Apparatus for generating plasma

1. An apparatus for generating plasma, the apparatus comprising: a vacuum chamber comprising a through-hole at a center of its top; and a plasma source part, comprising: a dielectric part configured to protrude upward along a circumference of the through-hole; an upper electrode coupled to seal an opened top of the dielectric part, the upper electrode configured to receive a supply of a Radio Frequency (RF) power; and an inductive coil configured to: spirally extend along an outer circumference surface of the dielectric part; and receive a supply of the RF power, the plasma source part being configured to generate plasma within the vacuum chamber, wherein the through-hole is provided in a partial region of an adaptor disposed below the dielectric part, a part of the vacuum chamber body comprising the adaptor, wherein: the adaptor further comprises at least one additional through-hole; and the apparatus further comprises: at least one additional plasma source part installed on the at least one additional through-hole, the at least one additional plasma source part comprising a same construction as the plasma source part; and a conductive interference prevention part configured to prevent interference between the plasma source parts.

2. The apparatus of claim 1 , wherein the dielectric part comprises of any one of: a square pipe shape, a cylinder shape, a cone shape, and a dome shape.

3. An apparatus for generating plasma, the apparatus comprising:

a vacuum chamber comprising a through-hole at its top; and

a plasma source part, comprising:

a dielectric part configured to protrude upward along a circumference of the through-hole;

an upper electrode coupled to seal an opened top of the dielectric part, the upper electrode configured to receive a supply of a Radio Frequency (RF) power;

an inductive coil configured to:

spirally extend along an outer circumference surface of the dielectric part; and

receive a supply of the RF power; and

a conductive connector configured to electrically connect the upper electrode to one end of the inductive coil and

to supply the RF power supplied to the upper electrode to the inductive coil, and

the plasma source part being configured to generate plasma within the vacuum chamber.

4. The apparatus of claim 3 , wherein the plasma source part further comprises:

at least one additional inductive coil configured to spirally extend along an outer circumference surface of the dielectric part; and

at least one additional conductive connector configured to electrically connect the upper electrode with one end of the at least one additional inductive coil.

5. The apparatus of claim 1 , wherein:

the upper electrode comprises a circular or polygonal plate shape antenna; and

the through-hole comprises a shape corresponding to the upper electrode.

6. The apparatus of claim 1 , further comprising an RF power supply part configured to supply the RF power to the upper electrode.

7. An apparatus for generating plasma, the apparatus comprising:

a vacuum chamber opened at its top;

a first dielectric part comprising a through-hole in its partial region, the first dielectric part configured to cover the opened top of the vacuum chamber; and

a plasma source part comprising:

a second dielectric part configured to protrude upward along a circumference of the through-hole;

an upper electrode coupled to seal an opened top of the second dielectric part, the upper electrode configured to receive a supply of a Radio Frequency (RF) power;

a center inductive coil configured to:

spirally extend along an outer circumference surface of the second dielectric part; and

receive a supply of the RF power; and

an edge inductive coil configured to:

spirally extend along a circumference of the center inductive coil at a set distance from the center inductive coil; and

receive a supply of the RF power,

the plasma source part being configured to generate plasma within the vacuum chamber.

8. The apparatus of claim 7 , wherein:

the first dielectric part further comprises at least one additional through-hole; and

the apparatus further comprises:

at least one additional plasma source part installed on the at least one additional through-hole, the at least one additional plasma source part comprising a same construction as the plasma source part; and

a conductive interference prevention part configured to prevent interference between the plasma source parts.

9. The apparatus of claim 7 , wherein:

the plasma source part further comprises:

a center conductive connector configured to electrically connect the upper electrode with one end of the center inductive coil; and

an edge conductive connector configured to connect to one end of the edge inductive coil; and

the RF power supplied to the upper electrode is configured to be supplied to the center inductive coil through the center conductive connector.

10. The apparatus of claim 9 , wherein the plasma source part further comprises:

at least one additional center inductive coil configured to spirally extend along an outer circumference surface of the second dielectric part;

at least one additional center conductive connector configured to electrically connect the upper electrode with one end of the at least one additional center inductive coil;

at least one additional edge inductive coil configured to spirally extend along a circumference of the at least one additional center inductive coil at a set distance from the center inductive coil; and

at least one additional edge conductive connector configured to connect to one end of the at least one additional edge inductive coil.

11. The apparatus of claim 8 , wherein:

the upper electrode comprises a gas inlet configured to inject a gas;

the apparatus further comprises a center gas shower head installed below the upper electrode; and

the center gas shower head comprises:

an inner gas distribution plate comprising a plurality of gas jet ports; and

an inner gas diffusion plate disposed between the upper electrode and the inner gas distribution plate, the inner gas diffusion plate configured to uniformly diffuse the gas introduced through the gas inlet.

12. The apparatus of claim 11 , wherein:

the first dielectric part comprises an opening in its partial region between the center inductive coil and the edge inductive coil, along a circumference of the second dielectric part;

the apparatus further comprises an edge gas shower head configured to cover the opening of the first dielectric part; and

the edge gas shower head comprises:

a gas diffusion plate configured to uniformly diffuse a gas;

a gas distribution plate formed in a “U” shape, the gas distribution plate configured to:

house the gas diffusion plate; and

jet the gas diffused by the gas diffusion plate into the vacuum chamber through a plurality of gas jet ports; and

a cover comprising a gas inlet, the cover configured to cover a top of the gas distribution plate.

13. The apparatus of claim 12 , further comprising:

a first gas controller configured to control an amount of gas introduced into the center gas shower head; and

a second gas controller configured to control an amount of gas introduced into the edge gas shower head.

14. The apparatus of claim 7 , further comprising an RF power supply part configured to supply the RF power to the upper electrode and the edge inductive coil,

wherein the RF power supply part comprises:

an RF source configured to generate an RF power,

a source matcher connecting to an output of the RF source, the source matcher configured for impedance matching, and

a variable capacitor configured to:

connect between a first output of the source matcher and an edge conductive connector, and

control an amount of an electric current flowing in the edge inductive coil connecting to the edge conductive connector, and

wherein a second output of the source matcher is configured to connect to an RF connection terminal of the upper electrode.

15. The apparatus of claim 7 , further comprising:

a first RF power supply part configured to supply the RF power to the upper electrode; and

a second RF power supply part configured to supply the RF power to the edge inductive coil.

16. An apparatus for generating plasma, the apparatus comprising:

a vacuum chamber opened at its top;

a first dielectric part comprising a through-hole in its partial region, the first dielectric part configured to cover the opened top of the vacuum chamber; and

a plasma source part comprising:

a second dielectric part configured to protrude upward along a circumference of the through-hole;

an upper electrode coupled to seal an opened top of the second dielectric part and grounded;

a center inductive coil configured to:

spirally extend along an outer circumference surface of the second dielectric part; and

receive a supply of a Radio Frequency (RF) power; and

an edge inductive coil configured to:

spirally extend along a circumference of the center inductive coil at a set distance from the center inductive coil; and

receive a supply of the RF power,

the plasma source part being configured to generate plasma within the vacuum chamber.

17. The apparatus of claim 16 , wherein:

the plasma source part further comprises:

a center conductive connector configured to connect to one end of the center inductive coil; and

an edge conductive connector configured to connect to one end of the edge inductive coil; and

the center inductive coil is grounded through the center conductive connector.

18. The apparatus of claim 3 , wherein the conductive connector directly electrically conduct the upper electrode to the inductive coil such that the RF power supplied to the upper electrode and the RF power supplied to the inductive coil through the upper electrode are in same phase.