Method for producing single crystalline diamonds

1. A method for producing one or more single crystalline diamonds, the method comprising the steps of:

(a) placing one or more substrates on a substrate holder in a chemical vapor deposition (CVD) vacuum chamber, wherein growth faces of the one or more substrates have a crystallographic orientation of (100);

(b) providing a mixture of gases, including at least one gas having a carbon component, adjacent to the one or more substrates in the CVD vacuum chamber;

(c) generating plasma from the mixture of gases by exposing the mixture of gases to a microwave radiation;

(d) introducing free radicals of nitrogen in the plasma, wherein the free radicals of nitrogen are produced in a remote reactive gas generator, wherein concentration of the free radicals of nitrogen is 0.05 ppm to 1 ppm; and

(e) exposing the one or more substrates to the plasma under conditions wherein diamond growth occurs on the growth faces of the one or more substrates to produce the one or more single crystalline diamonds.

2. The method of claim 1 , wherein the one or more substrates are diamonds.

3. The method of claim 1 , wherein the one or more substrates are selected from the group consisting of a natural diamond, a HPHT grown synthetic diamond and a CVD grown synthetic diamond.

4. The method of claim 1 , wherein the one or more substrates are cleaned before the one or more substrates are placed on the substrate holder in the CVD vacuum chamber.

5. The method of claim 1 , wherein the mixture of gases comprises hydrogen and methane.

6. The method of claim 5 , wherein the mixture of gases further comprises oxygen.

7. The method of claim 1 , wherein the one or more substrates are maintained at a temperature ranging from 850° degree C. to 1250° degree C. in the CVD vacuum chamber.

8. The method of claim 1 , wherein the CVD vacuum chamber is maintained at a pressure ranging from 120 to 220 Torr.

9. The method of claim 1 , wherein the diamond growth occurs inside the CVD vacuum chamber for 50 to 200 hours.

10. The method of claim 1 , wherein the diamond growth occurs at a rate of 10 to 100 microns per hour.

11. The method of claim 1 , wherein the step of providing the mixture of gases adjacent to the one or more substrates in the CVD vacuum chamber further comprises maintaining a flow of hydrogen at 500 sccm.

12. The method of claim 1 , wherein the step of providing the mixture of gases adjacent to the one or more substrates in the CVD vacuum chamber further comprises maintaining a flow of methane at 35 sccm to 80 sccm.

13. The method of claim 1 , wherein the one or more single crystalline diamonds are colorless.

14. The method of claim 1 , wherein the one or more single crystalline diamonds are near colorless.

15. A method for producing one or more single crystalline diamonds, the method comprising the steps of:

(a) placing one or more substrates on a substrate holder in a chemical vapor deposition (CVD) vacuum chamber, wherein growth faces of the one or more substrates have a crystallographic orientation of (100);

(b) providing a mixture of gases, including at least one gas having a carbon component, adjacent to the one or more substrates in the CVD vacuum chamber;

(c) generating plasma from the mixture of gases by exposing the mixture of gases to a microwave radiation;

(d) introducing free radicals of nitrogen in the plasma, wherein the free radicals of nitrogen are produced in a remote reactive gas generator, wherein concentration of the free radicals of nitrogen is 0.005 ppm to 2 ppm; and

(e) exposing the one or more substrates to the plasma under conditions wherein diamond growth occurs on the growth faces of the one or more substrates to produce the one or more single crystalline diamonds.

16. The method of claim 15 , wherein the one or more substrates are diamonds.

17. The method of claim 15 , wherein the one or more substrates are selected from the group consisting of a natural diamond, a HPHT grown synthetic diamond and a CVD grown synthetic diamond.

18. The method of claim 15 , wherein the one or more substrates are cleaned before the one or more substrates are placed on the substrate holder in the CVD vacuum chamber.

19. The method of claim 15 , wherein the mixture of gases comprises hydrogen and methane.

20. The method of claim 19 , wherein the mixture of gases further comprises oxygen.

21. The method of claim 15 , wherein the one or more substrates are maintained at a temperature ranging from 850° degree C. to 1250° degree C. in the CVD vacuum chamber.

22. The method of claim 15 , wherein the CVD vacuum chamber is maintained at a pressure ranging from 120 to 220 Torr.

23. The method of claim 15 , wherein the diamond growth occurs inside the CVD vacuum chamber for 50 to 200 hours.

24. The method of claim 15 , wherein the diamond growth occurs at a rate of 10 to 100 microns per hour.

25. The method of claim 15 , wherein the step of providing the mixture of gases adjacent to the one or more substrates in the CVD vacuum chamber further comprises maintaining a flow of hydrogen at 500 sccm.

26. The method of claim 15 , wherein the step of providing the mixture of gases adjacent to the one or more substrates in the CVD vacuum chamber further comprises maintaining a flow of methane at 35 sccm to 80 sccm.

27. The method of claim 15 , wherein the one or more single crystalline diamonds are colorless.

28. The method of claim 15 , wherein the one or more single crystalline diamonds are near colorless.