Solid-state imaging device, method of manufacturing the same, and electronic apparatus
A solid-state imaging device including a semiconductor substrate, a photoelectric conversion portion interposed between a lower electrode and an upper electrode, a contact plug formed so as to connect the lower electrode and the semiconductor substrate in order to read signal charges generated in the photoelectric conversion portion to the semiconductor substrate side, a vertical type transmitting path configured by sequentially laminating a connection portion for electrically connecting the contact plug to the semiconductor substrate, a charge accumulation layer for accumulating the signal charges read to the connection portion, and a potential barrier layer configuring a potential barrier between the connection portion and the charge accumulation layer in a vertical direction of the semiconductor substrate, and a charge reading portion configured to read the signal charges accumulated in the charge accumulation layer to the circuit forming surface side of the semiconductor substrate.
1. A solid state imaging device comprising:
a semiconductor region over a multi-layer wiring layer;
a charge accumulation layer in the semiconductor region;
a barrier layer on the charge accumulation layer; and
a connection portion on the barrier layer,
wherein,
the charge accumulation layer has an impurity concentration lower than that of the connection portion.
2. The solid state imaging device of claim 1 wherein, the barrier layer and the connection portion are stacked such that the barrier layer is positioned closer to the multilayer wiring layer than the connection portion.
3. The solid state imaging device of claim 1 wherein, the barrier layer and the charge accumulation layer are stacked such that the charge accumulation layer is positioned closer to the multilayer wiring layer than the barrier layer.
4. The solid state imaging device of claim 1 , comprising:
an insulating film on the connection portion;
a contact portion that is in contact with the connection portion and extends through the insulating film.
5. The solid state imaging device of claim 4 , wherein the contact portion electrically connects the connection portion to an electrode over the insulating film.
6. The solid state imaging device of claim 5 , comprising a conversion film on an electrode.
7. The solid state imaging device of claim 4 , wherein the insulating film has a negative fixed charge.
8. The solid state imaging device of claim 4 , wherein the insulating film has a high refractive index.
9. The solid state imaging device of claim 4 , wherein the insulating film comprises hafnium oxide.
10. The solid state imaging device of claim 4 , wherein the insulating film comprises a material selected from the group consisting of: aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), tantalum oxide (Ta 2 O 5 ), titanium oxide (TiO 2 ), lanthanum oxide (La 2 O 3 ), praseodymium oxide (Pr 2 O 3 ), cerium oxide (CeO 2 ), neodymium oxide (Nd 2 O 3 ), promethium oxide (Pm 2 O 3 ), samarium oxide (Sm 2 O 3 ), europium oxide (Eu 2 O 3 ), gadolinium oxide (Gd 2 O 3 ), terbium oxide (Tb 2 O 3 ), dysprosium oxide (Dy 2 O 3 ), holmium oxide (Ho 2 O 3 ), thulium oxide (Tm 2 O 3 ), ytterbium oxide (Yb 2 O 3 ), lutetium oxide (Lu 2 O 3 ), yttrium oxide (Y 2 O 3 ), hafnium nitride film, an aluminum nitride film, a hafnium oxynitride film, and an aluminum oxynitride film.
11. The solid state imaging device of claim 1 , comprising a light shielding film over the connection portion.
12. The solid state imaging device of claim 1 , wherein the impurity concentration of the charge accumulation layer increases proceeding in a direction toward the semiconductor region.
13. A method of manufacturing a solid state imaging device comprising the steps of:
forming a semiconductor region over a multi-layer wiring layer;
forming a charge accumulation layer in the semiconductor region;
forming a barrier layer on the charge accumulation layer; and
forming a connection portion on the barrier layer,
wherein,
the charge accumulation layer has an impurity concentration lower than that of the connection portion.
14. The method of claim 13 wherein, the barrier layer and the connection portion are stacked such that the barrier layer is positioned closer to the multilayer wiring layer than the connection portion.
