Semiconductor device having a semiconductor chip, and method for the production thereof

1. A method for producing a semiconductor device, comprising:

providing a semiconductor chip having an active surface, an opposing passive surface, and planar side edges extending between the active surface and the passive surface;

applying flip-chip contacts to the active surface; and

after applying the flip-chip contacts to the active surface, applying a UV B-stageable material as an electrically insulating layer surrounding the flip-chip contacts as underfill material, such that the electrically insulating material layer extends across the active surface and has edges coplanar with and not extending beyond the planar side edges of the semiconductor chip.

2. The method according to claim 1 , comprising curing at least a surface of the UV B-stageable material to a partially cured state.

3. The method according to claim 1 , comprising curing at least a surface of the UV B-stageable material to a substantially fully cured state.

4. The method according to claim 1 , comprising

applying a patterned mask on the active surface of the semiconductor wafer;

exposing the mask by means of UV radiation, so that the flip-chip contacts are not exposed and at least a surface of the exposed regions is brought to a cured intermediate state; and

removing the unexposed regions of the layer while leaving free at least a tip of the flip-chip contacts.

5. The method of claim 1 , wherein applying the UV B-stageable material comprises applying the UV B-stageable material to a thickness greater than a height of the flip-chip contacts above the active surface.

6. The method of claim 5 , wherein the UV B-stageable material includes a solvent, and wherein the method further includes:

evaporating the solvent such that the thickness of the UV B-stageable material is reduced to a thickness less than the height of the flip-chip contacts with the flip-chip contacts having a thin coating of the UV B-stageable material remaining thereon;

applying a patterned mask on the active surface which covers the flip-chip contacts;

exposing the UV B-stageable material to UV radiation via the mask such that the thin coating of UV B-stageable material covering flip-chip contacts is not exposed and at least a surface of exposed regions of the UV B-stageable material is brought to a cured intermediate state; and

removing the unexposed thin coating of the UV B-stageable material covering the flip-chip contacts to leave at least a tip of the flip-chip contacts exposed and extending above the electrically insulating layer.

7. The method of claim 1 , wherein the electrically insulating layer of UV B-stageable material includes ceramic particles.

8. The method of claim 1 , wherein applying flip-chip contacts to the active surface comprises applying solder balls to the active surface.

9. The method of claim 4 , wherein the patterned mask is a same mask employed in a process used to form chip contacts on the active surface on the semiconductor chip on which the flip-chip contacts are disposed.