IP Library Granted Patent US 8,560,270
Granted Patent B2
US 8,560,270 · App. 12/331,192 · Granted Oct 15, 2013

Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signals

Inventor: Hanyou Chu (Palo Alto, CA)
Assignees: Tokyo Electron Limited; KLA—Tencor Corporation
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Quick Facts
Patent No.
US 8,560,270
App. No.
12/331,192
Granted
Oct 15, 2013
Kind
B2
Abstract

Methods and apparatuses for improving computation efficiency for diffraction signals in optical metrology are described. The method includes simulating a set of diffraction orders for a structure. A set of diffraction efficiencies is determined for the set of diffraction orders. A rational approximation or a continued-fraction approximation is applied to the set of diffraction efficiencies to obtain a rationally approximated set of diffraction efficiencies or a continued-fraction approximated set of diffraction efficiencies, respectively. A simulated spectrum is then provided.

Claims (70)

1. A method for improving computation efficiency for diffraction signals for optical metrology, comprising:

simulating a set of diffraction orders for a structure, the structure one of a plurality of repeating structures on a wafer;

determining a set of diffraction efficiencies for the set of diffraction orders;

applying a matrix rational approximation to the set of diffraction efficiencies to obtain a rationally approximated set of diffraction efficiencies; and

providing a simulated spectrum for the structure based on the rationally approximated set of diffraction efficiencies;

generating a sample spectrum from an optical metrology system; and

comparing the simulated spectrum to the sample spectrum.

2. The method of claim 1 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using modified Legendre polynomial high-order finite element discretization.

3. The method of claim 1 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using a rigorous coupled wave approach.

4. The method of claim 1 , further comprising:

performing a regress analysis on the rationally approximated set of diffraction efficiencies prior to providing the simulated spectrum.

5. The method of claim 4 , wherein performing the regress analysis comprises using an analytic Jacobian-based method.

6. The method of claim 1 , wherein simulating the set of diffraction orders comprises simulating the set of diffraction orders for a structure selected from the group consisting of a two-dimensional structure, a three-dimensional structure, and a structure having both a three-dimensional component and a two-dimensional component.

7. A method for improving computation efficiency for diffraction signals for optical metrology, comprising:

simulating a set of diffraction orders for a structure, the structure one of a plurality of repeating structures on a wafer;

determining a set of diffraction efficiencies for the set of diffraction orders;

applying a matrix continued-fraction approximation to the set of diffraction efficiencies to obtain a continued-fraction approximated set of diffraction efficiencies; and

providing a simulated spectrum for the structure based on the continued-fraction approximated set of diffraction efficiencies;

generating a sample spectrum from an optical metrology system; and

comparing the simulated spectrum to the sample spectrum.

8. The method of claim 7 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using modified Legendre polynomial high-order finite element discretization.

9. The method of claim 7 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using a rigorous coupled wave approach.

10. The method of claim 7 , further comprising:

performing a regress analysis on the continued-fraction approximated set of diffraction efficiencies prior to providing the simulated spectrum.

11. The method of claim 10 , wherein performing the regress analysis comprises using an analytic Jacobian-based method.

12. The method of claim 7 , wherein simulating the set of diffraction orders comprises simulating the set of diffraction orders for a structure selected from the group consisting of a two-dimensional structure, a three-dimensional structure, and a structure having both a three-dimensional component and a two-dimensional component.

13. A non-transitory computer readable medium containing instructions stored therein for causing a computer processor to perform a method for improving computation efficiency for diffraction signals in optical metrology, the method comprising:

simulating a set of diffraction orders for a structure;

determining a set of diffraction efficiencies for the set of diffraction orders;

applying a matrix rational approximation to the set of diffraction efficiencies to obtain a rationally approximated set of diffraction efficiencies; and

providing a simulated spectrum based on the rationally approximated set of diffraction efficiencies.

14. The non-transitory computer readable medium as in claim 13 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using modified Legendre polynomial high-order finite element discretization or using a rigorous coupled wave approach.

