Projection optical system, exposure apparatus, and device manufacturing method
A projection optical system is configured to project an image of an object plane onto an image plane, and includes a first optical element having an aspheric shape that is rotationally asymmetric with respect to an optical axis, a moving unit configured to move the first optical element in a direction perpendicular to the optical axis, and a second optical element fixed on the optical axis, and configured to reduce an optical path length difference caused by an aspheric surface of the first optical element, the second optical element having no aspheric shape complement to the aspheric shape of the first optical element.
1. A projection optical system configured to project an image of an object plane onto an image plane, said projection optical system comprising:
a first optical element having an aspheric surface that is rotationally asymmetric with respect to an optical axis;
a moving unit configured to move the first optical element in a direction perpendicular to the optical axis; and
a second optical element having an aspheric surface and fixed on the optical axis,
wherein the aspheric surface of the second optical element is configured to reduce an aberration due to the aspheric surface of the first optical element when the first optical element is located at a predetermined position,
wherein the first optical element corrects an aberration of the projection optical system by moving away from the predetermined position in the direction perpendicular to the optical axis, and
wherein the aspheric surface of the second optical element is not complementary to the aspheric surface of the first optical element.
2. The projection optical system according to claim 1 , wherein the first optical element is adjacent to the second optical element.
3. The projection optical system according to claim 1 , wherein:
the first optical element is arranged close to the object plane, and
the first optical element adjusts a magnification or a distortion.
4. The projection optical system according to claim 1 , wherein:
the first optical element is arranged close to the image plane, and
the first optical element adjusts at least one of a magnification, a distortion, a spherical aberration, or an astigmatism.
5. An exposure apparatus comprising:
a projection optical system configured to project an image of an original plane onto a substrate plane,
wherein the projection optical system comprises:
a first optical element having an aspheric surface that is rotationally asymmetric with respect to an optical axis;
a moving unit configured to move the first optical element in a direction perpendicular to the optical axis; and
a second optical element having an aspheric surface and fixed on the optical axis,
wherein the aspheric surface of the second optical element is configured to reduce an aberration due to the aspheric surface of the first optical element when the first optical element is located at a predetermined position,
wherein the first optical element corrects an aberration of the projection optical system by moving away from the predetermined position in the direction perpendicular to the optical axis, and
wherein the aspheric surface of the second optical element is not complementary to the aspheric surface of the first optical element.
6. A device manufacturing method comprising the steps of:
exposing a substrate using an exposure apparatus; and
developing the substrate that has been exposed,
wherein the exposure apparatus includes a projection optical system configured to project an image of an original plane onto a substrate plane,
wherein the projection optical system comprises:
a first optical element having an aspheric surface that is rotationally asymmetric with respect to an optical axis;
a moving unit configured to move the first optical element in a direction perpendicular to the optical axis; and
a second optical element having an aspheric surface and fixed on the optical axis,
wherein the aspheric surface of the second optical element is configured to reduce an aberration due to the aspheric surface of the first optical element when the first optical element is located at a predetermined position,
wherein the first optical element corrects an aberration of the projection optical system by moving away from the predetermined position in the direction perpendicular to the optical axis, and
wherein the aspheric surface of the second optical element is not complementary to the aspheric surface of the first optical element.
7. A projection optical system comprising:
a first optical element having an aspheric surface that is rotationally asymmetric with respect to an optical axis of the projection optical system; and
a second optical element having an aspheric surface that is not complementary to the aspheric surface of the first optical element,
wherein the aspheric surface of the second optical element is configured to reduce an aberration due to the aspheric surface of the first optical element when the first optical element is located at a predetermined position, and
wherein the first optical element corrects an aberration of the projection optical system by moving away from the predetermined position in a direction perpendicular to the optical axis.
8. The projection optical system according to claim 7 , wherein the first optical element is adjacent to the second optical element.
9. The projection optical system according to claim 7 , wherein:
the first optical element is arranged close to an object plane, and
the first optical element adjusts a magnification or a distortion.
10. The projection optical system according to claim 7 , wherein:
the first optical element is arranged close to an image plane of the projection optical system, and
the first optical element adjusts at least one of a magnification, a distortion, a spherical aberration, or an astigmatism.
11. An exposure apparatus comprising:
a projection optical system configured to project an image of an original onto a substrate,
wherein the projection optical system comprises:
a first optical element having an aspheric surface that is rotationally asymmetric with respect to an optical axis of the projection optical system; and
a second optical element having an aspheric surface that is not complementary to the aspheric surface of the first optical element,
wherein the aspheric surface of the second optical element is configured to reduce an aberration due to the aspheric surface of the first optical element when the first optical element is located at a predetermined position, and
wherein the first optical element corrects an aberration of the projection optical system by moving away from the predetermined position in a direction perpendicular to the optical axis.
12. A device manufacturing method comprising the steps of:
exposing a substrate using an exposure apparatus; and
developing the substrate that has been exposed,
wherein the exposure apparatus includes a projection optical system configured to project an image of an original onto a substrate,
wherein the projection optical system comprises:
a first optical element having an aspheric surface that is rotationally asymmetric with respect to an optical axis of the projection optical system; and
a second optical element having an aspheric surface that is not complementary to the aspheric surface of the first optical element,
wherein the aspheric surface of the second optical element is configured to reduce an aberration due to the aspheric surface of the first optical element when the first optical element is located at a predetermined position, and
wherein the first optical element corrects an aberration of the projection optical system by moving away from the predetermined position in a direction perpendicular to the optical axis.