Inductively coupled plasma processing apparatus
An inductively coupled plasma processing apparatus includes a processing chamber for accommodating a target substrate to be processed and performing plasma processing thereon, a mounting table provided in the processing chamber for mounting thereon the target substrate, a processing gas supply system for supplying a processing gas into the processing chamber and a gas exhaust system for exhausting the inside of the processing chamber. Further, in the inductively coupled plasma processing apparatus, a high frequency antenna is provided to form an inductive electric field in the processing chamber and a first high frequency power supply is provided to supply a high frequency power to the high frequency antenna. A metal window made of a nonmagnetic and conductive material is formed between the high frequency antenna and the processing chamber while being insulated from a main body which forms the processing chamber.
1. An inductively coupled plasma processing apparatus comprising:
a processing chamber for accommodating a target substrate to be processed and performing plasma processing thereon;
a mounting table provided in the processing chamber, for mounting thereon the target substrate;
a processing gas supply system for supplying a processing gas into the processing chamber;
a gas exhaust system for exhausting the inside of the processing chamber;
a high frequency antenna for forming an inductive electric field in the processing chamber;
a first high frequency power supply for supplying a high frequency power to the high frequency antenna,
wherein a metal window made of a nonmagnetic and conductive material is formed between the high frequency antenna and the processing chamber while being insulated from a main body which forms the processing chamber, and
wherein the metal window is divided into multiple sections insulated from each other by insulators.
2. The inductively coupled plasma processing apparatus of claim 1 , wherein the high frequency antenna has a spiral plane shape or an annular plane shape, and the metal window is divided along lines extending radially from a center of the spiral plane shaped antenna or the annular plane shaped antenna.
3. The inductively coupled plasma processing apparatus of claim 2 , wherein when a wall of the processing chamber which faces oppositely to the mounting table has a rectangular shape, the metal window is divided along lines for connecting a center of the rectangular shaped wall with middle points of sides of the rectangular shaped wall.
4. The inductively coupled plasma processing apparatus of claim 2 , wherein when a wall of the processing chamber which faces oppositely to the mounting table has a rectangular shape, the metal window is divided along lines for connecting a center of the rectangular shaped wall and corners of the rectangular shaped wall.
5. The inductively coupled plasma processing apparatus of claim 1 , wherein a dielectric film is formed on a surface of the metal window.
6. The inductively coupled plasma processing apparatus of claim 5 , wherein the dielectric film is formed of an anodic oxide film or a thermally sprayed ceramic film.
7. The inductively coupled plasma processing apparatus of claim 1 , wherein a dielectric cover is provided on the surface of a metal window which is exposed to the processing chamber.
8. The inductively coupled plasma processing apparatus of claim 7 , wherein the dielectric cover is made of quartz or ceramic.
9. The inductively coupled plasma processing apparatus of claim 1 , wherein a nonmagnetic conductive film having a conductivity higher than a conductivity of a material forming the metal window is formed on the surface of a metal window.
10. The inductively coupled plasma processing apparatus of claim 9 , wherein the nonmagnetic conductive film is formed on a side surface of the metal window and a surface of the metal window exposed to the processing chamber in a wiring shape to determine a direction of an inductive electric field generated in the processing chamber.
11. The inductively coupled plasma processing apparatus of claim 9 , wherein the metal window is made of aluminum or alloy containing aluminum, and the nonmagnetic conductive film is made of copper or alloy containing copper, or silver or alloy containing silver.
12. The inductively coupled plasma processing apparatus of claim 1 , further comprising a second high frequency power supply for supplying a high frequency power to the mounting table, wherein the metal window is grounded via a filter for passing therethrough only a high frequency power of the second high frequency power supply.
13. The inductively coupled plasma processing apparatus of claim 1 , wherein a temperature control passage is formed in the metal window.
14. The inductively coupled plasma processing apparatus of claim 1 , wherein gas injection openings for injecting the processing gas are formed in the metal window.
15. The inductively coupled plasma processing apparatus of claim 14 , wherein the metal window includes a base having a recessed portion serving as a gas channel; and a shower plate having gas injection openings, and an electric contact member as a conductive member is provided in a surface on which the base and the shower plate are brought into contact with each other to electrically contact the main body and the shower plate.
16. The inductively coupled plasma processing apparatus of claim 1 , further comprising a capacitively coupled mode circuit having a variable capacitor having one terminal connected to a connection node between the first high frequency power supply and the high frequency antenna while the other terminal is connected to the metal window.