IP Library Granted Patent US 8,598,464
Granted Patent B2
US 8,598,464 · App. 12/999,411 · Granted Dec 3, 2013

Soldering material and electronic component assembly

Inventors: Shigeaki Sakatani (Osaka, JP); Akio Furusawa (Osaka, JP); Kenichiro Suetsugu (Hyogo, JP); Taichi Nakamura (Osaka, JP)
Assignee: Panasonic Corporation
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Quick Facts
Patent No.
US 8,598,464
App. No.
12/999,411
Granted
Dec 3, 2013
Kind
B2
Abstract

A solder material includes 1.0-4.0% by weight of Ag, 4.0-6.0% by weight of In, 0.1-1.0% by weight of Bi, 1% by weight or less (excluding 0% by weight) of a sum of one or more elements selected from the group consisting of Cu, Ni, Co, Fe and Sb, and a remainder of Sn. When a copper-containing electrode part of an electronic component is connected to a copper-containing electrode land of a substrate by using this solder material, a part having an excellent stress relaxation property can be formed in the solder-connecting part and a Cu—Sn intermetallic compound can be rapidly grown from the electrode land and the electrode part to form a strong blocking structure.

Claims (14)

1. An electronic component assembly, comprising:

a substrate including a copper containing electrode land; and

an electronic component including a copper-containing electrode part connected to the copper-containing electrode land of the substrate by a connecting part, the connecting part being formed by a solder material,

wherein the solder material comprises 1.0-4.0% by weight of Ag, 4.0-6.0% by weight of In, 0.1-1.0% by weight of Bi, 0.05-0.1% by weight of only one element selected from the group consisting of Ni, Co, Fe and Sb, and a remainder of Sn only, wherein a Cu—Sn intermetallic compound blocks a space between the electrode part of the electronic component and the electrode land of the substrate at least partially in the connecting part.

2. A process for producing an electronic component assembly wherein a copper-containing electrode part of an electronic component is connected to a copper-containing electrode land of a substrate by a connecting part which is formed by using a solder material, the process comprising:

connecting a copper-containing electrode part of an electronic component to a copper-containing electrode land of a substrate by a solder material which comprises 1.0-4.0% by weight of Ag, 4.0-6.0% by weight of In, 0.1-1.0% by weight of Bi, 0.05-0.1% by weight of only one element selected from the group consisting of Ni, Co, Fe and Sb, and a remainder of Sn only, and

growing a Cu—Sn intermetallic compound form both of the electrode part of the electronic component and the electrode land of the substrate by heat treatment until the Cu—Sn intermetallic compound blocks a space between the electrode part of the electronic component and the electrode land of the substrate at least partially in the connecting part.

3. An electronic component assembly, comprising:

a substrate including a copper-containing electrode land; and

an electronic component including a copper-containing electrode part connected to the copper-containing electrode land of the substrate by a connecting part, the connecting part being formed by a solder material,

wherein the solder material comprises 1.0-4.0% by weight of Ag, 6.0% by weight of In, 0.1-1.0% by weight of Bi, 0.5-1.0% by weight of Cu, and a remainder of Sn only, wherein a Cu—Sn intermetallic compound blocks a space between the electrode part of the electronic component and the electrode land of the substrate at least partially in the connecting part which is formed by using the solder material.

4. A process for producing an electronic component assembly wherein a copper-containing electrode part of an electronic component is connected to a copper-containing electrode land of a substrate by a connecting part which is formed by using a solder material, the process comprising:

connecting a copper-containing electrode part of an electronic component to a copper-containing electrode land of a substrate by a solder material, the solder material comprising 1.0-4.0% by weight of Ag, 6.0% by weight of In, 0.1-1.0% by weight of Bi, 0.5-1.0% by weight of Cu, and a remainder of Sn only, and

growing a Cu—Sn intermetallic compound form both of the electrode part of the electronic component and the electrode land of the substrate by heat treatment until the Cu—Sn intermetallic compound blocks a space between the electrode part of the electronic component and the electrode land of the substrate at least partially in the connecting part.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 7, 2011
From: SAKATANI, SHIGEAKI; FURUSAWA, AKIO; SUETSUGU, KENICHIRO; NAKAMURA, TAICHI
To: PANASONIC CORPORATION
Reel/Frame 025906/0661 →
Priority Claims (1)
JP 2009-101729 · Apr 20, 2009 · national
Continuity (1)
Related Publication 20110120769A1 · May 26, 2011