Process for producing glass substrate for information recording medium
According to the process for producing a glass substrate for an information-recording medium of the present invention, a glass plate 10 is roughly polished by a polishing machine 1 using a polishing liquid 7 containing a polishing agent containing cerium oxide as a main component in the rough polishing step, followed by cleaning so as to adjust the amount of cerium oxide on the surface of the glass plate to be 0.125 ng/cm2 or less. The glass plate after rough polishing is thereafter finely polished with a polishing agent containing colloidal silica in the fine polishing step.
1. A process for producing a glass substrate for an information-recording medium having a chemically reinforced layer formed with a chemical reinforcing liquid on a surface of a disk-shaped glass plate containing 0.01% by mass to 2% by mass of cerium oxide, the glass substrate being configured to have TIR of 0.7 μm or less per cycle in a circumferential direction at a position 0.75×r1 distant from the center of the glass plate, when r1 is a radius of an outer perimeter of the glass plate, by polishing of the surface in a step of rough polishing and a step of fine polishing, wherein
the glass plate is roughly polished with a polishing agent containing cerium oxide as a main component in the rough polishing step,
the glass plate after rough polishing is finely polished with a polishing agent containing colloidal silica grains in the fine polishing step,
a stock removal in the fine polishing step is 0.2 μm to 2 μm,
when a is the volume (liter) of a slurry containing the polishing agent used in the fine polishing step; b is the number of glass plates to be polished; X is the content (% by mass) of cerium oxide of the glass plates; Y is the stock removal (μm); and
Z=Y ×area of substrate(cm 2 )×density of substrate(g/cm 3 ) (1),
the polishing in the fine polishing step is carried out so as to satisfy
( X×Z )× b/a< 3(μg/liter) (2), and
the glass plate after the rough polishing step is cleaned before the fine polishing step so as to adjust the amount of cerium oxide on the surface of the glass plate to be 0.125 ng/cm 2 or less.
2. The process for producing a glass substrate for an information-recording medium according to claim 1 , wherein
the glass plate has a through-hole at the center thereof; and
the glass plate is finely polished so as to adjust TIR to be 0.5 μm or less per cycle in the circumferential direction at a position (2×r2+r1)/3 from the center of the glass plate, when r2 is a radius of the through-hole.
3. The process for producing a glass substrate for an information-recording medium according to claim 1 , wherein
a glass composition of SiO2: 55 to 75% by mass, Al2O3: 5 to 18% by mass, Li2O: 1 to 10% by mass, Na2O: 3 to 15% by mass, K2O: 0.1 to 5% by mass, where the total amount of Li2O+Na2O+K2O: 10 to 25% by mass, MgO: 0.1 to 5% by mass, CaO: 0.1 to 5% by mass, CeO: 0.01 to 2% by mass, ZrO2: 0 to 8% by mass (including zero), and the mass ratio of (MgO+CaO) to (Li2O+Na2O+K2O) is in the range of 0.10≦(MgO+CaO)/(Li2O+Na2O+K2O)≦0.80, is used as the glass plate, and
the chemically reinforced layer is formed on the glass plate having this composition.
4. The process for producing a glass substrate for an information-recording medium according to claim 1 , wherein
the step of cleaning the glass plate, which is performed after the rough polishing step and before the fine polishing step, comprises the steps of cleaning with an alkaline detergent having pH of 13 or more, cleaning with an acidic detergent having pH of 1 or less, and cleaning with HF in this order.