Positive photosensitive composition
The present invention provides a positive photosensitive composition containing a specific tetrafunctional silsesquioxane compound (A), a siloxane polymer (B) formed of multiple kinds of alkoxysilane compounds having different numbers of alkoxyl groups, a 1,2-quinone diazide compound (C), and a solvent (D) in order to provide a positive photosensitive composition useful for forming a film on which a pattern is formed, the film being excellent in high thermal resistance, high transparency, crack resistance, adhesiveness with a ground, and the like, and being obtained by performing development with an alkali aqueous solution.
1. A photosensitive composition, comprising:
a compound (A) represented by the following general formula (I);
a siloxane polymer (B), which has alkali solubility and is synthesized by hydrolytic condensation of materials including two or more kinds of alkoxysilane compounds having different numbers of alkoxyl groups;
a 1,2-quinone diazide compound (C); and
a solvent (D) for dissolving the above-mentioned (A) to (C):
wherein the alkoxysilane compounds include di-, tri- and tetra-functional alkoxysilane compounds,
where:
R's independently represent hydrogen, an alkyl group having 1 to 45 carbon atoms, a cycloalkyl group having 4 to 8 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 10 carbon atoms;
X's independently represent hydrogen, —Si(CH 3 ) 2 H, —Si(CH 3 ) 3 , —Si(CH 3 ) 2 (CH 2 ) 3 —OOCC(CH 3 )═CH 2 , —Si(CH 3 ) 2 (CH 2 ) 3 COOH, or a group represented by the following formula (II);
in each of the alkyl group having 1 to 45 carbon atoms represented by R and the cycloalkyl group having 4 to 8 carbon atoms represented by R, any hydrogen may be replaced by fluorine, and any —CH 2 — may be replaced by —O— or a cycloalkylene group having 5 to 18 carbon atoms so long as the —CH 2 — is unadjacent to another —CH 2 —; and
in a benzene ring of the substituted aryl group represented by R, any hydrogen bonded to the benzene ring may be independently replaced by an alkyl group having 1 to 10 carbon atoms or a halogen.
2. The photosensitive composition according to claim 1 , wherein the compound (A) represented by the general formula (I) is contained at a ratio of 1 to 50 parts by weight with respect to 100 parts by weight of the siloxane polymer (B).
3. The photosensitive composition according to claim 1 , wherein the siloxane polymer (B) has a weight average molecular weight of 500 to 100,000 in terms of polystyrene.
4. The photosensitive composition according to claim 2 , wherein the siloxane polymer (B) has a weight average molecular weight of 500 to 100,000 in terms of polystyrene.
5. A patterned transparent film, which is formed by exposure to light, development, and baking of a coated film of the photosensitive composition according to any one of claims 1 to 4 .
6. A display device comprising the patterned transparent film according to claim 5 .
7. The display device according to claim 6 , comprising the patterned transparent film as an insulating film.