On-die parametric test modules for in-line monitoring of context dependent effects
An integrated circuit (IC) die has an on-die parametric test module. A semiconductor substrate has die area, and a functional IC formed on an IC portion of the die area including a plurality of circuit elements configured for performing a circuit function. The on-die parametric test module is formed on the semiconductor substrate in a portion of the die area different from the IC portion. The on-die parametric test module includes a reference layout that provides at least one active reference MOS transistor, wherein the active reference MOS transistor has a reference spacing value for each of a plurality of context dependent effect parameters. A plurality of different variant layouts are included on the on-die parametric test module. Each variant layout provides at least one active variant MOS transistor that provides a variation with respect to the reference spacing value for at least one of the context dependent effect parameters.
1. An integrated circuit (IC) die, comprising:
a substrate having a semiconductor surface defining a die area;
a functional IC formed on an IC portion of said die area comprising a plurality of circuit elements configured for performing a circuit function; and
an on-die parametric test module formed on a test module portion of said die area different from said IC portion, said on-die parametric test module comprising:
a reference layout that includes at least one active reference MOS transistor, said active reference MOS transistor having a reference spacing value for each of a plurality of context dependent effect parameters, and
a plurality of variant layouts, each of said variant layouts providing at least one active variant MOS transistor that provides a variation with respect to said reference spacing value for a different at least one of said context dependent effect parameters.
2. The IC die of claim 1 , wherein said plurality of variant layouts includes at least one variant layout formed with at least one active variant MOS transistor that provides a variation with respect to said reference spacing values for two or more of said plurality of context dependent effect parameters.
3. The IC die of claim 2 , wherein said plurality of said context dependent effect parameters includes two or more of a length-of gate oxide definition (LOD) effect, an active proximity effect (APE), a well proximity effect (WPE), a number of dummy field assist gates effect, and a dual stress liner (DSL) boundary effect.
4. The IC die of claim 1 , wherein said functional IC and said on-die parametric test module both comprise standard cell-based layouts.
5. The IC die of claim 1 , wherein said reference layout and at least a portion of said variant layouts each include no more than two active MOS transistors.
6. The IC die of claim 1 , wherein said plurality of variant layouts includes at least one variant layout that provides an active variant MOS transistor that provides a variation with respect to said reference spacing value for two or more of said context dependent effect parameters, and at least one variant layout that provides an active variant MOS transistor that provides a variation with respect to said reference spacing value for exclusively one of said context dependent effect parameters.
7. A semiconductor wafer, comprising:
a substrate having a semiconductor surface defining a plurality of die areas;
a functional integrated circuit (IC) formed on an IC portion of each said die area, said functional IC comprising a plurality of circuit elements configured for performing a circuit function; and
an on-die parametric test module formed on a test module portion of each said die area different from said IC portion, said on-die parametric test module comprising:
a reference layout that includes at least one active reference MOS transistor, said active reference MOS transistor having a reference spacing value for each of a plurality of context dependent effect parameters, and
a plurality of variant layouts, each variant layout providing at least one active variant MOS transistor that provides a variation with respect to said reference spacing value for a different at least one of said context dependent effect parameters.
8. A method of generating in-line data for monitoring context dependent effect parameters for MOS devices, comprising:
providing a substrate having a semiconductor surface defining a plurality of die areas, a functional integrated circuit (IC) formed on an IC portion of each said die area including circuit elements for performing a circuit function, and an on-die parametric test module formed on a test module portion of each said die area different from said IC portion; wherein said on-die parametric test module comprises a reference layout that includes at least one active reference MOS transistor, said active reference MOS transistor having a reference spacing value for each of a plurality of context dependent effect parameters, and a plurality of variant layouts, each variant layout providing at least one active variant MOS transistor that provides a variation with respect to said reference spacing value for a different at least one of said context dependent effect parameters;
testing a plurality of said on-die parametric test modules to obtain electrical test measurement data from each of said on-die parametric test modules comprising measurement data from a respective said active reference MOS transistor and measurement data from respective ones of said active variant MOS transistors; and
processing said electrical test measurement data to generate measurements for said plurality of said context dependent effect parameters.
9. The method of claim 8 , further comprising comparing said generated measurements for said plurality of said context dependent effect parameters to a predetermined range, and generating an alarm signal if at least one of said generated measurements is outside said predetermined range.
10. The method of claim 9 , wherein said predetermined range is set by an integrated circuit simulation model, and said generated measurements for each parameter of said plurality of context dependent effect parameters for said active reference MOS transistor are set to zero.
11. The method of claim 9 , further comprising utilizing said generated measurements for said plurality of said context dependent effect parameters to modify software for an integrated circuit simulation model.
12. The method of claim 8 , wherein said plurality of said context dependent effect parameters includes two or more of a length-of-gate oxide definition (LOD) effect, an active proximity effect (APE), a well proximity effect (WPE), a number of dummy field assist gates effect, and a dual stress liner (DSL) boundary effect.
13. The method of claim 8 , wherein said functional IC and said on-die parametric test module both comprise standard cell-based layouts.
14. The method of claim 8 , wherein said reference layout and at least a portion of said plurality of variant layouts include no more than two of said active MOS transistors.
15. The method of claim 8 , wherein said plurality of variant layouts includes at least one variant layout that provides an active variant MOS transistor that provides a variation with respect to said reference spacing value for a plurality of said context dependent effect parameters, and at least one variant layout that provides an active variant MOS transistor that provides a variation with respect to said reference spacing value for exclusively one of said plurality of context dependent effect parameters.
16. The method of claim 8 , wherein said testing comprises wafer level testing.