IP Library Granted Patent US 8,592,931
Granted Patent B2
US 8,592,931 · App. 12/361,661 · Granted Nov 26, 2013

Photoelectric conversion element and solid-state imaging device

Inventors: Masayuki Hayashi (Kanagawa, JP); Fumito Nariyuki (Minami-Ashigara, JP)
Assignee: FUJIFILM Corporation
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Quick Facts
Patent No.
US 8,592,931
App. No.
12/361,661
Granted
Nov 26, 2013
Kind
B2
Abstract

A photoelectric conversion element is provided and includes: a pair of electrodes; a photoelectric conversion layer between the pair of electrodes; and a charge-blocking layer between one of the pair of the electrodes and the photoelectric conversion layer. The charge-blocking layer is capable of suppressing injection of a charge from the one of the pair of electrodes into the photoelectric conversion layer upon application of a voltage across the pair of electrodes, and the charge-blocking layer contains an insulating material and an electrically conductive material.

Claims (26)

1. A sensor comprising:

a photoelectric conversion element comprising:

a pair of electrodes;

a photoelectric conversion layer between the pair of electrodes;

a charge-blocking layer between one of the pair of the electrodes and the photoelectric conversion layer, wherein the charge-blocking layer is capable of suppressing injection of a charge from the one of the pair of electrodes into the photoelectric conversion layer upon application of a voltage across the pair of electrodes, and the charge-blocking layer contains in a single layer a mixture of an insulating material and an electrically conductive material;

a semiconductor substrate above which a photoelectric conversion portion including the pair of electrodes, the photoelectric conversion layer, and the charge-blocking layer is stacked;

a charge accumulating portion provided within the semiconductor substrate and accumulating a charge generated in the photoelectric conversion layer; and

a connecting portion that electrically connects one of the pair of electrodes for collecting the charge to the charge accumulating portion, and

a voltage applying part which applies a voltage of 1.0×10 5 V/cm to 1.0×10 7 V/cm to the photoelectric conversion layer upon irradiation of light,

wherein the insulating material includes an organic high molecular polymer and the electrically conductive material includes an electron transporting material containing fullerene C60, fullerene C70 or fullerene oxide.

2. The sensor according to claim 1 , wherein the charge-blocking layer has a thickness of 10 nm to 200 nm.

3. The sensor according to claim 1 , further comprising an intra-substrate photoelectric conversion portion that is provided within the semiconductor substrate and that absorbs light transmitted through the photoelectric conversion layer and generates and accumulates a charge in proportion to an amount of the light.

4. The sensor according to claim 3 , wherein the intra-substrate photoelectric conversion portion includes a plurality of photodiodes stacked within the semiconductor substrate and capable of absorbing light having different colors.

5. The sensor according to claim 4 , wherein

the number of the photoelectric conversion portion stacked above the semiconductor substrate is one,

the plurality of the photodiodes includes a photodiode for blue light having a pn junction plane at a position capable of absorbing light of a blue wavelength region and a photodiode for red light having a pn junction plane at a position capable of absorbing light of a red wavelength region, and

the photoelectric conversion layer of the photoelectric conversion portion is able to absorb light of a green wavelength region.

6. The sensor according to claim 3 , wherein the intra-substrate photoelectric conversion portion includes a plurality of photodiodes that is arranged in a vertical direction to an entering direction of incident light within the semiconductor substrate and that is capable of absorbing light having different colors.

7. The sensor according to claim 6 , wherein

the number of the photoelectric conversion portion stacked above the semiconductor substrate is one,

the plurality of the photodiodes includes a photodiode for blue light having a pn junction plane at a position capable of absorbing light of a blue wavelength region and a photodiode for red light having a pn junction plane at a position capable of absorbing light of a red wavelength region, and

the photoelectric conversion layer of the photoelectric conversion portion is able to absorb light of a green wavelength region.

8. A solid-state imaging device comprising:

a plurality of sensors according to claim 1 arranged in an array form; and

a signal read-out portion that reads out signals each corresponding to a charge accumulated in each charge accumulating portion of each of the plurality of photoelectric conversion elements.

9. The sensor according to claim 1 , wherein the organic high molecular polymer is a polycarbonate or polycarbonates.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2009
From: HAYASHI, MASAYUKI; NARIYUKI, FUMITO
To: FUJIFILM CORPORATION
Reel/Frame 022171/0952 →
Priority Claims (1)
JP 2008-018879 · Jan 30, 2008 · national
Continuity (1)
Related Publication 20090188547A1 · Jul 30, 2009