IP Library Granted Patent US 8,703,354
Granted Patent B2
US 8,703,354 · App. 13/671,945 · Granted Apr 22, 2014

Membrane electrode assembly with enhanced hydrophobicity and manufacturing method thereof

Inventors: Bo Ki Hong (Seoul, KR); Sae Hoon Kim (Gyeonggi-do, KR); Myoung Woon Moon (Seoul, KR); Kwang Ryeol Lee (Seoul, KR); Kyu Hwan Oh (Seoul, KR); Eun Kyu Her (Incheon, KR)
Assignees: Hyundai Motor Company; Korea Institute of Science and Technology
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,703,354
App. No.
13/671,945
Granted
Apr 22, 2014
Kind
B2
Abstract

Disclosed is a membrane electrode assembly with enhanced hydrophobicity and a method for manufacturing the same. In particular, a nano pattern with a high aspect ratio is formed in a catalyst support on the surface of a catalyst layer constituting the membrane electrode assembly using plasma etching. A hydrophobic thin film is then formed on the nano pattern formed in the catalyst support.

Claims (24)

1. A method of manufacturing a membrane electrode assembly with enhanced hydrophobicity, the membrane electrode assembly formed with a polymer electrolyte membrane and catalyst layers of an anode and a cathode, the catalyst layers including a catalyst support and a catalyst supported thereon, the method comprising:

forming a nano pattern on a surface of each of the catalyst layers via plasma etching, wherein the plasma etching etches portions of each of the catalyst layers; and

forming a hydrophobic thin film on the nano pattern formed in the catalyst support.

2. The method of claim 1 , wherein the forming of the nano pattern includes controlling a size and a shape of the nano pattern by adjusting at least one of a plasma irradiation duration, an acceleration voltage, and an etching pressure during the plasma etching.

3. The method of claim 1 , wherein the acceleration voltage of plasma for the plasma etching ranges from about −100 Vb to about −1,000 Vb, and the etching pressure of the plasma ranges from about 1 Pa to about 10 Pa.

4. The method of claim 1 , wherein the plasma etching is performed by one or a combination of an ion beam method, a hybrid plasma chemical deposition method and an atmospheric plasma method.

5. The method of claim 1 , wherein the plasma etching is carried out by either Plasma-Enhanced Chemical Vapor Deposition (PECVD) or Plasma-Assisted Chemical Vapor Deposition (PACVD).

6. The method of claim 1 , wherein the hydrophobic thin film comprises a hydrocarbon thin film including silicon and oxygen or a hydrocarbon thin film including fluorine.

7. The method of claim 1 , wherein the hydrophobic thin film has a thickness of about 1 nm to about 100 nm.

8. The method of claim 1 , wherein the nano pattern includes fine protrusion structures.

9. A membrane electrode assembly with enhanced hydrophobicity, comprising:

a polymer electrolyte membrane;

catalyst layers of an anode and a cathode disposed on surfaces of the polymer electrolyte membrane, the catalyst layers including a catalyst support and a catalyst supported therein, a nano pattern formed within a surface of each of the catalyst layers; and

a hydrophobic thin film formed on the nano pattern of each of the catalyst layers, wherein a superhydrophobic surface is formed therefrom.

10. The membrane electrode assembly of claim 9 , wherein the nano pattern includes fine protrusion structures.

11. The membrane electrode assembly of claim 9 , wherein the hydrophobic thin film comprises a hydrocarbon thin film comprising silicon and oxygen or a hydrocarbon thin film comprising fluorine.

12. The membrane electrode assembly of claim 9 , wherein the hydrophobic thin film has a thickness of about 1 nm to about 100 nm.

13. The method of claim 1 , wherein the nano pattern has a fine protrusion structure such as a nano needle or a nano pillar having a width of 10 nm to 20 nm and a length of 100 nm to 1,000 nm.

14. The method of claim 1 , wherein the nano pattern is formed by performing the plasma etching on a carbon powder surface having a spherical shape constituting the catalyst support.

15. The method of claim 1 , wherein the nano pattern is formed to have an uneven structure that has nanosize protrusions or pores, on a carbon powder surface having a spherical shape constituting the catalyst support.

16. The method claim 1 , wherein the catalyst support comprises generally spherically shaped carbon powder particles, and wherein the nano pattern is formed within the generally spherically shaped carbon powder particles.

17. The membrane electrode assembly of claim 9 , wherein the catalyst support comprises generally spherically shaped carbon powder particles and wherein the nano pattern is formed within the generally spherically shaped carbon powder particles.

18. The method of claim 1 , wherein the plasma etching of the catalyst layers provides a plasma etching speed with respect to the catalyst that is slower than a plasma etching speed of the catalyst support.

19. The method of claim 1 , wherein the catalyst comprises metallic particles dispersed on the catalyst support, the metallic particles providing a plasma etching speed with respect to metallic particles that is slower than a plasma etching speed of the catalyst support.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 8, 2012
From: HONG, BO KI; KIM, SAE HOON; MOON, MYOUNG WOON; LEE, KWANG RYEOL; OH, KYU HWAN; HER, EUN KYU
To: HYUNDAI MOTOR COMPANY; KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Reel/Frame 029264/0535 →
Priority Claims (1)
KR 10-2012-0070376 · Jun 28, 2012 · national
Continuity (1)
Related Publication 20140004443A1 · Jan 2, 2014