Metal-containing compositions and method of making same

1. A process of forming a metal-containing film, article or object comprising:

a. applying a photosensitive metal-containing composition on a substrate wherein the photosensitive metal-containing composition comprises:

i. a metal-containing precursor unit (MU) containing at least two reactive functional groups, and

ii. a photoinitiator or photoactive catalyst where MU is represented by Structure I:

MA w B x C y   Structure I

where M comprises a metal with a formal valency of 0-7 and is selected from Zr, Hf, Ge, Ti, Pb, Gd, Sn, Zn, Ni, Ce, Nb, Eu, In, AI, Fe, Mn, Nd, Cu, Sb, Mg, Ga, Se, Cd, Ta, Co, Cr, Pt, Au, W, V, TI, Te, Sr, Sm, La, Er, Pd, In, Ca, Ba, As and Y; Ligand A contains a reactive functional group capable of undergoing a combining reaction; w is 2 to 7; Ligands B and C are selected individually or in combination from oxygen, nitrogen, sulfur, or a halogen atom; linear, branched or cyclic alkyl, alkenyl or alkynyl group; substituted or unsubstituted aryl group; and —XR 1 where X represents an organic functional group such as oxy, thio, carboxy, thiocarboxy, sulfo, oxalate, acetoacetonate, carbanion, carbonyl, thiocarbonyl, cyano, nitro, nitrito, nitrate, nitrosyl, azide, cyanato, isocyanato, thiocyanato, isothiocyanato, amido, amine, diamine, arsine, diarsine, phosphine, and diphosphine, and R 1 represents a linear, branched or cyclic alkyl or thioalkyl group, a heterocyclic group, an alicyclic group, and a substituted or unsubstituted aryl or heteroaryl group; and x and y are 0 to 5,

b. drying the photosensitive metal-containing composition

c. exposing the photosensitive metal-containing composition to a source of actinic radiation and

d. after c applying a post-treatment to the metal-containing composition.

2. The process of claim 1 wherein the post-treatment is thermal.

3. The process of claim 2 wherein the thermal treatment is at a temperature of 200° C. or more.

4. The process of claim 1 wherein, in c, the photosensitive metal-containing composition is exposed through a mask or a mold followed by development of the unexposed portion of the composition.

5. The process of claim 4 wherein the unexposed portion of the composition is developed with a solvent based developer.

6. The process of claim 5 wherein the unexposed portion of the composition is developed with at least one member selected selected individually or in combination from the group I-methoxy-2-propyl acetate, 2-butanone, n-butanol, n-propanol, and acetone.

7. The process of claim 4 , wherein after d, the composition comprises M z E v where M comprises a metal with a formal valency of 0-7 and is selected from Zr, Hf, Ge, Ti, Pb, Gd, Sn, Zn, Ni, Ce, Nb, Eu, In, Al, Fe, Mn, Nd, Cu, Sb, Mg, Ga, Se, Cd, Ta, Co, Cr, Pt, Au, W, V, TI, Te, Sr, Sm, La, Er, Pd, In, Ca, Ba, As and Y; E is selected individually or in combination from a group of elements such as oxygen, hydrogen, nitrogen, sulfur, carbon, silicon or fluorine; where z is about 5 to about 95% and z+v is 100.

8. The process of claim 4 , wherein the composition formed by the process is contained in a microdevice.

9. The process of claim 4 wherein the unexposed portion of the composition is developed with at least one member selected individually or in combination from the group aqueous alkaline and aqueous acidic developer.

10. The process of claim 4 , wherein, after d, the metal-containing composition has a dielectric constant of at least 2.

11. The process of claim 4 , wherein the photoinitiator or photoactive catalyst is selected based on sensitivity to exposure wavelength.

12. The process of claim 4 , wherein, after d, the metal containing composition has an index of refraction in the range of 1.5 to 2.2 in the 400-900 nm range of light and 1.5 to 2.4 in the 150-400 nm range of light.

13. The process of claim 8 , wherein the microdevice comprises at least one member selected from the group consisting of integrated circuits, image sensors, microsensors, inkjet nozzles, flat panel displays, and laser diodes.

14. The process of claim 1 , wherein Ligand A of the metal-containing precursor unit comprises at least one member selected from the group consisting of acrylate, methacrylate, styryl, vinyl, allyl, cyclo-olefin, SiH, SH, and epoxide.

15. The process of claim 1 wherein the photosensitive metal-containing composition further comprises a nanoparticle selected individually or in combination from surface treated or untreated silica, alumina, titania, zirconia, hafnia, CdSe, CdS, CdTe, CuO, zinc oxide, lanthanum oxide, niobium oxide, tungsten oxide, strontium oxide, calcium titanium oxide, sodium titanate, and potassium niobate.

16. The process of claim 1 wherein the photosensitive metal-containing composition further comprises a prepolymer unit, PU, which contains at least two reactive functional groups wherein reactive functional group comprises at least one member selected from the group consisting of acrylate, methacrylate, styryl, vinyl, allyl, cyclo-olefin, SiH, SH and epoxide.

