Method and system for feature function aware priority printing
A method and system for photomask pattern generation is provided, and more specifically, a method and system for feature function aware priority printing is provided. The method of printing a photolithographic mask includes fracturing mask design data into write shapes that are multiples of a spot size and passing fractured mask design data to a write tool. Additionally, the method includes writing one or more non-critical shapes according to one or more time-saving rules.
1. A computer program product comprising a computer usable storage medium having readable program code embodied in the storage medium, the computer program product includes at least one component operable to:
fracture mask design data into write shapes that are multiples of a spot size;
pass fractured mask design data to a write tool; and
write one or more non-critical shapes according to one or more time-saving rules.
2. The computer program product of claim 1 , wherein the at least one component is further operable to identify the one or more non-critical shapes from the mask design data, and instruct a writing of the one or more non-critical shapes according to the one or more time-saving rules.
3. The computer program product of claim 2 , wherein the at least one component is further operable to write one or more critical shapes.
4. The computer program product of claim 3 , wherein the writing the one or more non-critical shapes is performed subsequent to the writing the one or more critical shapes.
5. The computer program product of claim 1 , wherein the one or more non-critical shapes comprise at least one of: a fill shape, a pad, a guard ring, a mask bar code, a mask metrology alignment, a phase metrology, a border and a test pad.
6. The computer program product of claim 1 , wherein the one or more time-saving rules comprise utilizing at least one of:
a larger spot size;
a lower resolution;
a single pass writing; and
a reduced settling time.
7. The computer program product of claim 1 , wherein the at least one component is further operable to write one or more critical shapes, wherein:
the writing the one or more non-critical shapes comprises using only full size spot sizes of the spot size; and
the writing the one or more critical shapes comprises using half or quarter spot sizes of the spot size.
8. The computer program product of claim 1 , wherein the writing the one or more non-critical shapes and the writing the one or more critical shapes are performed in parallel.
9. A system implemented in hardware, comprising:
a mask data fracturing tool operable to fracture mask design data into write shapes that are multiples of a spot size; and
a tool operable to pass fractured mask design data to a write tool which write one or more non-critical shapes according to one or more time-saving rules.
10. The system of claim 9 , wherein the one or more non-critical shapes comprise at least one of: a fill shape, a pad, a guard ring, a mask bar code, a mask metrology alignment, a phase metrology, a border and a test pad.
11. The system of claim 9 , wherein the one or more time-saving rules comprise utilizing at least one of:
a larger spot size;
a lower resolution;
a single pass writing; and
a reduced settling time.