IP Library › Granted Patent US 8,709,945
Granted Patent B2
US 8,709,945 · App. 13/413,561 · Granted Apr 29, 2014

Area efficient through-hole connections

Inventor: Jeng-Jye Shau (Palo Alto, CA)
H01L21/76898H01L23/481
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Quick Facts
Patent No.
US 8,709,945
App. No.
13/413,561
Granted
Apr 29, 2014
Kind
B2
Abstract

Using printing technologies to fill conductor materials into holes in silicon substrate, the preferred embodiments of the present improve cost efficiency of through-hole connections. Using silicon substrate as cathode terminal during electrical plating that fill holes in a silicon substrate with conductors, the preferred embodiments of the present improve alignment accuracy and cost efficiency of through-hole manufacturing processes.

Claims (15)

1. A method for providing electrical connection(s) through a silicon substrate, comprising the steps of:

opening a hole into the silicon substrate; depositing electrical insulator material(s) inside the hole in the silicon substrate; Patterning one or more hole(s) inside the insulator material(s) inside the hole in the silicon substrate; printing electrical conductor material(s) into the hole(s) inside the insulator material(s); using the dried-ink conductor material(s) formed using the printed electrical conductor material(s) as part of or all of the conductor material(s) for providing electrical connection(s) from a front surface to a back surface of the silicon substrate;

wherein the step of, depositing the electrical insulator material inside the hole in the silicon substrate comprising a step of depositing developed photo-resist material(s) as the electrical insulator material for insulating the silicon substrate and the conductor material(s) inside the hole.

2. The Method in claim 1 wherein the step of opening a hole into the silicon substrate comprises a step of opening a through-hole extending from the front surface to the back surface of the silicon substrate.

3. The method in claim 1 wherein the step of opening a hole into the silicon substrate comprises a step of opening a hole penetrating partially through the silicon substrate when the hole is opened.

4. The method in claim 1 wherein the step of printing electrical conductor material(s) comprises a step of using screen printing to print electrical conductor material(s) into the hole(s) opened through the insulator material(s).

5. The method in claim 1 wherein the step of printing electrical conductor material(s) comprises a step of using inkjet printing to print electrical conductor material(s) into the hole(s) opened through the insulator material(s).

6. The method in claim 1 comprises a step of patterning two or more holes opened through the insulator material(s) filled inside the hole in the silicon substrate.

7. The method in claim 1 wherein the step of opening a hole into the silicon substrate comprises a step of opening the hole by applying a dicing process.

8. The method in claim 1 wherein the step of opening a hole into the silicon substrate comprises a step of opening the hole by applying a LASER cutting process.

9. A method for providing electrical connection(s) through a silicon substrate, comprising the steps of: opening a hole into the silicon substrate; depositing electrical insulator material(s) inside the hole in the silicon substrate; Patterning one or more hole(s) inside the insulator material(s) inside the hole in the silicon substrate, wherein the silicon substrate is exposed at the bottom of the hole(s); filling conductor material(s) into the hole(s) inside the insulator material(s) by electroplating, using a dried-ink conductor materials wherein the silicon substrate exposed at the bottom of the hole(s) provides cathode connection(s) for the electroplating process(es); using the conductor material(s) filled by electroplating as part(s) of the conductor material(s) that provide electrical connection(s) from the front surface to the back surface of the silicon substrate; and

wherein the step of, depositing the electrical insulator material inside the hole in the silicon substrate comprising a step of depositing developed photo-resist material(s) as the electrical insulator material for insulating the silicon substrate and the conductor material(s) inside the hole.

10. The method in claim 9 comprises a step of patterning two or more holes opened through the insulator material(s) filled inside the hole in the silicon substrate.

11. The method in claim 9 wherein the step of opening a hole into the silicon substrate comprises a step of opening the hole by applying a dicing process.

12. The method in claim 9 wherein the step of opening a hole into the silicon substrate comprises a step of opening the hole by applying a LASER cutting process.

Continuity (2)
Continuation In Part 13013923 · Jan 26, 2011
Related Publication 20120190193A1 · Jul 26, 2012