IP Library Granted Patent US 8,697,331
Granted Patent B2
US 8,697,331 · App. 12/949,795 · Granted Apr 15, 2014

Compound, polymer, and radiation-sensitive composition

Inventors: Hirokazu Sakakibara (Tokyo, JP); Takehiko Naruoka (Tokyo, JP); Makoto Shimizu (Tokyo, JP); Yukio Nishimura (Tokyo, JP); Nobuji Matsumura (Tokyo, JP); Yuusuke Asano (Tokyo, JP)
Assignee: JSR Corporation
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Quick Facts
Patent No.
US 8,697,331
App. No.
12/949,795
Granted
Apr 15, 2014
Kind
B2
Abstract

A compound is shown by a following formula (1), wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R 3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R 3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.

Claims (16)

1. A radiation-sensitive composition comprising:

a fluorine-containing polymer;

an acid-labile group-containing polymer differing from the fluorine-containing polymer; and

a solvent,

the radiation-sensitive composition including the fluorine-containing polymer in an amount of 0.1 to 40 parts by mass based on 100 parts by mass of the acid-labile group-containing polymer,

the fluorine-containing polymer comprising:

a first repeating unit derived from a compound shown by a following formula (1); and

a second repeating unit shown by a following formula (2),

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group derived from bicyclo[2.2.1]heptane, bicyclo[2.2.2]octane, tricyclo[5.2.1.0 2.6 ]decane, tetracyclo[6.2.1.1 3.6 .0 2.7 ]dodecane or tricycle[3.3.1.1 3.7 ]decane, or a derivative thereof, each of R 3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R 3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms,

wherein R 4 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and each of R 5 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R 5 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom bonded thereto.

2. The radiation-sensitive composition according to claim 1 , wherein the radiation-sensitive composition includes the fluorine-containing polymer in an amount of 0.5 to 35 parts by mass based on 100 parts by mass of the acid-labile group-containing polymer.

3. The radiation-sensitive composition according to claim 1 , further comprising a photoacid generator.

4. The radiation-sensitive composition according to claim 1 , wherein a content of the first repeating unit in the fluorine-containing polymer is from 5 to 50 mol % based on a total amount (=100 mol %) of repeating units included in the fluorine-containing polymer.

5. The radiation-sensitive composition according to claim 1 , wherein a content of the first repeating unit in the fluorine-containing polymer is from 10 to 40 mol % based on a total amount (=100 mol %) of repeating units included in the fluorine-containing polymer.

6. The radiation-sensitive composition according to claim 1 , wherein a content of the first repeating unit in the fluorine-containing polymer is from 15 to 30 mol % based on a total amount (=100 mol %) of repeating units included in the fluorine-containing polymer.

7. The radiation-sensitive composition according to claim 1 , wherein R 2 represents a methylene group, an ethylene group, a 1-methylethylene group, or a 2-methylethylene group.

Assignments (3)
MERGER Recorded Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
CHANGE OF NAME Recorded Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 13, 2011
From: SAKAKIBARA, HIROKAZU; NARUOKA, TAKEHIKO; SHIMIZU, MAKOTO; NISHIMURA, YUKIO; MATSUMURA, NOBUJI; ASANO, YUUSUKE
To: JSR CORPORATION
Reel/Frame 025628/0349 →
Priority Claims (1)
JP 2008-131255 · May 19, 2008 · national
Continuity (2)
Continuation PCTJP2009059152 · May 18, 2009
Related Publication 20110104611A1 · May 5, 2011