Pattern verification-test method, optical image intensity distribution acquisition method, and computer program
A pattern verification-test method according to an embodiment of the present invention includes: deriving an illumination condition at a verification-test subject position in a photomask surface of a mask pattern as a verification or a test subject based on the verification-test subject position and illumination condition information about a distribution of an illumination condition in a photomask surface of exposure light incident on the mask pattern, performing lithography simulation on the mask pattern based on the derived illumination condition and the mask pattern, and verifying or testing the mask pattern based on a result of the lithography simulation.
1. An optical image intensity distribution acquisition method, the method comprising:
acquiring an optical image intensity distribution of exposure light incident on a wafer when a mask pattern is exposed on the wafer performing lithography simulation of an optical image intensity distribution of the mask pattern using illumination condition information about a distribution of an illumination condition in a photomask surface of exposure light with which an exposure apparatus irradiates the mask pattern.
2. The optical image intensity distribution acquisition method according to claim 1 , wherein the lithography simulation of the mask pattern is performed by using contour data of the mask pattern.
3. The optical image intensity distribution acquisition method according to claim 1 , wherein the lithography simulation of the mask pattern is performed by using the contour data and information about a sidewall angle of the mask pattern.
4. A computer program product that includes computer program codes stored on a non-transitory computer readable recording medium that when executed on a computer enables the computer to execute:
acquiring an optical image intensity distribution of exposure light incident on a wafer when a mask pattern is exposed on the wafer, as a process of obtaining the optical image intensity distribution by lithography simulation, performing lithography simulation of an optical image intensity distribution of the mask pattern using illumination condition information about a distribution of an illumination condition in a photomask surface of exposure light with which an exposure device irradiates the mask pattern.
5. The computer program product according to claim 4 , wherein the illumination condition information is information about an illumination shape of exposure light incident on and transmitted through the mask pattern.
6. The computer program product according to claim 4 , wherein the illumination condition information is information about an incidence direction of exposure light incident on and reflected by the mask pattern.