a memory cell array, a word line, a bit line, a source line, a row decoder, a sense amplifier, and a first MOS transistor. The word line is connected to gates of the memory cells. The bit line is electrically connected to drains of the memory cells. The source line is electrically connected to sources of the memory cells. The row decoder selects the word line. The sense amplifier senses and amplifies data read onto the bit line in a read operation. The first MOS transistor is capable of connecting a well region where the memory cells are formed with the source line and is arranged between the row decoder or the sense amplifier and the memory cell array.

Claims (22)

1. A semiconductor memory device comprising:

memory cells capable of holding data;

a memory cell array in which the memory cells are arranged;

a word line connected to gates of the memory cells;

a bit line electrically connected to drains of the memory cells;

a source line electrically connected to sources of the memory cells;

a row decoder which selects the word line;

a sense amplifier which senses and amplifies data read onto the bit line in a read operation;

a first MOS transistor which is capable of connecting a well region where the memory cells are formed with the source line and which is arranged between the row decoder or the sense amplifier and the memory cell array;

a second MOS transistor which is capable of supplying a voltage to the well region; and

third MOS transistors which are capable of supplying a voltage to the source line,

wherein the sense amplifier includes a first region and a second region which faces the first region with the memory cell array between the first and second regions,

the first MOS transistor is arranged between the second region and the memory cell array,

the second MOS transistor is arranged between the first region and the memory cell array, and

the third MOS transistors are arranged between the row decoder and the memory cell array.

2. The device according to claim 1 , wherein a threshold value of the memory cells has at least one of first to third levels according to data the memory cells hold, and

the first and second levels are negative.

3. The device according to claim 2 , wherein a voltage not lower than zero is applied to the word line and a positive voltage is applied to the source line and the well region when data at least at the first level is read.

4. The device according to claim 1 , further comprising a source line driver which discharges the source line,

wherein the driving force of the source line driver is variable.

5. The device according to claim 4 , wherein the source line driver includes a plurality of MOS transistors connected in parallel, and

the driving force is controlled by the number of the MOS transistors turned on.

Assignments (5)
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 24, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043709/0035 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 10, 2010
From: EDAHIRO, TOSHIAKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 024517/0272 →
Priority Claims (1)
JP 2009-147856 · Jun 22, 2009 · national
Continuity (1)
Related Publication 20100322011A1 · Dec 23, 2010