Metal-insulator-metal (MIM) device and method of formation thereof
View Patent ↗In a method of fabricating a metal-insulator-metal (MIM) device, initially, a first electrode is provided. An oxide layer is provided on the first electrode, and a protective layer is provided on the oxide layer. An opening through the protective layer is provided to expose a portion of the oxide layer, and a portion of the first electrode underlying the exposed portion of the oxide layer is oxidized. A second electrode is provided in contact with the exposed portion of the oxide layer. In alternative embodiments, the initially provided oxide layer may be eliminated, and spacers of insulating material may be provided in the opening.
1. A metal-insulator-metal (MIM) device comprising:
a first electrode having a layer of oxidation formed therein wherein a top surface of said first electrode and a top surface of said layer of oxidation are coplanar;
an oxide layer formed above the first electrode and on the top surface of the layer of oxidation wherein the oxide layer contacts and covers the entire top surface of the layer of oxidation, contacts and covers the entire top surface of the first electrode and contacts and covers the side surfaces of the first electrode;
a protective layer over the first electrode and having an opening therethrough;
a spacer of insulating material on a wall of the opening in the protective layer;
a second electrode in contact with the oxide layer and spacer; and
a conductive plug that contacts the bottom of the first electrode and the top of a conductive layer.
2. The device of claim 1 wherein the protective layer is on the oxide layer.
3. The device of claim 1 wherein the second electrode extends above the protective layer.
4. The device of claim 1 wherein the device is incorporated in an array.
5. The device of claim 1 and further comprising said device incorporated in a system.
6. The device of claim 5 wherein the system is selected from the group consisting of a hand-held device, a vehicle, and a computer.
7. A memory array comprising:
a plurality of wordlines;
a plurality of bitlines; and
a plurality of memory devices coupled to respective wordlines and bitlines comprising:
a first electrode having a layer of oxidation formed therein wherein a top surface of said first electrode and a top surface of said layer of oxidation are coplanar;
an oxide layer formed above the first electrode and on the top surface of the layer of oxidation wherein the oxide layer contacts and covers the entire top surface of the layer of oxidation, contacts and covers the entire top surface of the first electrode and contacts and covers the side surfaces of the first electrode;
a protective layer over the first electrode and having an opening therethrough;
a spacer of insulating material on a wall of the opening in the protective layer;
a second electrode in contact with the oxide layer and spacer; and
a conductive plug that contacts the bottom of the first electrode and the top of a conductive layer.
8. The memory array of claim 7 wherein the protective layer is on the oxide layer.
9. The memory array of claim 8 wherein the second electrode extends above the protective layer.
10. The memory array of claim 8 and further comprising said array incorporated in a system.
11. The memory array of claim 10 wherein the system is selected from the group consisting of a hand-held device, a vehicle, and a computer.