IP Library Granted Patent US 8,568,878
Granted Patent B2
US 8,568,878 · App. 13/066,248 · Granted Oct 29, 2013

Directly fabricated nanoparticles for raman scattering

Inventors: Robert J. Wilson (Campbell, CA); Jung-Sub Wi (Tsukuba, JP); Shan X. Wang (Portola Valley, CA); Edward S. Barnard (Redwood City, CA); Mark L. Brongersma (Menlo Park, CA); Mary Tang (San Francisco, CA)
Assignee: The Board of Trustees of the Leland Stanford Junior University
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Quick Facts
Patent No.
US 8,568,878
App. No.
13/066,248
Granted
Oct 29, 2013
Kind
B2
Abstract

A Raman-active nanoparticle is provided that includes a dish-shape plasmonically active metal base, and a plasmonically active metal pillar disposed on the plasmonically active metal base, where the plasmonically active metal pillar is disposed within the dish-shape plasmonically active metal base and normal to a bottom of the dish-shape plasmonically active metal base, where a circular gap is disposed between the dish-shape plasmonically active metal pillar and inner walls of the dish-shape plasmonically active metal base. In one embodiment a Raman-active nanoparticle is provided that includes a dish-shape base having a dielectric material, an electrically conductive layer disposed on the inner surface of the dish-shape base, and an electrically conductive pillar disposed on the conductive layer, and within the dish-shape and perpendicular to a bottom of the dish-shape base, where a circular gap is disposed between the conductive pillar and inner walls of the dish-shape base.

Claims (21)

1. A Raman-active nanoparticle comprising:

a. a circular base and a parallel-surface wall surrounding said circular base, wherein said circular base is a plasmonically active metal circular base; and

b. a plasmonically active metal circular pillar disposed on said plasmonically active metal circular base, wherein said plasmonically active metal circular pillar is disposed within said parallel-surface wall of said plasmonically active metal circular base and normal to a bottom of said plasmonically active metal circular base, wherein a circular gap is disposed between a side of said active metal circular pillar and an inner surface of said parallel-surface wall of said plasmonically active metal circular base.

2. The Raman-active nanoparticle of claim 1 , wherein said plasmonically active metal circular base comprises a material selected from the group consisting of Ag, Au, Pt, Cu, and Al.

3. The Raman-active nanoparticle of claim 1 , wherein said plasmonically active metal circular base comprises layered laminates and alloys.

4. The Raman-active nanoparticle of claim 1 , wherein said plasmonically active metal circular pillar comprises material selected from the group consisting of Ag, Au, Pt, Cu, and Al.

5. The Raman-active nanoparticle of claim 4 , wherein said plasmonically active metal circular pillar comprises layered laminates and alloys.

6. The Raman-active nanoparticle of claim 1 , wherein said circular gap has a dimension in a range of 1 nm to 100 nm.

7. The Raman-active nanoparticle of claim 1 , wherein said plasmonically active metal circular base is disposed on a dielectric material, wherein said dielectric material comprises a circular dielectric base and a parallel-surface dielectric wall surrounding said circular dielectric base.

8. The Raman-active nanoparticle of claim 7 , wherein said dielectric material comprises a material selected from the group consisting of SiO 2 , Al 2 O 3 , MgO, silicon nitride, titanium nitride, and indium tin oxide.

9. The Raman-active nanoparticle of claim 7 , wherein said dielectric parallel-surface wall has an outer diameter in a range of 10 nm to 1000 nm.

10. The Raman-active nanoparticle of claim 7 , wherein said dielectric parallel-surface wall has a wall thickness in a range of 1 nm to 100 nm.

11. The Raman-active nanoparticle of claim 7 , wherein said dielectric circular base dielectric material has a bottom thickness in a range of 1 nm to 100 nm.

12. The Raman-active nanoparticle of claim 7 , wherein said dielectric parallel-surface wall dielectric material has a height in a range of 2 nm to 100 nm.

13. The Raman-active nanoparticle of claim 7 , wherein said dielectric material comprises a material having a complex index of refraction (n+ik), wherein k has a value in a range between 0.0 and 0.5.

14. The Raman-active nanoparticle of claim 1 , wherein said plasmonically active metal circular base has a thickness in a range of 1 nm to 100 nm.

15. The Raman-active nanoparticle of claim 1 , wherein said plasmonically active metal circular pillar has a diameter in a range of 1 nm to 999 nm.

16. The Raman-active nanoparticle of claim 1 , wherein said plasmonically active metal circular pillar has a height in a range of 1 nm to 200 nm.

17. The Raman-active nanoparticle of claim 1 , wherein said nanoparticle comprises of at least one magnetic layer.

18. The Raman-active nanoparticle of claim 1 , wherein said nanoparticle comprises at least one magnetic coating.

19. The Raman-active nanoparticle of claim 1 , wherein said Raman-active nanoparticle comprises an array of said Raman-active nanoparticles on a substrate.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 12, 2011
From: WILSON, ROBERT J.; WI, JUNG-SUB; WANG, SHAN X.; BARNARD, EDWARD S.; BRONGERSMA, MARK L.; TANG, MARY
To: BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY, THE
Reel/Frame 026925/0288 →
CONFIRMATORY LICENSE Recorded May 13, 2011
From: THE BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY
To: NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT
Reel/Frame 026273/0396 →
Continuity (2)
Provisional Application 61341991 · Apr 8, 2010
Related Publication 20110250464A1 · Oct 13, 2011