17. The process of claim 16 wherein the prepolymer unit, PU, comprises at least one member selected from the group consisting urethane acrylate oligomer, urethane multi(meth)acrylate, multiurethane (meth)acrylate, multiurethane multi(meth)acrylate, 1,6-hexanediol di(meth)acrylate, tetraethyleneglycol di(meth)acrylate, divinylbenzene, ethoxylated bisphenol-A- di(meth)acrylate, diethylene glycol bis(allyl carbonate), trimethylolpropane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta-/hexa-(meth)acrylate, isocyanurate tri(meth)acrylate, bis(2-hydroxyethyl)-isocyanurate di(meth)acrylate, 1,3-butanediol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, (meth)acrylate modified-urea-formaldehyde, melamine-formaldehyde, cellulose, vinyl-, epoxide- and (meth)acryl-terminated polyhedyrl oligomeric silsesquioxanes, vinyl-terminated polydimethylsiloxanes, vinyl terminated diphenylsiloxane-dimethylsiloxane copolymer, vinyl terminated polyphenylmethylsiloxane, vinyl terminated diethylsiloxane-dimethylsiloxane copolymer, vinylmethylsiloxane-dimethylsiloxane copolymers, trimethylsiloxy terminated, vinylmethylsiloxane-d imethylsiloxane copolymers, vinyl terminated, vinylmethylsiloxane-homopolymers, vinyl T-structured polymers, vinylmethylsiloxane terpolymers, vinylmethoxysiloxane homopolymer, vinylethoxysiloxane homopolymer, vinyl-propylethoxysiloxane copolymer, hydride terminated poly-dimethyl siloxanes, methylhydrosiloxane-dimethylsiloxane copolymers, trimethylsiloxy terminated, methylhydrosiloxane-dimethylsiloxane copolymers, hydride terminated, polymethylhydrosiloxanes, trimethylsiloxy terminated, polyethylhydrosiloxane, triethylsiloxy terminated, polyphenyl-(dimethylhydroxysiloxy)siloxane, hydride terminated and hydride Q resin.

18. The process of claim 1 wherein the photosensitive metal-containing composition further comprises a co-monomer with only one reactive functional group wherein reactive functional group comprises at least one member selected from the group consisting of acrylate, methacrylate, styryl, vinyl, allyl, cyclo-olefin, SiH, SH and epoxide.

19. The process of claim 1 wherein the photosensitive metal-containing composition further comprises a solvent.

20. The process of claim 1 wherein the photosensitive metal-containing composition further comprises an additive.

21. The process of claim 1 , wherein after d the metal-containing composition comprises M z E v where M comprises a metal with a formal valency of 0-7 and is selected from Zr, Hf, Ge, Ti, Pb, Gd, Sn, Zn, Ni, Ce, Nb, Eu, In, Al, Fe, Mn, Nd, Cu, Sb, Mg, Ga, Se, Cd, Ta, Co, Cr, Pt, Au, W, V, TI, Te, Sr, Sm, La, Er, Pd, In, Ca, Ba, As and Y; E is selected individually or in combination from a group of elements such as oxygen, hydrogen, nitrogen, sulfur, carbon, silicon or fluorine; and z is about 5 to about 95% and z+v is 100%.

22. The process of claim 1 , wherein after d the metal containing composition has an index of refraction in the range of 1.5 to 2.2 in the 400-900 nm range of light and 1.5 to 2.4 in the 150-400 nm range of light.

23. The process of claim 1 wherein the metal-containing precursor unit (MU) comprises at least one member selected from the group consisting of zirconium (meth)acrylate, zirconyl di(meth)acrylate, zirconium butoxide (meth)acrylate, zirconium carboxyethyl acrylate, zirconium vinyl acetate, zirconyl di(vinyl acetate), hafnium (meth)acrylate, hafnium butoxide (meth)acrylate, hafnium oxide di(meth)acrylate, hafnium carboxyethyl acrylate, hafnium vinyl acetate, and hafnium oxide di(vinyl acetate), titanium (meth)acrylate, titanium butoxide (meth)acrylate, titanium oxide di(meth)acrylate, titanium carboxyethyl acrylate, titanium vinyl acetate, titanium oxide di(vinyl acetate), di-n-butoxydi(meth)acryloxygermane, tetracarboxyethylacryloxygermane, tetravinylacetoxygermane, tetra(meth)acryloxygermane, tantalum (meth)acrylate, tantalum butoxide (meth)acrylate, tantalum carboxyethyl acrylate, tantalum vinyl acetate, aluminum (meth)acrylate, aluminum butoxide (meth)acrylate, aluminum carboxyethyl acrylate, aluminum vinyl acetate, niobium (meth)acrylate, niobium butoxide (meth)acrylate, niobium carboxyethyl acrylate, niobium vinyl acetate.

24. The process of claim 1 wherein the metal-containing precursor unit (MU) comprises at least one member selected from the group consisting of zirconium vinyl acetate, zirconyl di(vinyl acetate), hafnium vinyl acetate, and hafnium oxide di(vinyl acetate) and further comprises a prepolymer unit, PU, which contains at least two reactive functional groups wherein the reactive functional group comprises at least one member selected from the group consisting of SiH and SH.

