Wafer backside defectivity clean-up utilizing selective removal of substrate material
A wafer and a fabrication method include a base structure including a substrate for fabricating semiconductor devices. The base structure includes a front side where the semiconductor devices are formed and a back side opposite the front side. An integrated layer is formed in the back side of the base structure including impurities configured to alter etch selectivity relative to the base structure such that the integrated layer is selectively removable from the base structure to remove defects incurred during fabrication of the semiconductor devices.
1. A method for reducing back side wafer defects, comprising:
providing a semiconductor wafer substrate;
implanting impurities into a back side of the wafer to form an integrated doped layer being selectively removable from a base structure of the wafer;
processing a front side of the wafer to fabricate semiconductor devices; and
selectively removing the integrated doped layer to remove processing defects incurred on the backside of the wafer substrate.
2. The method as recited in claim 1 , wherein selectively removing the integrated doped layer includes wet etching the integrated doped layer to expose the base structure.
3. The method as recited in claim 1 , further comprising selecting a depth for the integrated doped layer to include depth of damage caused by wafer processing.
4. The method as recited in claim 1 , further comprising embossing a wafer identifier on the base structure that is visible after implanting impurities into the back side of the wafer.