15. The method of claim 13 wherein, the barrier layer and the charge accumulation layer are stacked such that the charge accumulation layer is positioned closer to the multilayer wiring layer than the barrier layer.
16. The method of claim 13 , comprising the steps of
forming an insulating film on the connection portion; and
forming a contact portion that is in contact with the connection portion and that extends through the insulating film.
17. The method of claim 16 , wherein the insulating film comprises hafnium oxide.
18. The method of claim 16 , wherein the insulating film comprises a material selected from the group consisting of: aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), tantalum oxide (Ta 2 O 5 ), titanium oxide (TiO 2 ), lanthanum oxide (La 2 O 3 ), praseodymium oxide (Pr 2 O 3 ), cerium oxide (CeO 2 ), neodymium oxide (Nd 2 O 3 ), promethium oxide (Pm 2 O 3 ), samarium oxide (Sm 2 O 3 ), europium oxide (Eu 2 O 3 ), gadolinium oxide (Gd 2 O 3 ), terbium oxide (Tb 2 O 3 ), dysprosium oxide (Dy 2 O 3 ), holmium oxide (Ho 2 O 3 ), thulium oxide (Tm 2 O 3 ), ytterbium oxide (Yb 2 O 3 ), lutetium oxide (Lu 2 O 3 ), yttrium oxide (Y 2 O 3 ), hafnium nitride film, an aluminum nitride film, a hafnium oxynitride film, and an aluminum oxynitride film.
19. The method claim 16 , wherein the contact portion electrically connects the connection portion to an electrode over the insulating film.
20. The method of claim 19 , comprising the step of forming a conversion film on the electrode.
21. The method of claim 13 , comprising the step of forming a light shielding film over the connection portion.
22. The method of claim 13 , wherein the impurity concentration of the charge accumulation layer gradually increases towards the semiconductor region.
23. An electronic apparatus comprising:
a solid state imaging device comprising:
(i) a semiconductor region over a multi-layer wiring layer;
(ii) a charge accumulation layer in the semiconductor region;
(iii) a barrier layer on the charge accumulation layer; and
(iv) a connection portion on the barrier layer,
wherein,
the charge accumulation layer has an impurity concentration lower than that of the connection portion.
24. The electronic apparatus of claim 23 wherein, the barrier layer and the connection portion are stacked such that the barrier layer is positioned closer to the multilayer wiring layer than the connection portion.
25. The electronic apparatus of claim 23 wherein, the barrier layer and the charge accumulation layer are stacked such that the charge accumulation layer is positioned closer to the multilayer wiring layer than the barrier layer.
26. The electronic apparatus of claim 23 , comprising a shutter device positioned on one side of the solid state imaging device.
27. The electronic apparatus of claim 23 , comprising:
an insulating film on the connection portion;
a contact portion that is in contact with the connection portion and extends through the insulating film.
28. The electronic apparatus of claim 27 , wherein the insulating film comprises hafnium oxide.
29. The electronic apparatus of claim 27 , wherein the insulating film comprises a material selected from the group consisting of: aluminum oxide (Al 2 O 3 ), zirconium oxide (ZrO 2 ), tantalum oxide (Ta 2 O 5 ), titanium oxide (TiO 2 ), lanthanum oxide (La 2 O 3 ), praseodymium oxide (Pr 2 O 3 ), cerium oxide (CeO 2 ), neodymium oxide (Nd 2 O 3 ), promethium oxide (Pm 2 O 3 ), samarium oxide (Sm 2 O 3 ), europium oxide (Eu 2 O 3 ), gadolinium oxide (Gd 2 O 3 ), terbium oxide (Tb 2 O 3 ), dysprosium oxide (Dy 2 O 3 ), holmium oxide (Ho 2 O 3 ), thulium oxide (Tm 2 O 3 ), ytterbium oxide (Yb 2 O 3 ), lutetium oxide (Lu 2 O 3 ), yttrium oxide (Y 2 O 3 ), hafnium nitride film, an aluminum nitride film, a hafnium oxynitride film, and an aluminum oxynitride film.