25. The process of claim 1 wherein Ligand A of the metal-containing precursor unit comprises at least one member selected from the group consisting of acrylate, methacrylate, styryl, vinyl, allyl, and cyclo-olefin and further comprises a prepolymer unit, PU, which contains at least two reactive functional groups wherein the reactive functional group comprises at least one member selected from the group consisting of SiH and SH.

26. The process of claim 1 , wherein, after d, the metal-containing composition has a dielectric constant of at least 2.

27. The process of claim 1 , wherein the photoinitiator or photoactive catalyst is selected based on sensitivity to exposure wavelength.

28. The process of claim 1 , wherein the composition formed by the process is contained in a microdevice.

29. The process of claim 28 , wherein the microdevice comprises at least one member selected from the group consisting of integrated circuits, image sensor, microsensors, inkjet nozzles, flat panel displays, and laser diodes.

30. A process of forming a metal-containing film or article comprising:

a. applying a metal-containing composition on a substrate wherein the metal-containing composition comprises:

i. a metal-containing precursor unit (MU), at least a portion of which contains at least two ethylenically unsaturated functional groups, and

ii. an initiator or catalyst where MU is represented by Structure I:

MA w B x C y   Structure I

where M comprises a metal with a formal valency of 0-5 such as Zr, Hf, Ge, Ti, Gd, Pb, Sn, Zn, Ni, Na, Li, K, Ce, Nb, Eu, In, Al, Fe, Mn, Nd, Cu, Sb, Mg, Ag, and Y; A comprises

where R 1 is a H atom, an alkyl group containing 1-8 carbon atoms, a group containing a halogen atom, or a hydroxyalkyl group, and n is 0-6;

B and C each comprise a member selected from the group consisting of oxygen, sulfur, a halogen atom and —OR 3 where R 3 represents an alkyl group, a halo-alkyl group, a substituted or unsubstituted aryl group;

w is 1-5, x is 0-4, y is 0-4, and w+x+y is 1-5,

b. drying the metal-containing composition

c. exposing the metal-containing composition to a source of actinic radiation and

d. after c applying a post-treatment to the metal-containing composition.

31. A process of forming a metal-containing film or article comprising:

a. applying a metal-containing composition on a substrate wherein the metal-containing composition comprises:

i. a metal-containing precursor unit (MU), at least a portion of which contains at least two ethylenically unsaturated functional groups, and

ii. an initiator or catalyst where MU is represented by Structure I:

MA w B x C y   Structure I

where M comprises a metal with a formal valency of 0-5 such as Zr, Hf, Ge, Ti, Gd, Pb, Sn, Zn, Ni, Na, Li, K, Ce, Nb, Eu, In, Al, Fe, Mn, Nd, Cu, Sb, Mg, Ag, and Y; A comprises

where R 1 is a H atom, an alkyl group containing 1-8 carbon atoms, a group containing a halogen atom, or a hydroxyalkyl group, and n is 0-6;

B and C each comprise a member selected from the group consisting of oxygen, sulfur, a halogen atom and —OR 3 where R 3 represents an alkyl group, a halo-alkyl group, a substituted or unsubstituted aryl group;

w is 1-5, x is 0-4, y is 0-4, and w+x+y is 1-5,

b. drying the metal-containing composition

c. exposing the metal-containing composition to a source of actinic radiation and

d. after c applying a post-curing bake to the metal-containing composition.

32. The process of claim 31 , wherein, after c, the metal containing composition has an index of refraction in the range of 1.5 to 2.2 in the 400-900 nm range of light and 1.5 to 2.4 in the 150-400 nm range of light.

33. A process of forming a metal-containing film or article comprising:

a. applying a metal-containing composition on a substrate wherein the metal-containing composition comprises:

i. a metal-containing precursor unit (MU), at least a portion of which contains at least two ethylenically unsaturated functional groups, and

ii. an initiator or catalyst

where MU is represented by Structure I:

MA w B x C y   Structure I

where M comprises a metal with a formal valency of 0-5 such as Zr, Hf, Ge, Ti, Gd, Pb, Sn, Zn, Ni, Na, Li, K, Ce, Nb, Eu, In, Al, Fe, Mn, Nd, Cu, Sb, Mg, Ag, and Y; A comprises

where R 1 is a H atom, an alkyl group containing 1-8 carbon atoms, a group containing a halogen atom, or a hydroxyalkyl group, and n is 0-6;

B and C each comprise a member selected from the group consisting of oxygen, sulfur, a halogen atom and —OR 3 where R 3 represents an alkyl group, a halo-alkyl group, a substituted or unsubstituted aryl group;

w is 1-5, x is 0-4, y is 0-4, and w+x+y is 1-5,

b. drying the metal-containing composition, and

c. heating the composition to a temperature in the range of about 50° C. to 300 ° C. for a period of time in the range of about 5 seconds to 30 minutes in order to cure the composition.

34. The process of claim 33 , wherein the initiator comprises at least one member selected from the group consisting of benzoyl peroxides and azo compounds.