Optical characteristic measuring apparatus and optical characteristic measuring method
An optical characteristic measuring apparatus includes a light source, a detector and a data processing unit. Data processing unit includes a modeling unit, an analyzing unit and a fitting unit. The plurality of film model equations are solved, and prescribed calculation is performed on the assumption that the optical constants included in the plurality of film model equations is identical. Fitting is performed between a waveform obtained by substituting the obtained film thickness and the obtained optical constants of the film into the film model equations and a waveform of the wavelength distribution characteristic obtained by detector, thereby determining that the optical constants included in the plurality of film model equations is identical and that the film thickness and the optical constants obtained by the analyzing unit are correct values.
1. An optical characteristic measuring apparatus, comprising:
a light source irradiating an object to be measured, which has at least one layer of film formed on a substrate, with measuring light having a prescribed wavelength range;
a spectrometric measuring unit obtaining a wavelength distribution characteristic of reflection intensity or transmission intensity based on light reflected from said object to be measured or light that has passed through said object to be measured;
a modeling unit obtaining a plurality of said wavelength distribution characteristics from said film of a same material, and generating a plurality of film model equations including at least a parameter calculated from each of said obtained wavelength distribution characteristics as well as a film thickness and optical constants of said film;
an analyzing unit solving said plurality of film model equations generated by said modeling unit, and performing prescribed calculation on the assumption that said optical constants included in said plurality of film model equations is identical, and obtaining said film thickness and said optical constants of said film; and
a fitting unit performing fitting between a waveform obtained by substituting said film thickness and said optical constants of said film obtained by said analyzing unit into said film model equations and a waveform of said wavelength distribution characteristic obtained by said spectrometric measuring unit, thereby determining that said optical constants included in said plurality of film model equations is identical and that said film thickness and said optical constants of said film obtained by said analyzing unit are correct values.
2. The optical characteristic measuring apparatus according to claim 1 , wherein
said analyzing unit uses a non-linear least square method for said prescribed calculation.
3. The optical characteristic measuring apparatus according to claim 1 , wherein
said parameter calculated from said wavelength distribution characteristic is a reflectance or a transmittance of said film.
4. The optical characteristic measuring apparatus according to claim 1 , wherein
said spectrometric measuring unit obtains said wavelength distribution characteristic of polarized reflection intensity based on the light reflected from said object to be measured, and
said parameter calculated from said wavelength distribution characteristic is a phase difference Δ and an amplitude ratio Ψ.
5. The optical characteristic measuring apparatus according to claim 1 , wherein
said modeling unit generates said film model equations further including a rear surface reflection coefficient contribution ratio of said film.
6. An optical characteristic measuring method, comprising the steps of:
irradiating an object to be measured, which has at least one layer of film formed on a substrate, with measuring light having a prescribed wavelength range;
obtaining a plurality of wavelength distribution characteristics of reflection intensity or transmission intensity from said film of a same material, based on light reflected from said object to be measured or light that has passed through said object to be measured;
generating a plurality of film model equations including a parameter calculated from each of said obtained wavelength distribution characteristics as well as a film thickness and optical constants of said film;
solving said plurality of generated film model equations, and performing prescribed calculation on the assumption that said optical constants included in said plurality of film model equations is identical, and obtaining said film thickness and said optical constants of said film; and
performing fitting between a waveform obtained by substituting said obtained film thickness and said obtained optical constants of said film into said film model equations and a waveform of said obtained wavelength distribution characteristic, thereby determining that said optical constants included in said plurality of film model equations is identical and that said obtained film thickness and said obtained optical constants of said film are correct values.