Non-volatile memory devices including vertical NAND channels and methods of forming the same

1. A non-volatile memory device comprising:

a plurality of vertical NAND channels electrically coupled to a select gate line of the non-volatile memory device,

wherein the plurality of vertical NAND channels include first channels and second channels, the first channels aligned along a first line in a select gate line direction, and the second channels aligned along a second line spaced apart from the first line and in the select gate line direction,

wherein the first channels are shifted from the second channels in the select gate line direction by a distance less than a pitch of the first channels.

2. A device according to claim 1 , wherein the plurality of vertical NAND channels are electrically coupled to a single select gate line of the non-volatile memory device.

3. A device according to claim 2 , further comprising a third channels aligned along a third line spaced apart from the first and second lines and in the select gate line direction,

wherein the third channels are shifted from the second channels in the select gate line direction.

4. A device according to claim 1 , wherein the pitch of the first channels is the same as a pitch of the second channels.

5. A device according to claim 4 , wherein the first channels are shifted from the second channels in the select gate line direction by about a half of the pitch of the first channels.

6. A device according to claim 1 , wherein the first line is parallel to the second line.

7. A device according to claim 1 , wherein the first channels are shifted from the second channels in the select gate line direction by a distance less than about twice a width of a single channel included in the plurality of vertical NAND channels.

8. A device according to claim 1 , wherein the first channels and the second channels are connected to different bit lines.

9. A device according to claim 8 , wherein the bit lines extend perpendicular to the select gate line direction.

10. A device according to claim 1 , wherein the channels are arranged in a zigzag pattern in the select gate line direction.

11. A device according to claim 1 , wherein each of the vertical channels is controlled by control gates, the control gates being vertically stacked.

12. A device according to claim 11 , further comprising a tunnel insulation layer, a charge storage layer, a block insulation layer and the control gates is referred to as a memory string.

13. A device according to claim 12 , wherein the tunnel insulation layer, the charge storage layer, and the block insulation layer are provided between the vertical channels and the control gate.

14. A device according to claim 13 , wherein at least one of the tunnel insulation layer, the charge storage layer and the block insulation layer extend onto upper and lower surfaces of the control gate.

15. A non-volatile memory device comprising:

three immediately adjacent vertical NAND channels electrically coupled to a single select gate line of the non-volatile memory device,

wherein the three immediately adjacent vertical NAND channels are arranged in an acute angled triangle.

16. A device according to claim 15 , further comprising:

three bit lines connected to the three immediately adjacent vertical NAND channels, respectively,

wherein two pairs of the three immediately adjacent vertical NAND channels are arranged in a direction between a select gate line direction and a bit lines direction.

17. A device according to claim 16 , wherein another pair of the three immediately adjacent vertical NAND channels are arranged in the select gate line direction.

18. A device according to claim 17 , wherein the bit lines are spaced apart from each other by a distance less than an interval of another pair.