IP Library Granted Patent US 8,419,854
Granted Patent B2
US 8,419,854 · App. 12/450,265 · Granted Apr 16, 2013

Film-forming apparatus

Inventors: Masanobu Hatanaka (Susono, JP); Osamu Irino (Susono, JP); Michio Ishikawa (Susono, JP)
Assignee: Ulvac, Inc.
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Quick Facts
Patent No.
US 8,419,854
App. No.
12/450,265
Granted
Apr 16, 2013
Kind
B2
Abstract

In a film-forming apparatus in which two or more gases are used, a uniform film is formed. In a film-forming apparatus provided with a film-forming chamber and a shower head, the shower head is provided with a material gas diffusion chamber and a reactive gas diffusion chamber. A gas passage which communicates the material gas diffusion chamber and a material gas introduction pipe is constituted into multi-stages of one stage or more. Each stage has a gas passage represented by 2 n-1 (where n is the number of stages). The first-stage gas passage has connected to the center thereof the material gas introduction pipe. Each of second-stage and subsequent-stage gas passages has connected to the center thereof connection holes which are provided on both ends of the previous-stage gas passages so as to be in communication with the previous-stage gas passages. Each of the final-stage gas passages is connected to the material gas diffusion chamber by connection holes formed on both ends of each of the gas passages.

Claims (19)

1. A film-forming apparatus comprising a film-forming chamber and a shower head unit, the shower head unit having:

a square material gas diffusion chamber having four corners; and

a reactive gas diffusion chamber,

wherein

a gas passage connecting the square material gas diffusion chamber and a material gas introduction pipe together is constituted into two stages, a first stage having a number of first-stage gas passages and a second stage having a number of second-stage gas passages, the number of gas passages in each stage being represented by 2 n-1 (where n represents the number of the stage),

the material gas introduction pipe is connected to a center of a first-stage gas passage,

the first-stage gas passage communicates with the second-stage gas passages by connection holes that are provided on both ends of the first-stage gas passage and are connected to a center of each of the second-stage gas passages, and

each of the second-stage gas passages is connected to the four corners of the square material gas diffusion chamber by connection holes formed on both ends of each of the second-stage gas passages.

2. The film-forming apparatus according to claim 1 , wherein

the material gas diffusion chamber is disposed at a bottom of the reactive gas diffusion chamber,

the material gas introduction pipe is disposed on a wall surface of the reactive gas diffusion chamber, and

each of the gas passages formed in each of the stages is formed in a circular arc-shape.

3. The film-forming apparatus according to claim 1 , further comprising:

a plasma generating means disposed on an upstream side of the shower head unit, the plasma generating means including:

a coaxial resonant cavity provided with conducting bodies disposed at a distance from each other in an upper portion and a lower portion of an outer circumference of a non-metallic pipe for introducing the reactive gas; and

a microwave supply circuit in which a height inside the coaxial resonant cavity is an integer time of ½ of an exciting wavelength, in which the gas injected from one end of the nonmetallic pipe is excited by microwaves in a region not provided with the nonmetallic pipe so as to be discharged, after conversion to plasma, out of the other end of the nonmetallic pipe, and in which the gas converted to plasma by the plasma generating means is introduced into the reactive gas diffusion chamber.

4. The film-forming apparatus according to claim 3 , further comprising a cooling means disposed in the coaxial resonant cavity so as to introduce a cooling gas into the cavity, thereby cooling that portion of the nonmetallic pipe which is not provided with a conductor.

5. The film-forming apparatus according to claim 3 , wherein the nonmetallic pipe is double-walled, and the cooling fluid is circulated in the clearance between the double walls.

6. The film-forming apparatus according to claim 1 , further comprising a catalyst chamber in an upstream portion of the shower head unit, the catalyst chamber having a reactive gas introduction pipe, a metallic wire, and a heating means for heating the metallic wire, the catalyst chamber being so constructed and arranged that the gas introduced by the reactive gas introduction pipe is excited by the heated metallic wire and that the excited gas is introduced into the reactive gas diffusion chamber.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 25, 2010
From: HATANAKA, MASANOBU; IRINO, OSAMU; ISHIKAWA, MICHIO
To: ULVAC, INC.
Reel/Frame 023994/0360 →
Priority Claims (1)
JP 2007-108027 · Apr 17, 2007 · national
Continuity (1)
Related Publication 20100180819A1 · Jul 22, 2010