IP Library Granted Patent US 8,414,860
Granted Patent B2
US 8,414,860 · App. 12/463,492 · Granted Apr 9, 2013

Methods for controlling catalytic processes, including the deposition of carbon based particles

Inventor: Victor Stancovski (Groton, CT)
Assignee: Catelectric Corp.
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Quick Facts
Patent No.
US 8,414,860
App. No.
12/463,492
Granted
Apr 9, 2013
Kind
B2
Abstract

Methods and apparatus for controlling a catalytic layer deposition process are provided. A feed stream comprising a carbon source is provided to a catalyst layer. An asymmetrical alternating current is applied to the catalyst layer. A polarization impedance of the catalyst layer is monitored. The polarization impedance can be controlled by varying the asymmetrical alternating current. The controlling of the polarization impedance provides control over the structure and amount of carbon particles deposited on the catalyst layer. The carbon particles may be in the form of nanotubes, fullerenes, and/or nanoparticles.

Claims (55)

1. A method for controlling a catalytic layer deposition process, comprising:

providing a feed stream comprising a carbon source to a catalyst layer;

providing an asymmetrical alternating current to the catalyst layer;

monitoring a polarization impedance of the catalyst layer; and

controlling the polarization impedance by varying the asymmetrical alternating current;

wherein the controlling of the polarization impedance provides control over the structure and amount of carbon particles deposited on the catalyst layer.

2. A method in accordance with claim 1 , wherein the controlling of the polarization impedance further comprises correlating a time variation of the polarization with at least one of a thickness and the structure of the deposited carbon particles on the catalyst layer.

3. A method in accordance with claim 2 , wherein:

measured polarization impedance values from said monitoring are correlated to a database linking each of the polarization impedance values with data regarding at least one of the chemical nature, structure and average value for ratios of deposit volume/unit of surface area.

4. A method in accordance with claim 3 , further comprising:

applying a carrier gas containing oxygen to the catalyst layer;

monitoring a partial pressure of oxygen in the carrier gas at the catalyst layer;

adjusting the polarization impedance based on the monitoring of the partial pressure of oxygen in order to enhance the deposition of the carbon particles on the catalyst layer.

5. A method in accordance with claim 1 , wherein the catalyst layer is supported on or in close contact with a solid electrolyte.

6. A method in accordance with claim 5 , wherein an ionic conductivity of the solid electrolyte is within a range of between approximately 1 to 10 −4 ohm −1 *cm −1 .

7. A method in accordance with claim 5 , wherein:

the catalyst layer comprises one of platinum, a semiconducting oxide, a semiconducting materials; and

the solid electrolyte comprises one of stabilized zirconia, stabilized bismuth oxide, forms of beta alumina, Nafion, or a mixed conductor.

8. A method in accordance with claim 1 , wherein the carbon deposits comprise at least one of nanotubes, fullerenes, and nanoparticles.

9. A method in accordance with claim 8 , further comprising:

harvesting said at least one of nanotubes, fullerenes, and nanoparticles from the deposited carbon particles.

10. A method in accordance with claim 9 , further comprising:

varying at least one of an amplitude and a phase of the asymmetrical alternating current in order to regenerate the catalyst layer subsequent to said harvesting.

11. A method in accordance with claim 1 , wherein the carbon source comprises at least one of CO, CO 2 , hydrocarbons, oxygenated hydrocarbon-derivatives, and organic compounds.

12. A method in accordance with claim 11 , wherein the feed stream further comprises one of water or steam.

13. A method in accordance with claim 1 , further comprising:

one of extracting or electrically pumping oxygen from the catalyst layer to generate a reduction reaction for initiating or enhancing the deposition of the carbon particles onto the catalyst layer.

14. A method in accordance with claim 1 , further comprising:

monitoring deposition of the carbon particles on the catalyst layer.

15. A method in accordance with claim 14 , wherein the monitoring of the deposition of the carbon particles comprises monitoring a rate or structure of the carbon particles deposited on the catalyst layer.

16. A method in accordance with claim 14 , wherein the monitoring of the deposition of the carbon particles comprises:

monitoring at least one parameter which describes an interfacial impedance of the catalyst layer; and

determining an amount of the carbon particles deposited on the catalyst layer as a function of values of the at least one monitored parameter.

17. A method in accordance with claim 16 , wherein the at least one monitored parameter comprises at least one of the monitored polarization impedance and a phase angle of the interfacial impedance.

18. A method in accordance with claim 1 , further comprising:

varying at least one of an amplitude and a phase of the asymmetrical alternating current in order to control characteristics of the deposited layer.

19. A method in accordance with claim 18 , wherein the at least one of the amplitude and the phase of the asymmetrical alternating current is varied to bring the polarization impedance to a value within a predetermined range of values when the polarization impedance value falls outside of the predetermined range.

20. A method in accordance with claim 19 , wherein the predetermined range comprises a range of values around an original polarization impedance value of the catalyst layer prior to use.

21. A method in accordance with claim 18 , wherein the at least one of the amplitude and the phase of the asymmetrical alternating current is varied to achieve a phase angle of an interfacial impedance of the catalyst layer which is within a range of between approximately −10 degrees and +10 degrees.

22. A method in accordance with claim 1 , further comprising:

applying at least one of water, steam, oxygen, and heat to the catalyst layer; and

controlling the application of the at least one of the water, steam, oxygen, and heat in order to control the deposition of the carbon particles on the catalyst layer.

23. A method in accordance with claim 1 , further comprising:

applying a carrier gas containing oxygen to the catalyst layer; and

controlling the partial pressure of oxygen in the carrier gas in order to enhance the deposition of the carbon particles on the catalyst layer.

24. A method in accordance with claim 1 , wherein the feed stream may comprise at least one of a liquid phase and a gas phase.

25. A method in accordance with claim 24 , further comprising at least one of (a) varying at least one of a phase and an amplitude of the alternating current, and (b) controlling at least one of an amount of water, steam, and oxygen applied to the catalyst layer or to a deposited layer formed by the deposition of the carbon particles in order to provide at least one of (i) a reduction of the at least one of the liquid phase and gas phase in contact with the catalyst layer, and (ii) stimulate growth of the deposited layer.

26. A method in accordance with claim 24 , further comprising:

controlling an amount of heat applied to the catalyst layer in order to further control at least one of the structure and a thickness of the deposited carbon particles on the catalyst layer.

27. A method for controlling a catalytic layer deposition process, comprising: providing a feed stream to a catalyst layer, the feed stream comprising at least one of carbon, silicon, doped silicon, silicon carbide, gallium arsenide, niobium, and boron;

providing an asymmetrical alternating current to the catalyst layer;

monitoring a polarization impedance of the catalyst layer; and

controlling the polarization impedance by varying the asymmetrical alternating current;

forming a deposition layer on the catalyst layer as a function of the controlling of the polarization impedance;

wherein the deposition layer comprises at least one of nanotubes, fullerenes, and nanoparticles.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 15, 2009
From: STANCOVSKI, VICTOR
To: CATELECTRIC CORP.
Reel/Frame 022985/0966 →
Continuity (5)
Continuation In Part 11588113 · Oct 25, 2006
Continuation In Part 10423376 · Apr 25, 2003
Provisional Application 61127377 · May 12, 2008
Provisional Application 60731570 · Oct 28, 2005
Related Publication 20090321265A1 · Dec 31, 2009