Electropolishing solution containing a water sequestering agent and methods of use thereof
Substantially anhydrous electropolishing electrolyte solutions. The substantially anhydrous electropolishing electrolyte solutions described herein do not use water as a solvent; instead, such electropolishing electrolyte solutions use anhydrous alcohols and/or glycols as a solvent. For example, an electropolishing electrolyte solution, as described herein, may include an alcohol, at least one mineral acid, and at least one water sequestering agent. Suitable examples of water sequestering agent include, but are not limited to, polyfunctional alcohols. Methods of electropolishing metal articles using such electropolishing electrolyte solutions are disclosed herein as well.
1. A method for sequestering water in an electropolishing electrolyte solution, comprising:
positioning a substantially anhydrous electropolishing electrolyte solution in an electropolishing cell;
adding a first quantity of a water sequestering agent to the substantially anhydrous electropolishing electrolyte solution;
electropolishing a metal article in the substantially anhydrous electropolishing electrolyte solution in the electropolishing cell at a substantially constant electrical current while monitoring voltage across the electropolishing cell, wherein water evolved during the electropolishing of the metal article is sequestered by the water sequestering agent; and
adding a second quantity of the water sequestering agent to the electropolishing electrolyte solution when the voltage exceeds a selected value.
2. The method of claim 1 , wherein the water sequestering agent includes at least one polyfunctional alcohol.
3. The method of claim 2 , wherein the polyfunctional alcohol includes at least one sugar alcohol.
4. The method of claim 2 , wherein the polyfunctional alcohol includes at least one PEG.
5. The method of claim 4 , wherein the at least one PEG includes PEG 1000.
6. The method of claim 1 , wherein the substantially anhydrous electropolishing electrolyte solution includes about 5 volume % (“vol %”) to about 7 vol % sulfuric acid and about 3 vol % to about 14 vol % methanolic hydrochloric acid.
7. The method of claim 1 , wherein the substantially anhydrous electropolishing electrolyte solution comprises:
about 79.5 vol % methanol;
about 14 vol % concentrated methanolic hydrochloric acid;
about 6.5 vol % concentrated sulfuric acid; and
a quantity of PEG 1000 sufficient to sequester water introduced into the substantially anhydrous electropolishing electrolyte solution.
8. The method of claim 1 , wherein the metal article is an implantable stent fabricated from a tantalum alloy.
9. The method of claim 8 , wherein the tantalum alloy comprises:
about 75 to about 80 weight percent tantalum;
about 8 to about 12 weight percent niobium; and
about 2 to about 10 weight percent tungsten.
10. A method for electropolishing a metal article, comprising:
positioning a substantially anhydrous electropolishing electrolyte solution in an electropolishing cell,
wherein the electropolishing cell includes a reservoir configured to contain the substantially anhydrous electropolishing electrolyte solution, an anode and a cathode suspended in the electrolyte and connected to an electrical power supply;
adding a first quantity of at least one water sequestering agent to the substantially anhydrous electropolishing electrolyte solution, wherein the at least one water sequestering agent includes at least one polyfunctional alcohol;
connecting a metal article to an anode and positioning the metal article in the reservoir in the substantially anhydrous electropolishing electrolyte solution;
running a substantially constant electrical current through the substantially anhydrous electropolishing electrolyte solution via the anode and the cathode so as to electropolish the metal article while monitoring voltage across the electropolishing cell, wherein water evolved during the electropolishing is sequestered by the water sequestering agent so as to preserve the substantially anhydrous electropolishing electrolyte solution; and
adding a second quantity of the at least one water sequestering agent to the substantially anhydrous electropolishing electrolyte solution when the voltage exceeds a selected value.
11. The method of claim 10 , wherein the at least one polyfunctional alcohol includes at least one a sugar alcohol or at least one PEG.
12. The method of claim 11 , wherein the at least one PEG includes PEG 1000.
13. The method of claim 10 , wherein the substantially anhydrous electropolishing electrolyte solution includes about 5 volume % (“vol %”) to about 7 vol % sulfuric acid, about 3 vol % to about 14 vol % methanolic hydrochloric acid, and a balance of methanol.
14. The method of claim 10 , wherein the metal article is a stent fabricated from a tantalum alloy.
15. The method of claim 10 , wherein the tantalum alloy comprises:
about 75 to about 80 weight percent tantalum;
about 8 to about 12 weight percent niobium; and
about 2 to about 10 weight percent tungsten.