Apparatuses and methods for generating electric fields
Apparatuses and methods relating to generating an electric field are disclosed. An electric field generator may include a semiconductive material configured in a physical shape substantially different from a shape of an electric field to be generated thereby. The electric field is generated when a voltage drop exists across the semiconductive material. A method for generating an electric field may include applying a voltage to a shaped semiconductive material to generate a complex, substantially nonlinear electric field. The shape of the complex, substantially nonlinear electric field may be configured for directing charged particles to a desired location. Other apparatuses and methods are disclosed.
1. An electric field generator, comprising:
a semiconductive material configured in a physical shape of an annular disk having an aperture therein, wherein the semiconductive material has a first thickness for a portion defining the aperture, a second thickness for a portion defining an outer edge of the annular disk, and a third thickness for a portion between the aperture and the outer edge of the annular disk, wherein the third thickness is less than both the first thickness and the second thickness;
a first conductive contact coupled at the portion defining the aperture; and
a second conductive contact coupled at the portion defining the outer edge, the first conductive contact and the second conductive contact configured to cause the semiconductive material to generate an electric field when a voltage difference is applied to the first and second conductive contacts.
2. The electric field generator of claim 1 , wherein the semiconductive material is selected from the group consisting of graphite, ferrites, glass, resistive foam, polymers, phenolic resins, epoxies, conductive fluids, silicon, germanium, and silicon carbide.
3. The electric field generator of claim 1 , wherein the semiconductive material is suspended in a liquid.
4. The electric field generator of claim 1 , wherein the semiconductive material exhibits non-uniform resistivity throughout the semiconductive material.
5. The electric field generator of claim 4 , wherein the semiconductive material comprises a mixture of a first material and at least one additional material, wherein resistivities of the first material and the at least one additional material are different.
6. The electric field generator of claim 5 , wherein the first material comprises an epoxy base.
7. The electric field generator of claim 5 , wherein the at least one additional material comprises at least one of a semiconductive material, a conductive material, and a resistive material.
8. The electric field generator of claim 4 , wherein the semiconductive material comprises a plurality of sub-materials of varying resistivities.
9. The electric field generator of claim 1 , wherein the shape of the electric field to be generated is a complex, nonlinear shape.
10. The electric field generator of claim 1 , further comprising a charged particle guide that includes the semiconductive material, wherein the charged particle guide is operably coupled between a high-pressure region and a low-pressure region.
11. The electric field generator of claim 10 , wherein the low-pressure region comprises a vacuum chamber of an instrument for processing charged particles.
12. The electric field generator of claim 1 , wherein the first thickness and the second thickness are substantially the same thickness.