Methods and apparatus of manufacturing micro and nano-scale features
View Patent ↗The present invention provides methods of generating scalable patterned features on a substrate. The methods includes ejecting a succession of droplets; applying a force to the droplets in a manner such that the droplets travel along a designated path; altering the properties of one or more of the droplets in a manner so as to adjust the size of the droplets; and depositing the droplets on the substrate to generate patterned features on the substrate. The present invention also provides apparatuses for generating scalable patterned features on a substrate.
1. A method of generating scalable patterned features on a substrate, said method comprising:
(a) ejecting a succession of droplets, comprising selectively applying a first force to a stream of fluid such that the stream breaks into the succession of droplets;
(b) applying a second force to the droplets in a manner such that the droplets travel along a designated path, comprising passing the droplets through a charge tunnel and a quadrupole mechanism;
(c) reducing the size of one or more of the droplets; and
(d) depositing the droplets on the substrate to generate patterned features on the substrate.
2. The method of claim 1 , wherein the patterned features are three-dimensional.
3. The method of claim 1 , wherein the succession of droplets comprises colloids or liquefied metals of one or more materials.
4. The method of claim 1 , wherein the succession of droplets is deposited via hydrophobic or hydrophilic patterns.
5. The method of claim 1 further comprising repeating (a), (b) and/or (c) at least once.
6. The method of claim 1 , wherein the succession of droplets comprises polymer fluid.
7. The method of claim 1 further comprising curing or gelation of the succession of droplets.
8. The method of claim 1 , wherein reducing the size of one or more of the droplets within the succession of droplets comprises reducing the size of one or more of the droplets by at least about 20%.
9. The method of claim 1 , wherein reducing the size of one or more of the droplets within the succession of droplets comprises reducing the size of one or more of the droplets from 1 to 5 μm to 80 to 200 nm.
10. The method of claim 1 , wherein the succession of droplets is ejected from a piezoelectric nozzle.
11. The method of claim 1 , wherein passing the droplets through the charge tunnel comprises applying a variable charge potential to the succession of droplets.
12. The method of claim 1 , wherein generating scalable patterned features on the substrate comprises selectively manufacturing heterogeneous structures on said substrate.
13. The method of claim 1 , wherein the first force is controlled to adjust the size, velocity and/or the ejecting rate of the succession of droplets.
14. The method of claim 1 , wherein ejecting the succession of droplets comprises ejecting a succession of droplets from a continuous inkjet setup.
15. The method of claim 1 , wherein reducing the size of one or more droplets within the succession of droplets comprises applying a resistive heat source, a laser or a combination thereof.
16. The method of claim 3 , wherein the material is selected from the group consisting of metal, ceramics, fiber glass, semiconductor material, polymers, bio-media, a precursor solution for sol-gel process and a combination thereof.
17. The method of claim 7 , wherein curing is carried out by adding chemical additives, exposing to ultraviolet radiation, electron beam and/or heat.
18. The method of claim 10 , wherein the piezoelectric nozzle comprises a piezoelectric disk and wherein applying the first force to the stream of fluid comprises applying a voltage to the piezoelectric disk.
19. The method of claim 10 , wherein the piezoelectric nozzle has an orifice diameter of about 1 micron to 100 microns.
20. The method of claim 10 , wherein the orifice size of the piezoelectric nozzle is about 100 microns.
21. The method of claim 10 , wherein the piezoelectric nozzle has an orifice diameter of about 1 micron to about 10 microns.
22. The method of claim 11 , wherein the depositing step comprises deflecting one or more charged droplets within the succession of droplets.
23. The method of claim 14 , wherein the continuous ink jet setup comprises a piezoelectric nozzle.
24. The method of claim 15 , wherein the resistive heat source, laser or combination thereof is selectively applied and/or selectively attenuated.
25. The method of claim 18 , wherein applying the voltage to the piezoelectric disk comprises varying the voltage and frequency of excitation of the piezoelectric disk.
26. The method of claim 23 , wherein the piezoelectric nozzle comprises a piezoelectric disk.