High brightness light emitting diode covered by zinc oxide layers on multiple surfaces grown in low temperature aqueous solution

1. A method of fabricating a III-Nitride based Light Emitting Diode (LED) with improved light extraction efficiency, comprising:

growing one or more Zinc Oxide (ZnO) layers on one or more non-polar or semi-polar III-nitride light transmitting surfaces of a III-Nitride based LED, from an aqueous solution containing dissolved Zn(II) and by means of a chemical reaction involving the dissolved Zn(II), wherein conditions during the growing control crystal orientation of the ZnO layers such that the ZnO layers form on the light transmitting surfaces in contact with the aqueous solution and are non-epitaxial with respect to the underlying non-polar or semi-polar III-nitride light transmitting surface.

2. The method of claim 1 , wherein a maximum temperature of the aqueous solution is less than a boiling point of the aqueous solution.

3. The method of claim 1 , wherein the dissolved Zn(II) in the aqueous solution is supplied by dissolving a water soluble salt of Zn(II).

4. The method of claim 1 , wherein the dissolved Zn(II) in the aqueous solution is supplied by dissolving ZnO.

5. The method of claim 1 , wherein the aqueous solution is a growth solution, and the growing of the ZnO layers is performed in one or more steps, such that, in any one or more of the steps, the reaction of the dissolved Zn(II) to form the ZnO layers is caused, intensified, or otherwise controlled by an increase in a temperature of the growth solution, or by a change in a pH of the growth solution, or by an increase in temperature of the growth solution and a change in pH of the growth solution.

6. The method of claim 1 , wherein a morphology of the ZnO layers produced is modified by an addition of additives to the aqueous solution, wherein the additives include one or more of the following: metal citrate salts, citric acid, surfactants, polymers, biomolecules, or other molecules that interact with a surface of ZnO or the ZnO layers.

7. The method of claim 1 , wherein one or more of the ZnO layers are grown with a two-step process, wherein a first step of the two-step process includes deposition of a seed layer, and a second step of the two-step process includes conversion of the seed layer into a thicker ZnO layer by growing in the aqueous solution, wherein the ZnO layers include the seed layer and the thicker ZnO layer.

8. The method of claim 7 , wherein the deposition of the seed layer is by depositing a solution comprising a Zn(II) precursor, dissolved in a solvent, to create a precursor film, and then heating the precursor film to pyrolize the Zn(II) precursor and crystallize the ZnO seed layer.

9. The method of claim 1 , further comprising controlling a morphology of the ZnO layers by creating one or more roughened, patterned, or structured surfaces of the ZnO layers that are suitable for enhancing the light extraction of light emitted by the LED.

10. The method of claim 9 , wherein the roughened, patterned, or structured surfaces of the ZnO layers are created during the step of synthesizing the ZnO layers.

11. The method of claim 9 , wherein the creation of the roughened, patterned, or structured surfaces is created by one or more steps involving removal of material from the preformed ZnO layers by means of physical or chemical etching.

12. The method of claim 1 , further comprising selecting conditions wherein:

one or more of the ZnO layers include one or more epitaxial ZnO layers covering on at least one of non-polar or semi-polar III-Nitride light transmitting surfaces, and

one or more of the ZnO layers include one or more polycrystalline ZnO layers, on at least one of the non-polar or semi-polar III-nitride light transmitting surfaces, with a preferential crystalline grain texture such that, on average, ZnO crystals in the polycrystalline ZnO layers are oriented with their [0001] c-direction perpendicular to the covered light transmitting surfaces.

13. The method of claim 1 , wherein the III-Nitride LED is a grown on a bulk Gallium Nitride (GaN) substrate.

14. The method of claim 1 , wherein the LED further comprises:

a III-nitride n-type layer;

a III-nitride p-type layer;

a III-nitride active layer, for emitting light, between the n-type layer and the p-type layer, wherein:

(1) a plurality of the light transmitting surfaces, wherein the light transmitting surfaces include a bottom surface of the LED, sidewalls of the LED, and a top surface of the LED, and

(2) at least one of the ZnO layers is on each of the light transmitting surfaces and the ZnO layers increase light extraction from the LED.

15. The method of claim 1 , wherein the LED is a non-polar III-nitride LED.

16. The method of claim 1 , wherein the LED is a semi-polar III-nitride LED.

17. The method of claim 1 , wherein the epitaxial ZnO layers include a current spreading layer.

18. A method of fabricating a III-Nitride based Light Emitting Diode (LED) with improved light extraction efficiency, comprising:

growing one or more Zinc Oxide (ZnO) layers from an aqueous solution on one or more non-polar or semi-polar III-nitride light transmitting surfaces of a III-Nitride based LED, wherein:

conditions during the growing control crystal orientation of the ZnO layers such that the ZnO layers are epitaxial or non-epitaxial with respect to underlying non-polar or semi-polar III-nitride light transmitting surface, and one or more of the ZnO layers include one or more polycrystalline ZnO layers, on at least one of the non-polar or semi-polar III-nitride light transmitting surfaces, with a preferential crystalline grain texture such that, on average, ZnO crystals in the polycrystalline ZnO layers are oriented with their [0001] c-direction perpendicular to the underlying non-polar or semi-polar III-nitride surface.

19. The method of claim 18 , wherein one or more of the polycrystalline ZnO layers are roughened in a way that increases light extraction from the LED.

20. The method of claim 18 , wherein the ZnO layers are epitaxially grown on one or more of the light transmitting non-polar or semi-polar III-Nitride surfaces of the LED.

21. A method of fabricating a III-Nitride based Light Emitting Diode (LED) with improved light extraction efficiency, comprising:

growing one or more Zinc Oxide (ZnO) layers from an aqueous solution on one or more non-polar or semi-polar III-nitride lighttransmitting surfaces of a III-Nitride based LED, wherein:

conditions during the growing control crystal orientation of the ZnO layers such that the ZnO layers are epitaxial or non-epitaxial with respect to the underlying non-polar or semi-polar III-nitride light transmitting surface, and the ZnO layers include an epitaxial ZnO film and a non-epitaxial ZnO film.

22. The method of claim 21 , further comprising growing the ZnO layers from the aqueous solution containing dissolved Zn(II), by means of a chemical reaction involving dissolved Zn(II), wherein:

the ZnO layers form on the light transmitting surfaces in contact with the aqueous solution,

the reaction of the dissolved Zn(II) to form the ZnO layers is caused, intensified, or otherwise controlled by an increase in a temperature of the growth solution or by a change in a pH of the growth solution, or by an increase in temperature of the growth solution and a change in pH of the growth solution,

one or more of the ZnO layers are grown with a two-step process, wherein a first step of the two-step process includes deposition of a seed layer and a second step of the two-step process includes conversion of the seed layer into a thicker ZnO layer by growing in the aqueous solution, wherein the ZnO layers include the seed layer and the thicker ZnO layer, and

the deposition of the seed layer is by depositing a solution comprising a Zn(II) precursor, dissolved in a solvent, to create a precursor film, and then heating the precursor film to pyrolize the Zn(II) precursor and crystallize the ZnO seed layer.