Substrate processing apparatus, substrate processing system and inspection/periphery exposure apparatus
An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.
1. A substrate processing apparatus that is disposed adjacent to an exposure device that subjects a substrate to exposure processing, comprising:
a film formation unit arranged to form a photosensitive film on the substrate before the exposure processing by said exposure device;
a development unit arranged to subject the photosensitive film on the substrate to development processing after the exposure processing by said exposure device;
an inspection/periphery exposure unit arranged to inspect a surface condition of the substrate and subject a peripheral portion of the photosensitive film on the substrate to exposure processing after the photosensitive film is formed by said film formation unit and before the exposure processing is performed by said exposure device; and
a transport device arranged to transport the substrate among said film formation unit, said development unit, said inspection/periphery exposure unit and said exposure device, wherein said inspection/periphery exposure unit includes:
a substrate holding/rotating device arranged to rotate the substrate while holding the substrate;
a surface condition detector arranged to detect the surface condition of the substrate rotated by said substrate holding/rotating device; and
a light irradiator for exposure arranged to irradiate a portion of the photosensitive film formed on a peripheral portion of the substrate rotated by said substrate holding/rotating device with light for exposure, to perform edge exposure processing.
2. The substrate processing apparatus according to claim 1 , further comprising a controller arranged to determine whether or not the surface condition of the substrate is normal based on a result of inspection of the surface condition of the substrate in said inspection/periphery exposure unit, and control said transport device to transport the substrate determined to be normal to said exposure device and control said transport device not to transport the substrate determined not to be normal to said exposure device.
3. The substrate processing apparatus according to claim 2 , further comprising a storage arranged to store the substrate determined not to be normal by said controller.
4. The substrate processing apparatus according to claim 3 , further comprising a container platform on which a storing container is placed, wherein
said controller is arranged to control said transport device to sequentially take substrates out of said storing container, and control said transport device to cause the substrates that have been subjected to the exposure processing by said exposure device and the development processing by said development unit and the substrates stored in said storage to be stored in said storing container in the same order as that in which the substrates have been taken out from said storing container.
5. The substrate processing apparatus according to claim 1 , further comprising:
a processing section; and
an interface that is disposed between said processing section and said exposure device and is arranged to carry the substrate in and out of said exposure device, wherein
said film formation unit and said development unit are provided in said processing section,
said inspection/periphery exposure unit is provided in at least one of said processing section and said interface, and
said transport device includes
a transport mechanism for the processing section arranged to transport the substrate in said processing section, and
a transport mechanism for the interface arranged to transport the substrate in said interface.
6. The substrate processing apparatus according to claim 5 , wherein
said processing section includes a first level section and a second level section,
said film formation unit includes a first film formation unit provided in said first level section and a second film formation unit provided in said second level section,
said development unit includes a first development unit provided in said first level section and a second development unit provided in said second level section,
said inspection/periphery exposure unit includes a first inspection/periphery exposure unit provided in said first level section and a second inspection/periphery exposure unit provided in said second level section,
said transport mechanism for the processing section includes
a first transport mechanism that is provided in said first level section and transports the substrate in said first level section, and
a second transport mechanism that is provided in said second level section and transports the substrate in said second level section.
7. The substrate processing apparatus according to claim 6 , wherein
said controller is arranged to
determine whether or not the surface condition of the substrate is normal based on a result of inspection of the surface condition of the substrate in said first inspection/periphery exposure unit, control said first transport mechanism to transport the substrate determined to be normal to said interface, and control said first transport mechanism not to transport the substrate determined not to be normal to said interface, and
determine whether or not the surface condition of the substrate is normal based on a result of inspection of the surface condition of the substrate in said second inspection/periphery exposure unit, control said second transport mechanism to transport the substrate determined to be normal to said interface, and control said second transport mechanism not to transport the substrate determined not to be normal to said interface.
8. The substrate processing apparatus according to claim 1 , wherein
said inspection/periphery exposure unit further includes
an outer edge detector arranged to detect a position of an outer edge of the substrate rotated by said substrate holding/rotating device.
9. The substrate processing apparatus according to claim 8 , wherein said surface condition detector is configured to detect the surface condition of the substrate when the position of the outer edge is detected by said outer edge detector.
10. A substrate processing system comprising:
one or a plurality of substrate processing apparatuses that are each disposed adjacent to an exposure device that subjects a substrate to exposure processing; and
a host computer connected to said one or plurality of substrate processing apparatuses, wherein
each substrate processing apparatus includes:
a film formation unit arranged to form a photosensitive film on the substrate before the exposure processing by said exposure device;
a development unit arranged to subject the photosensitive film on the substrate to development processing after the exposure processing by said exposure device;
an inspection/periphery exposure unit arranged to inspect a surface condition of the substrate and subject a peripheral portion of the photosensitive film on the substrate to exposure processing after the photosensitive film is formed by said film formation unit and before the exposure processing is performed by said exposure device; and
a transport device arranged to transport the substrate among said film formation unit, said development unit, said inspection/periphery exposure unit and said exposure device, and
said substrate processing system is configured to transmit a result of inspection in said inspection/periphery exposure unit in each of said one or plurality of substrate processing apparatuses to said host computer, wherein said inspection/periphery exposure unit includes:
a substrate holding/rotating device arranged to rotate the substrate while holding substrate;
a surface condition detector arranged to detect the surface condition of the substrate rotated by said substrate holding/rotating device; and
a light irradiator for exposure arranged to irradiate a portion of the photosensitive film formed on a peripheral portion of the substrate rotated by said substrate holding/rotating device with light for exposure, to perform edge exposure processing.