Image sensor and method of fabricating the same
The image sensor includes a substrate, an insulating structure formed on a first surface of the substrate and including a first metal wiring layer exposed by a contact hole penetrating the substrate, a conductive spacer formed on sidewalls of the contact hole and electrically connected to the first metal wiring layer, and a pad formed on a second surface of the substrate and electrically connected to the first metal wiring layer.
1. An image sensor comprising:
a substrate;
an insulating structure formed on a first surface of the substrate and including a first metal wiring layer exposed by a contact hole penetrating the substrate;
a conductive spacer formed on sidewalls of the contact hole and electrically connected to the first metal wiring layer;
an insulating spacer formed between the sidewalls of the contact hole and the conductive spacer, the insulating spacer directly contacting the first metal wiring layer; and
a conductive pattern formed on a second surface of the substrate and electrically connected to the first metal wiring layer, the conductive pattern including a pad and a contact, the contact directly contacting the first metal wiring layer on a bottom surface of the contact hole.
2. The image sensor of claim 1 , wherein the conductive spacer is a chemical vapor deposition (CVD) film containing tungsten, and the pad contains aluminum.
3. An image sensor comprising:
a semiconductor substrate including a pad region, an optical black (OB) region, and a sensing region;
an insulating structure formed on a first surface of the substrate and including a first metal wiring layer exposed by a contact hole penetrating the semiconductor substrate;
a conductive pattern formed on a second surface of the semiconductor substrate in the pad region and electrically connected to the first metal wiring layer, the conductive pattern including a pad and a contact integrally formed on the second surface of the substrate, the contact directly contacting the first metal wiring layer on a bottom surface of the contact hole;
a blocking film formed on the insulating structure in the OB region and at the same height as the pad to cover the OB region; and
a first passivation film formed between the second surface of the semiconductor substrate and the conductive pattern.
4. The image sensor of claim 3 , further comprising:
a buffer oxide film formed between the second surface of the semiconductor substrate and the first passivation film to cover the semiconductor substrate, wherein the first passivation film is formed on the buffer oxide film to have a same pattern as the conductive pattern.
5. The image sensor of claim 3 , further comprising:
a second passivation film formed on the conductive pattern.
6. The image sensor of claim 5 , wherein the second passivation film includes a contact hole which exposes at least a portion of the pad.
7. The image sensor of claim 5 , further comprising:
a buffer oxide film formed between the second surface of the semiconductor substrate and the first passivation film to cover the semiconductor substrate, and the first and second passivation films are patterned to expose the buffer oxide film in the sensing region.
8. The image sensor of claim 3 , wherein a logic region is further defined in the semiconductor substrate, and the blocking film is further formed on the insulating structure in the logic region to block light from entering the logic region.