IP Library › Granted Patent US 8,547,538
Granted Patent B2
US 8,547,538 · App. 13/091,965 · Granted Oct 1, 2013

Construction of reference spectra with variations in environmental effects

Inventor: Jeffrey Drue David (San Jose, CA)
Assignee: Applied Materials, Inc.
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,547,538
App. No.
13/091,965
Granted
Oct 1, 2013
Kind
B2
Abstract

A method of generating a library of reference spectra includes storing at least one reference spectrum, storing a plurality of different transmission curves, and for at least two transmission curves from the plurality of different transmission curves, calculating a modified reference spectrum from the reference spectrum and the transmission curve to generate a plurality of modified reference spectra. The transmission curves represent distortion to a spectrum introduced by variations in components in an optical path before a substrate surface.

Claims (43)

1. A method of controlling polishing, comprising:

generating a library of reference spectra, comprising:

storing at least one reference spectrum;

storing a plurality of different transmission curves, the transmission curves representing distortion to a spectrum introduced by variations in components in an optical path before a substrate surface;

for at least two transmission curves from the plurality of different transmission curves, calculating a modified reference spectrum from the reference spectrum and the transmission curve to generate a plurality of modified reference spectra;

polishing a substrate;

measuring a sequence of spectra of light from the substrate during polishing;

for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum from the plurality of modified reference spectra to generate a sequence of best matching reference spectra; and

determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra.

2. The method of claim 1 , wherein the different transmission curves represent variations in transmission of one or more windows.

3. The method of claim 2 , wherein the different transmission curves represent distortion to a spectrum at different ages of a window of a polishing pad.

4. The method of claim 2 , wherein different transmission curves represent different windows.

5. The method of claim 1 , wherein the different transmission curves represent distortion to a spectrum at different ages of a bulb from a light source.

6. The method of claim 1 , further comprising receiving user input identifying the at least two transmission curves from the plurality of different transmission curves.

7. The method of claim 1 , further comprising generating the plurality of different transmission curves.

8. The method of claim 7 , wherein generating the plurality of different transmission curves comprises calculating the transmission curves from an optical model.

9. The method of claim 1 , wherein calculating the modified reference spectrum comprises multiplying the reference spectrum by the transmission curve.

10. The method of claim 9 , wherein the transmission curve is stored as a ratio between 0 and 1 as a function of wavelength.

11. The method of claim 1 , further comprising generating the at least one reference spectrum.

12. The method of claim 11 , wherein generating the at least one reference spectrum comprises measuring a test substrate during a polishing operation using the an optical monitoring system that includes the optical path.

13. The method of claim 11 , wherein generating the at least one reference spectrum comprises calculating the reference spectrum from an optical model.

14. A method of generating a library of reference spectra, comprising:

storing at least one reference spectrum;

storing a plurality of different transmission curves, the transmission curves representing distortion to a spectrum introduced by variations in components in an optical path before a substrate surface; and

for at least two transmission curves from the plurality of different transmission curves, calculating a modified reference spectrum from the reference spectrum and the transmission curve to generate a plurality of modified reference spectra;

wherein generating the plurality of different transmission curves comprises measuring a base spectrum from a test substrate using an in-situ optical monitoring system and measuring one or more additional spectra from the same test substrate or another test substrate of the same material using the in-situ optical monitoring system at different times, and calculating the transmission curves from the base spectrum and the one or more additional spectra.

15. The method of claim 14 , wherein the different times are at different ag of a window of polishing pad in an optical path between the test substrate and a light source or detector of the in-situ optical monitoring system.

16. The method of claim 14 , wherein the different times are at different ag of a bulb of a light source of the in-situ optical monitoring system.

17. The method of claim 14 , wherein calculating the transmission curves comprises a division operation in which the additional spectrum is in the numerator and the bas spectrum is in the denominator.

18. The method of claim 14 , further comprising measuring a first dark spectrum at the same age of the window as the base spectrum and measuring a second dark spectrum at the same age of the window as the additional spectrum.

19. The method of claim 18 , wherein calculating the transmission curves comprises calculating

T

=

A

-

D

A

B

-

D

B

where A is the additional spectrum, D A is the second dark spectrum, B is the base spectrum, and D B is the first dark spectrum.

20. The method of claim 14 , wherein the test substrate comprises a bare silicon wafer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 12, 2011
From: DAVID, JEFFREY DRUE
To: APPLIED MATERIALS, INC.
Reel/Frame 027051/0263 →
Continuity (1)
Related Publication 20120268738A1 · Oct 25, 2012