IP Library Granted Patent US 8,674,319
Granted Patent B2
US 8,674,319 · App. 13/776,062 · Granted Mar 18, 2014

Beam monitor system and particle beam irradiation system

Inventors: Tomohisa Iwamoto (Hitachi, JP); Yoshihito Hori (Hitachi, JP); Takayoshi Matsushita (Kasumigaura, JP); Kunio Moriyama (Hitachi, JP); Masahiro Tadokoro (Hitachiota, JP)
Assignee: Hitachi, Ltd.
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Quick Facts
Patent No.
US 8,674,319
App. No.
13/776,062
Granted
Mar 18, 2014
Kind
B2
Abstract

Disclosed is a beam monitor system in which signals outputted from a plurality of wires are divided in a multi-wire type monitor for measuring a beam profile of a charged particle beam, an identical number of the wires are grouped, the signals of the respective groups are taken out one piece by one piece to be connected with each other, and the number of the pieces, corresponding to a number of the wires belonging to the one group, are put together to be connected to a signal processor storing connection information.

Claims (26)

1. A beam monitor system comprising:

a collection electrode, including a plurality of wire electrodes, to detect a charged particle beam passing therethrough;

a signal processor to receive respective detection signals outputted from the wire electrodes to execute signal processing; and

a beam monitoring control unit to find a position as well as a beam width of the charged particle beam having passed through the wire electrode on the basis of processing signals from the signal processor,

wherein the charge-collection electrode is made up of plural groups, each of the groups being made up of the plural wire electrodes adjacent to each other,

wherein the signal processor is connected to all the wire electrodes via a number of interconnections, identical in number to the number of the wire electrodes belonging to the one group such that a detection signal outputted from one of the wire electrodes, selected from the respective groups, is inputted from interconnections identical to each other, and

wherein the signal processor finds the group information indicating which group's detection signal of the wire electrode a received detection signal is, thereby outputting the processing signal containing the group information to the beam monitoring control unit.

2. The beam monitor system according to claim 1 , wherein the group is divided into a plurality of segments, each of the segments being made up of the plural wire electrodes adjacent to each other, the respective wire electrodes belonging to one of the segments are connected to any one of the wire electrodes of the segment belonging to another group for connection with the signal processor via interconnections identical to each other, the wire electrode belonging to the one of the segments is connected to one of the wire electrodes of the segment belonging to other groups via a permutation connection differing on a group-by-group basis, and the signal processor arranges the respective detection signals outputted from the wire electrodes in a different sequence on the basis of permutation connection information according to planned beam irradiation-position information, thereby finding a beam position as well as a beam width of the charged particle beam.

3. The beam monitor system according to claim 2 , wherein the collection electrode is made up such that a width of the plural wire electrodes making up one of the groups is larger than the width of the charged particle beam scheduled to be emitted.

4. The beam monitor system according to claim 2 , wherein the one group contains a segment larger than a number of the segments, for sufficiently covering the beam width of the charged particle beam.

5. The beam monitor system according to claim 4 , further comprising a display unit for receiving information on a beam position as well as a beam width, found by the beam monitoring control unit, to be displayed on a screen.

6. The beam monitor system according to claim 4 , wherein beam profile information obtained by calculating a signal of a charged particle beam of an assumed beam profile by simulating a signal processing configuration of the monitor system is compared with beam profile information on the charged particle beam at the time of an abnormal irradiation, thereby finding a beam position as well as abeam width of the charged particle beam.

7. The beam monitor system according to claim 2 , further comprising a display unit for receiving information on a beam position as well as a beam width, found by the beam monitoring control unit, to be displayed on a screen.

8. The beam monitor system according to claim 2 , wherein the signal processor comprises a storage for storing the detection signal from the wire electrode, and processing the detection signal stored in the storage, thereby outputting the processing signal.

9. The beam monitor system according to claim 2 , wherein beam profile information obtained by calculating a signal of a charged particle beam of an assumed beam profile by simulating a signal processing configuration of the monitor system is compared with beam profile information on the charged particle beam at the time of an abnormal irradiation, thereby finding a beam position as well as a beam width of the charged particle beam.

10. A charged particle beam irradiation system comprising a beam monitor system according to claim 2 .

11. The beam monitor system according to claim 1 , wherein the collection electrode is made up such that a width of the plural wire electrodes making up one of the groups is larger than the width of the charged particle beam scheduled to be emitted.

12. A charged particle beam irradiation system comprising a beam monitor system according to claim 11 .

13. The beam monitor system according to claim 11 , wherein the one group contains a segment larger than a number of the segments, for sufficiently covering the beam width of the charged particle beam.

14. The beam monitor system according to claim 11 , further comprising a display unit for receiving information on a beam position as well as a beam width, found by the beam monitoring control unit, to be displayed on a screen.

15. The beam monitor system according to claim 11 , wherein the signal processor comprises a storage for storing the detection signal from the wire electrode, and processing the detection signal stored in the storage, thereby outputting the processing signal.

16. The beam monitor system according to claim 11 , wherein beam profile information obtained by calculating a signal of a charged particle beam of an assumed beam profile by simulating a signal processing configuration of the monitor system is compared with beam profile information on the charged particle beam at the time of an abnormal irradiation, thereby finding a beam position as well as abeam width of the charged particle beam.

17. The beam monitor system according to claim 1 , further comprising a display unit for receiving information on a beam position as well as a beam width, found by the beam monitoring control unit, to be displayed on a screen.

18. The beam monitor system according to claim 17 , further comprising a display unit for receiving information on a beam position as well as a beam width, found by the beam monitoring control unit, to be displayed on a screen.

19. The beam monitor system according to claim 1 , wherein the signal processor comprises a storage for storing the detection signal from the wire electrode, and processing the detection signal stored in the storage, thereby outputting the processing signal.

20. A charged particle beam irradiation system comprising a beam monitor system according to claim 1 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2013
From: IWAMOTO, TOMOHISA; HORI, YOSHIHITO; MATSUSHITA, TAKAYOSHI; MORIYAMA, KUNIO; TADOKORO, MASAHIRO
To: HITACHI, LTD.
Reel/Frame 030077/0844 →
Priority Claims (1)
JP 2012-046060 · Mar 2, 2012 · national
Continuity (1)
Related Publication 20130231517A1 · Sep 5, 2013