Apparatus and method for forming a solid immersion lens using a binary bitmap milling pattern
View Patent ↗A method for forming a solid immersion lens (SIL) includes generating a focused ion beam, and projecting the focused ion beam onto an optical medium at locations defined by a binary bitmap milling pattern, wherein the locations at which the focused ion beam impact a surface of the optical medium are randomized over successive raster scans of the surface of the optical medium to form at least a portion of a hemispherical structure in the optical medium.
1. An apparatus for forming a solid immersion lens (SIL) in an optical medium, comprising:
a milling head configured to generate a focused ion beam; and
a binary bitmap milling pattern defining locations at which the focused ion beam is projected onto a surface of the optical medium, wherein the locations at which the focused ion beam impact the surface of the optical medium are located completely within the binary bitmap milling pattern and are randomized over successive raster scans of the surface of the optical medium, wherein the binary bitmap milling pattern comprises a plurality of pixels, a first portion of the pixels defining locations where the focused ion beam impacts the surface of the optical medium and a second portion of the pixels defining locations where the focused ion beam is prevented from impacting the surface of the optical medium, each successive raster scan comprising a subsequent binary bitmap milling pattern having a different distribution of pixels that impact the surface of the optical medium and that are prevented from impacting the surface of the optical medium than a previous binary bitmap milling pattern, each different distribution of pixels comprising a functionally equivalent binary bitmap milling pattern.
2. The apparatus of claim 1 , wherein the successive raster scans comprise electronically rotating rastering axes of the focused ion beam relative to the surface of the optical medium for each successive raster scan.
3. The apparatus of claim 1 , wherein the successive raster scans comprise rotating the surface of the optical medium relative to the rastering axes of the focused ion beam for each successive raster scan.
4. The apparatus of claim 1 , wherein the subsequent binary bitmap milling pattern randomizes a dwell time of the focused ion beam.
5. The apparatus of claim 4 , wherein the focused ion beam covers an area of 3 pixels by 3 pixels and 14 binary bitmap milling patterns create the SIL.
6. The apparatus of claim 5 , wherein the SIL is created on a backside of the optical medium.
7. A method for forming a solid immersion lens (SIL), comprising:
generating a focused ion beam;
projecting the focused ion beam onto an optical medium at locations defined by a binary bitmap milling pattern, wherein the locations at which the focused ion beam impact a surface of the optical medium are located completely within the binary bitmap milling pattern and are randomized over successive raster scans of the surface of the optical medium to form at least a portion of a hemispherical structure in the optical medium; and
using the binary bitmap milling pattern to define first locations where the focused ion beam impacts a surface of the optical medium and to define second locations where the focused ion beam is prevented from impacting the surface of the optical medium, each successive raster scan comprising a subsequent binary bitmap milling pattern having a different distribution of pixels that impact the surface of the optical medium and that are prevented from impacting the surface of the optical medium than a previous binary bitmap milling pattern, each different distribution of pixels comprising a functionally equivalent binary bitmap milling pattern.
8. The method of claim 7 , further comprising electronically rotating the rastering axes of the focused ion beam relative to the surface of the optical medium for each successive raster scan.
9. The method of claim 7 , further comprising rotating the surface of the optical medium relative to the rastering axes of the focused ion beam for each successive raster scan.
10. The method of claim 7 , wherein the subsequent binary bitmap milling pattern randomizes a dwell time of the focused ion beam.
11. The method of claim 10 , wherein the focused ion beam covers an area of 3 pixels by 3 pixels and 14 binary bitmap milling patterns create the SIL.
12. The method of claim 11 , wherein the SIL is created on a backside of the optical medium.
13. An apparatus for forming a solid immersion lens (SIL) in bulk silicon, comprising:
a milling head configured to generate a focused ion beam; and
a binary bitmap milling pattern defining locations at which the focused ion beam is projected onto a surface of the bulk silicon, wherein the locations at which the focused ion beam impact the surface of the bulk silicon are located completely within the binary bitmap milling pattern and are randomized over successive raster scans of the surface of the bulk silicon by relative rotation between the rastering axes of the focused ion beam and the surface of the bulk silicon, the relative rotation occurring as the focused ion beam follows a boustrophedon pattern.
14. The apparatus of claim 13 , further comprising using the binary bitmap milling pattern to define first locations where the focused ion beam impacts a surface of the bulk silicon and to define second locations where the focused ion beam is prevented from impacting the surface of the bulk silicon.
15. The apparatus of claim 13 , wherein the successive raster scans comprise electronically rotating the focused ion beam relative to the surface of the optical medium.
16. The apparatus of claim 13 , wherein the successive raster scans comprise eucentrically rotating the surface of the optical medium relative to an axis along which the focused ion beam is projected.
17. The apparatus of claim 14 , wherein each successive raster scan comprises a binary bitmap milling pattern having a different distribution of pixels that impact the surface of the bulk silicon and that are prevented from impacting the surface of the bulk silicon than a previous binary bitmap milling pattern, each different distribution of pixels comprising a functionally equivalent binary bitmap milling pattern.
18. The apparatus of claim 17 , wherein the binary bitmap milling pattern randomizes a dwell time of the focused ion beam.
19. The apparatus of claim 18 , wherein the focused ion beam covers an area of 3 pixels by 3 pixels and 14 binary bitmap milling patterns.
20. The apparatus of claim 19 , wherein the SIL is created on a backside of the bulk silicon.