Method for manufacturing SOI substrate
View Patent ↗A method is demonstrated to manufacture SOI substrates with high throughput while resources can be effectively used. The present invention is characterized by the feature in which the following process A and process B are repeated. The process A includes irradiation of a surface of a semiconductor wafer with cluster ions to form a separation layer in the semiconductor wafer. The semiconductor wafer and a substrate having an insulating surface are then overlapped with each other and bonded, which is followed by thermal treatment to separate the semiconductor wafer at or around the separation layer. A separation wafer and an SOT substrate which has a crystalline semiconductor layer over the substrate having the insulating surface are simultaneously obtained by the process A. The process B includes treatment of the separation wafer for reusing, which allows the separation wafer to be successively subjected to the process A.
1. A method for manufacturing a semiconductor device comprising:
a first step of forming a separation layer in a semiconductor wafer by irradiating the semiconductor wafer with a cluster ion from a first surface side of the semiconductor wafer;
a second step of bonding a first surface of the semiconductor wafer and a substrate to each other with an insulating layer interposed therebetween;
a third step of separating the semiconductor wafer at the separation layer or at a region near the separation layer to form a separation wafer having a separation plane and a silicon-on-insulator substrate which includes a semiconductor layer formed over the substrate with the insulating layer interposed therebetween;
a fourth step of treating the separation wafer having the separation plane; and
a fifth step of performing the first to fourth steps using the separation wafer as the semiconductor wafer of the first to third steps,
wherein the semiconductor wafer has the first surface side that contains the first surface and a second surface side opposed to the first surface side, and the first to third steps are performed only on the first surface side of the semiconductor wafer,
wherein the cluster ion comprises H 3 + ions,
wherein the H 3 + ions are contained at least 80% in a total amount of all kinds of ions generated from a source gas containing hydrogen, and
wherein the H 3 + ions are generated by thermoelectrons discharged from a filamentary electrode.
2. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the insulating layer is formed over the substrate.
3. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the fourth step of treating the separation wafer is performed only on the separation plane.
4. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the first step is performed using an ion doping apparatus.
5. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the cluster ion comprises an ion selected from a 2 H 2 + ion and a 2 H 3 + ion.
6. The method for manufacturing a semiconductor device according to claim 1 ,
wherein the fourth step includes a planarization treatment performed on the separation plane of the separation wafer, and
wherein the planarization treatment is selected from polishing treatment, etching treatment, thermal treatment, and laser beam irradiation.
7. A method for manufacturing a semiconductor device comprising:
a first step of forming a separation layer in a semiconductor wafer by irradiating the semiconductor wafer with a cluster ion;
a second step of forming an insulating layer over the semiconductor wafer by a CVD method using organosilane;
a third step of bonding the semiconductor wafer and a substrate to each other with the insulating layer interposed therebetween;
a fourth step of separating the semiconductor wafer at the separation layer or at a region near the separation layer to form a separation wafer having a separation plane and a silicon-on-insulator substrate which includes a semiconductor layer formed over the substrate with the insulating layer interposed therebetween;
a fifth step of treating the separation wafer having the separation plane; and
a sixth step of performing the first to fifth steps using the separation wafer as the semiconductor wafer of the first to fourth steps,
wherein the semiconductor wafer has a first surface side that contains a first surface and a second surface side opposed to the first surface side, and the first to fourth steps are performed only on the first surface side of the semiconductor wafer,
wherein the cluster ion comprises H 3 + ions,
wherein the H 3 + ions are contained at least 80% in a total amount of all kinds of ions generated from a source gas containing hydrogen, and
wherein the H 3 + ions are generated by thermoelectrons discharged from a filamentary electrode.
8. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the fifth step of treating the separation wafer is performed only on the separation plane.
9. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the first step is performed using an ion doping apparatus.
10. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the cluster ion comprises an ion selected from a 2 H 2 + ion and a 2 H 3 + ion.
11. The method for manufacturing a semiconductor device according to claim 7 ,
wherein the fifth step includes a planarization treatment performed on the separation plane of the separation wafer, and
wherein the planarization treatment is selected from polishing treatment, etching treatment, thermal treatment, and laser beam irradiation.
12. A method for manufacturing a semiconductor device comprising:
a first step of forming an insulating layer over a semiconductor wafer;
a second step of forming a separation layer in the semiconductor wafer by irradiating the semiconductor wafer with a cluster ion;
a third step of activating a surface of the insulating layer by irradiating the surface of the insulating layer with an atom beam or an ion beam;
a fourth step of bonding the semiconductor wafer and a substrate to each other with the insulating layer interposed therebetween;
a fifth step of separating the semiconductor wafer at the separation layer or at a region near the separation layer to form a separation wafer having a separation plane and a silicon-on-insulator substrate which includes a semiconductor layer formed over the substrate with the insulating layer interposed therebetween;
a sixth step of treating the separation wafer having the separation plane; and
a seventh step of performing the first to sixth steps using the separation wafer as the semiconductor wafer of the first to fifth steps,
wherein the semiconductor wafer has a first surface side that contains a first surface and a second surface side opposed to the first surface side, and the first to fifth steps are performed only on the first surface side of the semiconductor wafer,
wherein the cluster ion comprises H 3 + ions,
wherein the H 3 + ions are contained at least 80% in a total amount of all kinds of ions generated from a source gas containing hydrogen, and
wherein the H 3 + ions are generated by thermoelectrons discharged from a filamentary electrode.
13. The method for manufacturing a semiconductor device according to claim 12 ,
wherein the sixth step of treating the separation wafer is performed only on the separation plane.
14. The method for manufacturing a semiconductor device according to claim 12 ,
wherein the second step is performed using an ion doping apparatus.
15. The method for manufacturing a semiconductor device according to claim 12 ,
wherein the cluster ion comprises an ion selected from a 2 H 2 + ion and a 2 H 3 + ion.
16. The method for manufacturing a semiconductor device according to claim 12 ,
wherein the sixth step includes a planarization treatment performed on the separation plane of the separation wafer, and
wherein the planarization treatment is selected from polishing treatment, etching treatment, thermal treatment, and laser beam irradiation.