15. The non-transitory computer readable medium as in claim 13 , having instructions stored therein for causing the computer processor to perform the method further comprising:

performing a regress analysis on the rationally approximated set of diffraction efficiencies prior to providing the simulated spectrum, wherein performing the regress analysis comprises using an analytic Jacobian-based method.

16. The non-transitory computer readable medium as in claim 13 , having instructions stored therein for causing the computer processor to perform the method further comprising:

comparing the simulated spectrum to a sample spectrum.

17. The non-transitory computer readable medium as in claim 13 , wherein simulating the set of diffraction orders comprises simulating the set of diffraction orders for a structure selected from the group consisting of a two-dimensional structure, a three-dimensional structure, and a structure having both a three-dimensional component and a two-dimensional component.

18. A non-transitory computer readable medium containing instructions stored therein for causing a computer processor to perform a method for improving computation efficiency for diffraction signals in optical metrology, the method comprising:

simulating a set of diffraction orders for a structure;

determining a set of diffraction efficiencies for the set of diffraction orders;

applying a matrix continued-fraction approximation to the set of diffraction efficiencies to obtain a continued-fraction approximated set of diffraction efficiencies; and

providing a simulated spectrum based on the continued-fraction approximated set of diffraction efficiencies.

19. The non-transitory computer readable medium as in claim 18 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using modified Legendre polynomial high-order finite element discretization or using a rigorous coupled wave approach.

20. The non-transitory computer readable medium as in claim 18 , having instructions stored therein for causing the computer processor to perform the method further comprising:

performing a regress analysis on the continued-fraction approximated set of diffraction efficiencies prior to providing the simulated spectrum, wherein performing the regress analysis comprises using an analytic Jacobian-based method.

21. The non-transitory computer readable medium as in claim 18 , having instructions stored therein for causing the computer processor to perform the method further comprising:

comparing the simulated spectrum to a sample spectrum.

22. The non-transitory computer readable medium as in claim 18 , wherein simulating the set of diffraction orders comprises simulating the set of diffraction orders for a structure selected from the group consisting of a two-dimensional structure, a three-dimensional structure, and a structure having both a three-dimensional component and a two-dimensional component.

23. A system for improving computation efficiency for diffraction signals in optical metrology, comprising:

a processor;

a main memory;

a secondary memory having instructions stored thereon which cause the system to perform a method, comprising:

simulating a set of diffraction orders for a structure;

determining a set of diffraction efficiencies for the set of diffraction orders;

applying a matrix rational approximation to the set of diffraction efficiencies to obtain a rationally approximated set of diffraction efficiencies; and

providing a simulated spectrum based on the rationally approximated set of diffraction efficiencies; and

a bus which allows the processor, the main memory and the secondary memory to communicate with one another.

24. The system as in claim 23 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using modified Legendre polynomial high-order finite element discretization.

25. The system as in claim 23 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using a rigorous coupled wave approach.

26. A system for improving computation efficiency for diffraction signals in optical metrology, comprising:

a processor;

a main memory;

a secondary memory having instructions stored thereon which cause the system to perform a method, comprising:

simulating a set of diffraction orders for a structure;

determining a set of diffraction efficiencies for the set of diffraction orders;

applying a matrix continued-fraction approximation to the set of diffraction efficiencies to obtain a continued-fraction approximated set of diffraction efficiencies; and

providing a simulated spectrum based on the continued-fraction approximated set of diffraction efficiencies; and

a bus which allows the processor, the main memory and the secondary memory to communicate with one another.

27. The system as in claim 26 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using modified Legendre polynomial high-order finite element discretization.

28. The system as in claim 26 , wherein determining the set of diffraction efficiencies for the set of diffraction orders comprises using a rigorous coupled wave approach.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 18, 2015
From: TOKYO ELECTRON LIMITED
To: KLA-TENCOR CORPORATION
Reel/Frame 035055/0683 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 9, 2008
From: CHU, HANYOU
To: TOKYO ELECTRON LIMITED; KLA-TENCOR CORPORATION
Reel/Frame 021950/0129 →
Continuity (1)
Related Publication 20100145655A1 · Jun 10, 2010