Semiconductor device and method for manufacturing the same
An object of an embodiment of the present invention is to provide a semiconductor device provided with a thin film transistor which includes an oxide semiconductor layer and has high electric characteristics. The semiconductor device includes a gate electrode over an insulating surface, an oxide semiconductor layer including silicon oxide, an insulating layer between the gate electrode and the oxide semiconductor layer, and source and drain regions between the oxide semiconductor layer including silicon oxide and source and drain electrode layers. The source and drain regions are formed using a degenerate oxide semiconductor material or a degenerate oxynitride material.
1. A method for manufacturing a semiconductor device comprising:
forming a gate electrode over an insulating surface;
forming an insulating layer over the gate electrode;
forming an oxide semiconductor layer including silicon oxide over the insulating layer by a sputtering method using a first oxide semiconductor target including silicon oxide at 2.5 wt % to 20 wt % inclusive; and
forming an oxynitride layer over the oxide semiconductor layer including silicon oxide in an atmosphere including nitrogen using a second oxide semiconductor target to form a source region and a drain region.
2. The method for manufacturing a semiconductor device according to claim 1 , further comprising a step of removing part of the oxynitride layer, which overlaps with the gate electrode so that part of the oxide semiconductor layer including silicon oxide is exposed, after forming the oxynitride layer.
3. The method for manufacturing a semiconductor device according to claim 1 , wherein the semiconductor device is one selected from the group consisting of an electronic book, a television set, an amusement machine, and a phone.
4. A method for manufacturing a semiconductor device comprising:
forming an oxide semiconductor layer over an insulating surface by a sputtering method using a first oxide semiconductor target including silicon oxide at 2.5 wt % to 20 wt % inclusive;
forming an oxynitride layer over the oxide semiconductor layer including silicon oxide by a sputtering method using a second oxide semiconductor target in an atmosphere including nitrogen to form a source region and a drain region;
forming an insulating layer covering the oxynitride layer; and
forming a gate electrode over the insulating layer.
5. The method for manufacturing a semiconductor device according to claim 4 , wherein the semiconductor device is one selected from the group consisting of an electronic book, a television set, an amusement machine, and a phone.