IP Library › Granted Patent US 8,435,416
Granted Patent B2
US 8,435,416 · App. 13/278,862 · Granted May 7, 2013

Method for manufacturing porous structure and method for forming pattern

Inventors: Koji Asakawa (Tokyo, JP); Toshiro Hiraoka (Tokyo, JP); Yoshihiro Akasaka (Tokyo, JP); Yasuyuki Hotta (Tokyo, JP)
Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 8,435,416
App. No.
13/278,862
Granted
May 7, 2013
Kind
B2
Abstract

A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc-No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

Claims (10)

1. A method for forming a pattern comprising:

forming a film made of a pattern forming material comprising a copolymer having a polystyrene derivative and a polymethacrylate derivative containing silsesquioxane on a substrate;

forming a microphase-separated structure in the film;

etching the substrate by using a phase of the poly methacrylate derivative containing silsesquioxane, thereby transferring the pattern of the microphase-separated structure to the substrate.

2. The method according to claim 1 , wherein the polymethacrylate derivative containing silsesquioxane is a polymethacrylate having a unit containing silsesquioxane represented by the following formula, in a side chain:

where R is hydrogen, or unsubstituted or substituted alkyl, aryl or aralkyl.

3. The method according to claim 1 , wherein the polymethacrylate derivative containing silsesquioxane is a block copolymer or a graft copolymer synthesized from a monomer represented by the following formula:

where R is hydrogen, or unsubstituted or substituted alkyl, aryl or aralkyl.

4. The method according to claim 1 , wherein the polystyrene derivative is a styrene-terminated polyethylene oxide macromer (a) represented by the following formula and the poly methacrylate derivative containing silsesquioxane is a graft polymer synthesized from a monomer (b) represented by the following formula:

where R is hydrogen, or unsubstituted or substituted alkyl, aryl or aralkyl.

Priority Claims (3)
JP 11-159479 · Jun 7, 1999 · national
JP 11-262326 · Sep 16, 1999 · national
JP 2000-169263 · Jun 6, 2000 · national
Continuity (5)
Division 12355170 · Jan 16, 2009
Division 11455916 · Jun 20, 2006
Division 10347956 · Jan 22, 2003
Division 09588721 · Jun 7, 2000
Related Publication 20120037595A1 · Feb 16, 2012