Method for forming laminated resin film and method for producing semiconductor device

1. A method for producing a semiconductor device, comprising the steps of:

forming a semiconductor layer on a substrate;

forming a non-silicon-containing resin layer on the semiconductor layer;

forming a first pattern having a projection and a recess in the non-silicon-containing resin layer;

forming a silicon-containing resin layer on the non-silicon-containing resin layer so as to cover the projection and the recess;

etching the silicon-containing resin layer until a surface of the projection of the non-silicon-containing resin layer is exposed, the silicon-containing resin layer being left in the recess of the non-silicon-containing resin layer;

selectively etching the non-silicon-containing resin layer through the silicon-containing resin layer left in the recess of the non-silicon-containing resin layer, the non-silicon-containing resin layer having a second pattern reverse to the first pattern; and

etching the semiconductor layer through the non-silicon-containing resin layer having the second pattern,

wherein the step of forming the silicon-containing resin layer includes the steps of:

applying a silicon-containing resin solution with a first viscosity on a surface of the non-silicon-containing resin layer to provide the silicon-containing resin layer, the silicon-containing resin solution containing a silicon-containing resin and a volatile solvent;

heating the silicon-containing resin layer to a first temperature, the silicon-containing resin layer having a second viscosity by heating to the first temperature, the second viscosity being larger than the first viscosity; and

applying a rinse solution containing a volatile component to an edge portion of the silicon-containing resin layer.

2. The method according to claim 1 , wherein the rinse solution contains the volatile solvent of the silicon-containing resin solution.

3. The method according to claim 1 , wherein, after the step of applying a rinse solution containing a volatile component to an edge portion of the silicon-containing resin layer, the step of forming the silicon-containing resin layer further includes the step of heating the silicon-containing resin layer to a second temperature, the second temperature being higher than the first temperature, and the silicon-containing resin layer being hardened by heating to the second temperature.

4. The method according to claim 1 , wherein, in the step of applying a silicon-containing resin solution, silicon-containing resin solution is applied by rotating the substrate at a first rotation speed,

in the step of applying the rinse solution, the rinse solution is supplied by rotating the substrate at a second rotation speed, and

the second rotation speed is larger than the first rotation speed.

5. The method according to claim 1 , wherein, in the step of applying the silicon-containing resin solution, the silicon-containing resin solution has a viscosity of 1.5 mPa·s or more and 2.0 mPa·s or less.

6. The method according to claim 1 , wherein, in the step of heating the silicon-containing resin layer to the first temperature, the silicon-containing resin layer has a viscosity of 10 Pa·s or more and 1,000 Pa·s or less.

7. The method according to claim 1 , wherein the first pattern is a diffraction grating pattern having periodic projections and recesses.

8. The method according to claim 1 , further comprising the steps of:

forming an insulation layer on the semiconductor layer after the step of forming the semiconductor layer; and

etching the insulation layer through the non-silicon-containing resin layer to form a patterned insulation layer after the step of selectively etching the non-silicon-containing resin layer,

wherein, in the step of selectively etching the non-silicon-containing resin layer, the non-silicon-containing resin layer is etched until a portion of a surface of the insulation layer is exposed,

in the step of etching the insulation layer, the insulation layer is etched until a portion of a surface of the semiconductor layer is exposed, and

in the step of etching the semiconductor layer, the semiconductor layer is etched through the patterned insulation layer.

9. A method for forming a laminated resin film, comprising the steps of:

forming a non-silicon-containing resin layer on a main surface of a substrate;

forming a pattern in the non-silicon-containing resin layer; and

forming a silicon-containing resin layer on the non-silicon-containing resin layer having the pattern,

wherein the step of forming the silicon-containing resin layer includes the steps of:

applying a resin solution with a first viscosity on a surface of the non-silicon-containing resin layer to provide the silicon-containing resin layer, the resin solution containing a silicon-containing resin and a volatile solvent;

heating the silicon-containing resin layer to a first temperature, the silicon-containing resin layer having a second viscosity by heating to the first temperature, the second viscosity being larger than the first viscosity;

applying a rinse solution containing a volatile component to an edge portion of the silicon-containing resin layer, and

heating the silicon-containing resin layer to a second temperature, the second temperature being higher than the first temperature, the silicon-containing resin layer being hardened by heating to the second temperature.

10. The method according to claim 9 , wherein, in the step of heating the silicon-containing resin layer to the first temperature, the silicon-containing resin layer has a viscosity of 10 Pa·s or more and 1,000 Pa·s or less.