IP Library › Granted Patent US 8,513,690
Granted Patent B2
US 8,513,690 · App. 12/941,091 · Granted Aug 20, 2013

Light emitting diode structure having two lighting structures stacked together and driven by alternating current

Inventor: Chih-Ming Lai (Miao-Li Hsien, TW)
Assignee: Foxsemicon Integrated Technology, Inc.
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Quick Facts
Patent No.
US 8,513,690
App. No.
12/941,091
Granted
Aug 20, 2013
Kind
B2
Abstract

A light emitting diode structure includes an electrically conductive substrate, a first lighting structure having a first n-type semiconductor layer, a first active layer and a first p-type semiconductor layer and a second lighting structure having a second n-type semiconductor layer, a second active layer and a second p-type semiconductor layer. The first n-type semiconductor layer is electrically connected with the second p-type semiconductor layer and the first p-type semiconductor layer is electrically connected with the second n-type semiconductor layer. A first transparent, conductive layer is formed on the first lighting structure and a second transparent, conductive layer is formed on the second lighting structure. The first transparent, conductive layer and the second transparent, conductive layer are connected together to combine the first lighting structure with the second lighting structure.

Claims (17)

1. A light emitting diode structure comprising:

an electrically conductive substrate;

a first lighting structure formed on the electrically conductive substrate, the first lighting structure including a first n-type semiconductor layer, a first active layer and a first p-type semiconductor layer;

a second lighting structure formed on the first lighting structure, the second lighting structure including a second n-type semiconductor layer, a second active layer and a second p-type semiconductor layer, the second n-type semiconductor layer being electrically connected with the first p-type semiconductor layer and the second p-type semiconductor layer being electrically connected with the first n-type semiconductor layer;

a first transparent, conductive layer formed on the first lighting structure; and

a second transparent, conductive layer formed under the second lighting structure, wherein the first transparent, conductive layer and the second transparent, conductive layer being connected together to combine the first lighting structure with the second lighting structure; and wherein the first p-type semiconductor layer direct contacts with a bottom surface of the first transparent, conductive layer and a top surface of the second transparent, conductive layer directly contacts with an optical adjusting layer.

2. The light emitting diode structure of claim 1 , wherein the first transparent, conductive layer and the second transparent, conductive layer are connected together by conductive adhesive.

3. The light emitting diode structure of claim 1 , wherein the first transparent, conductive layer and the second transparent, conductive layer are connected together by wafer bonding.

4. The light emitting diode structure of claim 1 , wherein a wavelength of the light emitted by the first active layer is greater than that of the light emitted by the second active layer.

5. The light emitting diode structure of claim 1 , wherein a thickness of each of the first lighting structure and the second lighting structure is less than or equal to 3 μm.

6. The light emitting diode structure of claim 1 , wherein the first transparent, conductive layer is selected from the group consisting of ITO film, ZnO film doped with Ga, Al or In, mixture of In 2 O 3 and SnO 2 , mixture of ZnO and Ga 2 O 3 , mixture of ZnO and Al 2 O 3 and mixture of ZnO and In 2 O 3 .

7. The light emitting diode structure of claim 1 , wherein the second transparent, conductive layer is selected from the group consisting of ITO film, ZnO film doped with Ga, Al or In, mixture of In 2 O 3 and SnO 2 , mixture of ZnO and Ga 2 O 3 , mixture of ZnO and Al 2 O 3 and mixture of ZnO and In 2 O 3 .

8. The light emitting diode structure of claim 1 , wherein a material of the electrically conductive substrate is selected from the group consisting of copper, tungsten, molybdenum, nickel, aluminum, gold and an alloy thereof.

9. The light emitting diode structure of claim 1 further comprising a third transparent, conductive layer formed on a top surface of the second lighting structure away from the second transparent, conductive layer.

10. The light emitting diode structure of claim 9 further comprising a first electrode pad formed on a top surface of the third transparent, conductive layer and a second electrode pad formed on the first transparent, conductive layer, wherein the first electrode pad is electrically connected with the electrically conductive substrate.

11. The light emitting diode structure of claim 1 further comprising light emitted from the first active layer to the second lighting structure passing through the optical adjusting layer and emitting to an environment through the second lighting structure, and light emitted from the second active layer to the first lighting structure being reflected by the optical adjusting layer and emitting to the environment through the second lighting structure.

12. The light emitting diode structure of claim 11 , wherein the optical adjusting layer comprises a plurality of first layers and second layers, the first and second layers have different refraction coefficients, the first and second layers are alternately stacked between the first active layer and the second active layer, and a thickness of each of the first and second layers is one fourth of the wavelength of the light emitted from the second active layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 8, 2010
From: LAI, CHIH-MING
To: FOXSEMICON INTEGRATED TECHNOLOGY, INC.
Reel/Frame 025330/0219 →
Priority Claims (1)
TW 99125569 · Aug 2, 2010 · national
Continuity (1)
Related Publication 20120025237A1 · Feb 2, 2012