Semiconductor device and manufacturing method thereof
An object of one embodiment of the present invention is to provide an antifuse which has low writing voltage. The antifuse is used for a memory element for a read only memory device. The antifuse includes a first conductive layer, an insulating layer, a semiconductor layer, and a second conductive layer. The insulating layer included in the antifuse is a silicon oxynitride layer formed by adding ammonia to a source gas. When hydrogen is contained in the layer at greater than or equal to 1.2×10 21 atoms/cm 3 and less than or equal to 3.4×10 21 atoms/cm 3 or nitrogen is contained in the layer at greater than or equal to 3.2×10 20 atoms/cm 3 and less than or equal to 2.2×10 21 atoms/cm 3 , writing can be performed at low voltage.
1. A semiconductor device comprising:
a plurality of memory cells each including an antifuse,
wherein the antifuse includes:
a first conductive layer;
an intermediate layer over the first conductive layer, the intermediate layer comprising an insulating layer and a semiconductor layer; and
a second conductive layer over the intermediate layer,
wherein the insulating layer is a silicon oxynitride film including hydrogen at greater than or equal to 1.2×10 21 atoms/cm 3 and less than or equal to 3.4 ×10 21 atoms/cm 3 .
2. The semiconductor device according to claim 1 ,
wherein the insulating layer includes nitrogen at greater than or equal to 3.2×10 20 atoms/cm 3 and less than or equal to 2.2×10 21 atoms/cm 3 .
3. The semiconductor device according to claim 1 ,
wherein the semiconductor layer is an amorphous silicon film.
4. The semiconductor device according to claim 1 ,
wherein the first conductive layer comprises a tantalum nitride film and a tungsten film, and
wherein the intermediate layer is in contact with the tungsten film.
5. The semiconductor device according to claim 1 ,
wherein the second conductive layer comprises a titanium film and an aluminum film, and
wherein the intermediate layer is in contact with the titanium film.
6. The semiconductor device according to claim 1 ,
wherein the plurality of memory cells are sandwiched between a first insulator and a second insulator, and
wherein each of the first insulator and the second insulator includes a fibrous body which is impregnated with an organic resin.
7. The semiconductor device according to claim 1 ,
wherein the silicon oxynitride film is formed with a mixture gas comprising an ammonia gas.
8. A semiconductor device comprising:
a memory portion including a plurality of memory cells each including an antifuse;
a semiconductor integrated circuit portion connected to the memory portion;
an antenna portion connected to the semiconductor integrated circuit portion; and
a first insulator and a second insulator between which the memory portion, the semiconductor integrated circuit portion, and the antenna portion are sandwiched,
wherein the antifuse includes:
a first conductive layer;
an intermediate layer over the first conductive layer, the intermediate layer comprising an insulating layer and a semiconductor layer; and
a second conductive layer over the intermediate layer,
wherein the insulating layer is a silicon oxynitride film including hydrogen at greater than or equal to 1.2×10 21 atoms/cm 3 and less than or equal to 3.4 ×10 21 atoms/cm 3 .
9. The semiconductor device according to claim 8 ,
wherein the insulating layer includes nitrogen at greater than or equal to 3.2×10 20 atoms/cm 3 and less than or equal to 2.2×10 21 atoms/cm 3 .
10. The semiconductor device according to claim 8 ,
wherein the semiconductor layer is an amorphous silicon film.
11. The semiconductor device according to claim 8 ,
wherein the first conductive layer comprises a tantalum nitride film and a tungsten film, and
wherein the intermediate layer is in contact with the tungsten film.
12. The semiconductor device according to claim 8 ,
wherein the second conductive layer comprises a titanium film and an aluminum film, and
wherein the intermediate layer is in contact with the titanium film.
13. The semiconductor device according to claim 8 ,
wherein the semiconductor integrated circuit portion performs wireless communication with an external device through the antenna portion.
14. The semiconductor device according to claim 8 ,
wherein each of the first insulator and the second insulator includes a fibrous body which is impregnated with an organic resin.
15. The semiconductor device according to claim 8 ,
wherein the silicon oxynitride film is formed with a mixture gas comprising an ammonia gas.
16. A semiconductor device comprising:
a plurality of memory cells each including an antifuse,
wherein the antifuse includes:
a first conductive layer;
an intermediate layer over the first conductive layer, the intermediate layer comprising an insulating layer and a semiconductor layer; and
a second conductive layer over the intermediate layer,
wherein the insulating layer is a silicon oxynitride film including nitrogen at greater than or equal to 3.2×10 20 atoms/cm 3 and less than or equal to 2.2 ×10 21 atoms/cm 3 .
17. The semiconductor device according to claim 16 ,
wherein the semiconductor layer is an amorphous silicon film.
18. The semiconductor device according to claim 16 ,
wherein the first conductive layer comprises a tantalum nitride film and a tungsten film, and
wherein the intermediate layer is in contact with the tungsten film.
19. The semiconductor device according to claim 16 ,
wherein the second conductive layer comprises a titanium film and an aluminum film, and
wherein the intermediate layer is in contact with the titanium film.
20. The semiconductor device according to claim 16 ,
wherein the plurality of memory cells are sandwiched between a first insulator and a second insulator, and
wherein each of the first insulator and the second insulator includes a fibrous body which is impregnated with an organic resin.
21. The semiconductor device according to claim 16 ,
wherein the silicon oxynitride film is formed with a mixture gas comprising an ammonia gas.
22. A semiconductor device comprising:
a memory portion including a plurality of memory cells each including an antifuse;
a semiconductor integrated circuit portion connected to the memory portion;
an antenna portion connected to the semiconductor integrated circuit portion; and
a first insulator and a second insulator between which the memory portion, the semiconductor integrated circuit portion, and the antenna portion are sandwiched,
wherein the antifuse includes:
a first conductive layer;
an intermediate layer over the first conductive layer, the intermediate layer comprising an insulating layer and a semiconductor layer; and
a second conductive layer over the intermediate layer,
wherein the insulating layer is a silicon oxynitride film including nitrogen at greater than or equal to 3.2×10 20 atoms/cm 3 and less than or equal to 2.2 ×10 21 atoms/cm 3 .
23. The semiconductor device according to claim 22 ,
wherein the semiconductor layer is an amorphous silicon film.
24. The semiconductor device according to claim 22 ,
wherein the first conductive layer comprises a tantalum nitride film and a tungsten film, and
wherein the intermediate layer is in contact with the tungsten film.
25. The semiconductor device according to claim 22 ,
wherein the second conductive layer comprises a titanium film and an aluminum film, and
wherein the intermediate layer is in contact with the titanium film.
26. The semiconductor device according to claim 22 ,
wherein the semiconductor integrated circuit portion performs wireless communication with an external device through the antenna portion.
27. The semiconductor device according to claim 22 ,
wherein each of the first insulator and the second insulator includes a fibrous body which is impregnated with an organic resin.
28. The semiconductor device according to claim 22 ,
wherein the silicon oxynitride film is formed with a mixture gas comprising an ammonia gas.